A monolithic, vertical, planar semiconductor structure with a number diodes having different intrinsic regions is described. The diodes have intrinsic regions of different thicknesses as compared to each other. In one example, the semiconductor structure includes a P-type silicon substrate, an intrinsic layer formed on the P-type silicon substrate, and a dielectric layer formed on the intrinsic layer. A number of openings are formed in the dielectric layer. Multiple anodes are sequentially formed into the intrinsic layer through the openings formed in the dielectric layer. For example, a first N-type region is formed through a first one the openings to a first depth into the intrinsic layer, and a second N-type region is formed through a second one of the openings to a second depth into the intrinsic layer. Additional N-type regions can be formed to other depths.
A power amplifier, such as a radio-frequency (RF) Doherty power amplifier, for amplifying an input signal to an output signal is disclosed. The power amplifier includes a peaking amplifier circuit, where the peaking amplifier circuit is formed in gallium nitride materials on a silicon substrate. The power amplifier further includes a main amplifier circuit, where the main amplifier circuit is formed in gallium nitride materials on a silicon carbide substrate.
A shielded capacitor includes a first terminal; one or more first capacitor metals electrically connected to the first terminal; a second terminal; one or more second capacitor metals electrically connected to the second terminal. The shielded capacitor further includes a shielding structure. The shielding structure being configured to limit a variation of an RF characteristic due to a presence of a metallic structure.
A level shifter, configured to shift an input voltage swing from a first voltage range to a second voltage range, comprising a first stage and a switching stage, with circuitry configured in isolation wells. The first stage includes a first stage input receiving an input signal that swings between a first voltage value and a second voltage, a buffer configured to shift the input signal to vary between a third value and a fourth value, and a first stage output configured to present a first stage output signal. The switching stage comprises switching stage inputs, configured to receive the first stage output signal, switch drivers, and switching devices configured to, responsive to the driver output, generate a switching stage output signal that is a shifted version of the input signal. The switching stage output signal ranges between a fifth voltage value and a sixth voltage value.
A device that includes a metal submount; a first transistor die arranged on said metal submount; a second transistor die arranged on said metal submount; a set of primary interconnects; and a set of secondary interconnects. Additionally, the set of primary interconnects and the set of secondary interconnects are configured to provide RF signal coupling between the first transistor die and the second transistor die by electromagnetic coupling.
H01L 25/00 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices
H01L 25/18 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different subgroups of the same main group of groups , or in a single subclass of ,
The reduction of feedback capacitance in active semiconductor devices, such as the reduction in collector to base capacitance in transistors, is described. In one example, a transistor includes a substrate, an active region of the transistor in the substrate, a dielectric layer over a top surface of the substrate, and an interconnect region. The active region includes a base contact over the active region. The interconnect region includes a conductive interconnect that extends over the dielectric layer and is electrically coupled with the base contact. The interconnect region also includes a semiconductor junction region extending under the conductive interconnect in an area of the substrate outside of the active region. The addition of the semiconductor junction region under the conductive interconnect reduces the total collector to base capacitance in the transistor.
A number of different types of semiconductor material structures and wafers, including epiwafers, are described herein. The semiconductor material wafers are optimized in certain aspects to form transistor amplifiers for use with new modulation communications systems. A semiconductor material wafer includes a silicon carbide substrate and at least one III-nitride material layer over the silicon carbide substrate. The semiconductor material wafers can include layers consisting of semiconductor materials without dopants such as iron or carbon, formed over the silicon carbide substrate.
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
H01L 29/16 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System in uncombined form
H01L 29/778 - Field-effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT
H03F 1/02 - Modifications of amplifiers to raise the efficiency, e.g. gliding Class A stages, use of an auxiliary oscillation
A technique for marking semiconductor devices with an identifiable mark or alphanumeric text yields a high-contrast, easily distinguishable mark on an electrical terminal of the device without impacting the device's breakdown voltage capability and without compromising the solderability and wire bondability of the terminal. This approach deposits the mark on the terminal as a patterned layer of palladium, which offers good contrast with the base metal of the terminal and maintains the solderability and bondability of the terminal.
H01L 23/544 - Marks applied to semiconductor devices, e.g. registration marks, test patterns
H01L 21/48 - Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H01L 23/488 - Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads or terminal arrangements consisting of soldered or bonded constructions
9.
BYPASSED GATE TRANSISTORS HAVING IMPROVED STABILITY
A transistor device includes a plurality of gate fingers that extend in a first direction and are spaced apart from each other in a second direction, each of the gate fingers comprising at least spaced-apart and generally collinear first and second gate finger segments that are electrically connected to each other. The first gate finger segments are separated from the second gate finger segments in the first direction by a gap region that extends in the second direction. A resistor is disposed in the gap region.
H01L 23/482 - Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads or terminal arrangements consisting of lead-in layers inseparably applied to the semiconductor body
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
H01L 29/417 - Electrodes characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
H01L 29/778 - Field-effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT
10.
METHODS OF FORMING PACKAGED SEMICONDUCTOR DEVICES AND LEADFRAMES FOR SEMICONDUCTOR DEVICE PACKAGES
A leadframe blank includes a first package blank, a second package blank and a tie bar between the first package blank and the second package blank. The tie bar includes a recessed cavity therein.
Aspects of coaxial to microstrip transitional housings are described. A method of forming a transitional housing includes forming a channel to a first depth into a housing block from a top surface of the housing block, forming a first annular opening to a second depth into the housing block from the top surface of the housing block at a first end of the channel, forming a second annular opening to the second depth into the housing block from the top surface of the housing block at a second end of the channel, inserting a first cylindrical plug into the first annular opening, and inserting a second cylindrical plug into the second annular opening. The second depth can be greater than the first depth in some cases.
Semiconductor structures including III-nitride materials are described herein, including semiconductor structures comprising III-nitride material regions (e.g., gallium nitride material regions). An example semiconductor structure includes a substrate, a III-nitride material region located over the substrate, a first-type electrode over the III-nitride material region, and a second-type electrode over the III-nitride material region. The first-type electrode defines a first electrode interfacial area with the III-nitride material region. The second-type electrode defines a second electrode interfacial area with the III-nitride material region. The first electrode interfacial area is less than 20 times the second electrode interfacial area in at least one example.
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
H01L 27/02 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
H01L 27/06 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
H01L 29/15 - Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices
H01L 29/778 - Field-effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT
A balun is enhanced with design features that extend the operational bandwidth of the balun allowing the balun to operate at lower frequencies. The design enhancements also suppress resonances that otherwise cause sudden power drops at a resonance frequency while a load is connected between the balun's differential outputs.
H01P 5/10 - Coupling devices of the waveguide type for linking lines or devices of different kinds for coupling balanced with unbalanced lines or devices
Electrode structures and methods of manufacturing electrode structures for devices are described. An example electrode structure includes a gate metal formation including a nitride layer with an opening that exposes a surface region of a substrate, a gate metal layer on the surface region of the substrate, a barrier metal layer on the gate metal layer and on at least a portion of a step around the opening in the nitride layer, and a conductive metal layer on the barrier metal layer. The gate metal layer is on the surface region of the substrate and on at least another portion of the step around the opening in the nitride layer in one example. The gate metal layer includes first and second gate metal layers in one example, such as nickel and tungsten.
H01L 21/285 - Deposition of conductive or insulating materials for electrodes from a gas or vapour, e.g. condensation
H01L 21/033 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or comprising inorganic layers
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
Amplifiers with temperature-adaptive gain and peaking gain control are described. In one example, a temperature-adaptive amplifier includes an amplifier, a temperature sense circuit, and a peaking control level shifter to bias shift the output of the amplifier and adjust a peaking gain of the amplifier based on the temperature control signal. The peaking control level shifter can adjust a peaking gain of the amplifier based on the temperature control signal. The temperature-adaptive control can help to compensate for peaking gain in amplifiers based on the operating temperature of the amplifier. The control can help to compensate for unwanted changes in amplifier peaking gain, over time, resulting in more consistent peaking gain over the full operating frequency range of amplifiers.
Extrinsic structures formed outside the active regions of active devices can influence aging characteristics and performance of the active devices. An example integrated device including such an extrinsic structure includes an active region of a semiconductor device in a plurality of layers of semiconductor materials over a substrate, an isolation region in at least one of the layers of semiconductor materials, the isolation region extending around the semiconductor device in an area outside of the active region, an insulating layer over at least a portion of the active region and over at least a portion of the isolation region, a via in the isolation region and outside the active region, the via extending through the insulating layer and down to a conduction layer among the layers of semiconductor materials in the isolation region, and an interconnect within the via and directly on the conduction layer in the isolation region.
H01L 21/76 - Making of isolation regions between components
H01L 21/765 - Making of isolation regions between components by field-effect
H01L 29/06 - Semiconductor bodies characterised by the shapes, relative sizes, or dispositions of the semiconductor regions
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
H01L 29/778 - Field-effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT
A distributed amplifier system comprising an impedance matching network configured to match an input impedance to an output impedance of the signal source, and a DC block configured to block DC components in the input signal. A variable gain amplifier adjusts the gain applied to the input signal based on a gain control signal to generate a gain adjusted signal. An emitter follower circuit receives and processes the gain adjusted signal to introduce gain peaking to create a modified signal. A distributed amplifier receives and amplifies the modified signal from the emitter follower circuit, to create an amplified signal. The distributed amplifier includes a termination network and one or more impedance matching elements configured for gain shaping the amplified signal. The gain peaking introduced by the emitter follower circuit is controlled by a variable current source. The distributed amplifier may be an open collector distributed amplifier.
A distributed amplifier system comprising an impedance matching network configured to match an input impedance to an output impedance of the signal source, and a DC block configured to block DC components in the input signal. A variable gain amplifier adjusts the gain applied to the input signal based on a gain control signal to generate a gain adjusted signal. An emitter follower circuit receives and processes the gain adjusted signal to introduce gain peaking to create a modified signal. A distributed amplifier receives and amplifies the modified signal from the emitter follower circuit, to create an amplified signal. The distributed amplifier includes a termination network and one or more impedance matching elements configured for gain shaping the amplified signal. The gain peaking introduced by the emitter follower circuit is controlled by a variable current source. The distributed amplifier may be an open collector distributed amplifier.
A distributed amplifier system comprising an impedance matching network configured to match an input impedance to an output impedance of the signal source, and a DC block configured to block DC components in the input signal. A variable gain amplifier adjusts the gain applied to the input signal based on a gain control signal to generate a gain adjusted signal. An emitter follower circuit receives and processes the gain adjusted signal to introduce gain peaking to create a modified signal. A distributed amplifier receives and amplifies the modified signal from the emitter follower circuit, to create an amplified signal. The distributed amplifier includes a termination network and one or more impedance matching elements configured for gain shaping the amplified signal. The gain peaking introduced by the emitter follower circuit is controlled by a variable current source. The distributed amplifier may be an open collector distributed amplifier.
A transistor device includes a metal submount; a transistor die arranged on said metal submount; an IPD component arranged on said metal submount, and the IPD component having a baseband damping resistor arranged on a thermally conductive dielectric substrate; and a second IPD component arranged on said metal submount, and the second IPD component may include a baseband decoupling capacitor arranged on a thermally conductive dielectric substrate.
H01L 21/48 - Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups
H01L 23/00 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details of semiconductor or other solid state devices
H01L 23/053 - Containers; Seals characterised by the shape the container being a hollow construction and having an insulating base as a mounting for the semiconductor body
H01L 23/367 - Cooling facilitated by shape of device
H01L 25/16 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different main groups of groups , or in a single subclass of , , e.g. forming hybrid circuits
21.
INTEGRATED PASSIVE DEVICES (IPD) HAVING A BASEBAND DAMPING RESISTOR FOR RADIOFREQUENCY POWER DEVICES AND DEVICES AND PROCESSES IMPLEMENTING THE SAME
A transistor device includes a metal submount; a transistor die arranged on said metal submount; an IPD component arranged on said metal submount, and the IPD component having a baseband damping resistor arranged on a thermally conductive dielectric substrate; and a second IPD component arranged on said metal submount, and the second IPD component may include a baseband decoupling capacitor arranged on a thermally conductive dielectric substrate.
H01L 25/16 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different main groups of groups , or in a single subclass of , , e.g. forming hybrid circuits
An enhanced electrical circuit can employ conductive fill components that can facilitate providing desirable resistive stabilization of the electrical circuit and other desirable circuit qualities without having to use a physical resistor. The electrical circuit can comprise a transmission line, which can be a microstrip line, that can have defined dimensions. The electrical circuit can comprise respective conductive fill components that can be in proximity to desired sides of the transmission line, wherein the respective conductive fill components can provide the desired resistive stabilization for the electrical circuit. The respective conductive fill components can be separated from, and not in contact with, each other based on respective gaps of a defined size(s) between respective adjacent conductive fill components. The respective conductive fill components can be across a single layer or multiple layers of conductive fill components.
A device according to some embodiments includes a first IPD die including a first SiC substrate. The first IPD die has a first surface and a second surface on the first SiC substrate opposite the first surface and includes a first contact and at least one first metal portion on the respective surfaces of the first SiC substrate. The device further includes a second IPD die including a second SiC substrate. The second IPD die has a third surface and a fourth surface on the second SiC substrate opposite the third surface and includes a second contact and at least one second metal portion on the respective surfaces of the second SiC substrate. The device further includes an electrical interconnection structure between one of the first and second surfaces of the first IPD die and one of the third and fourth surfaces of the second IPD die.
H01G 4/40 - Structural combinations of fixed capacitors with other electric elements not covered by this subclass, the structure mainly consisting of a capacitor, e.g. RC combinations
H01G 4/38 - Multiple capacitors, i.e. structural combinations of fixed capacitors
H01L 25/16 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different main groups of groups , or in a single subclass of , , e.g. forming hybrid circuits
24.
LAYOUT TECHNIQUES AND OPTIMIZATION FOR POWER TRANSISTORS
An example field effect transistor includes a substrate, a first source metal over the substrate, a second source metal over the substrate, and a drain metal positioned between the first source metal and the second source metal over a channel of the field effect transistor. The drain metal includes a drain metal body having a notched region between the first source metal and the second source metal over the channel, and the notched region defines a first projecting portion and a second projecting portion of the drain metal body. In one aspect, the first projecting portion and the second projecting portion are positioned on respective sides of the notched region. The notched region is a triangular-shaped notched region in one example.
H01L 29/417 - Electrodes characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
New types, structures, and arrangements of capacitor networks for harmonic control and other purposes are described. An example capacitor network includes a bond pad and metal-insulator-metal (MIM) capacitors positioned over the top side of the substrate and along different sides of the bond pad. A first metal layer of each of the plurality of MIM capacitors is electrically coupled to the bond pad. A second metal layer of each of the plurality of MIM capacitors is electrically coupled to a ground plane on a bottom side of the substrate by a through-substrate via. The MIM capacitors can be arranged around the bond pad in the capacitor network for a tailored capacitance. A matching network in the integrated device can incorporate the capacitor network to reduce loss, provide better harmonic termination, and achieve better phase alignment for the power devices.
H01L 23/522 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
H01L 27/06 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
26.
RADIO FREQUENCY POWER AMPLIFIER IMPLEMENTING AN OFF MODE OUTPUT IMPEDANCE CONTROL AND A PROCESS OF IMPLEMENTING THE SAME
Semiconductor structures with reduced parasitic capacitance between interconnects and ground, for example, are described. An example method for making a semiconductor structure includes forming a trench in an interconnect area of a substrate between first and second device areas in the semiconductor structure, forming a low dielectric constant material region in the trench, forming a III-nitride material layer over the substrate and over the low dielectric constant material region in the trench, forming a first device in the III-nitride material layer in the first device area, forming a second device in the III-nitride material layer in the second device area, and forming an interconnect over the low dielectric constant material region, the interconnect comprising a continuous conductive metal interconnect from the first device area, over the low dielectric constant material region, and to the second device area.
H01L 27/06 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
H01L 21/74 - Making of buried regions of high impurity concentration, e.g. buried collector layers, internal connections
H01L 21/76 - Making of isolation regions between components
H01L 21/8252 - Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using III-V technology
H01L 23/528 - Layout of the interconnection structure
H01L 23/535 - Arrangements for conducting electric current within the device in operation from one component to another including internal interconnections, e.g. cross-under constructions
H01L 29/06 - Semiconductor bodies characterised by the shapes, relative sizes, or dispositions of the semiconductor regions
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
28.
High Frequency, High Temperature Transistor Devices
Transistor devices are provided. In one example, a transistor device includes a Group III nitride-based semiconductor structure. The transistor device has a non-degradation time of at least about 350 hours without degrading an output power of the transistor device by 1 dB or greater during a test condition. The test condition is associated with an operating frequency of the transistor device of about 31.5 GHz and a junction temperature of the transistor device of about 380° ° C.
Aspects of the present disclosure describe semiconductor DFB laser structures including both pumped and unpumped regions/sections wherein unpumped regions act as DBR reflector(s) while pumped regions act as DFB gratings. Semiconductor DFB laser devices according to aspects of the present disclosure include an active layer that extends the length of the device that is identical in both pumped and unpumped regions/sections.
H01S 5/0625 - Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
H01S 5/343 - Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser
RF transistor amplifiers include an RF transistor amplifier die having a Group III nitride-based semiconductor layer structure and a plurality of gate terminals, a plurality of drain terminals, and at least one source terminal that are each on an upper surface of the semiconductor layer structure, an interconnect structure on an upper surface of the RF transistor amplifier die, and a coupling element between the RF transistor amplifier die and the interconnect structure that electrically connects the gate terminals, the drain terminals and the source terminal to the interconnect structure.
An optical module configured to electrically connect to a host. A linear equalizer performs equalization on a host equalized signal to create a module equalized signal, and a driver configured to present the module equalized signal from the linear equalizer to an optical conversion device at a magnitude suitable for the optical conversion device. An optical conversion device receives the module equalized signal from the driver, converts the module equalized signal to an optical signal, and transmit the optical signal over an optical channel. Also part of the optical module is an interface which communicates supplemental equalizer settings to the host. A memory stores the supplemental equalizer settings which reflect the optical modules effect on a signal passing through the optical module. A controller oversees communication of the supplemental equalizer settings to the host such that the host uses the supplemental equalizer settings to modify host equalizer settings.
Aspects of the present disclosure describe semiconductor DFB laser structures including both pumped and unpumped regions/sections wherein unpumped regions act as DBR reflector(s) while pumped regions act as DFB gratings. Semiconductor DFB laser devices according to aspects of the present disclosure include an active layer that extends the length of the device that is identical in both pumped and unpumped regions/sections.
An amplifier circuit has a variable gain amplifier including an input receiving an input signal and an open-conduction output, and an output stage including an input coupled to the open-conduction output of the variable gain amplifier and an output providing an output signal of the amplifier circuit. The variable gain amplifier has a first transistor and second transistor each having a control input receiving the input signal. A third transistor has a control terminal receiving a control signal and a first conduction terminal coupled to a first conduction terminal of the first transistor and a second conduction terminal being a first terminal of the open-conduction output. A fourth transistor has a control terminal receiving the control signal and a first conduction terminal coupled to a first conduction terminal of the second transistor and a second conduction terminal being a second terminal of the open-conduction output.
Devices and methods including hot via die attach jetting are described. An example integrated circuit device includes a semiconductor substrate, vias extending from a top to a bottom surface of the substrate, and a metal layer on the bottom surface of the substrate. The metal layer includes a metal pad extending around a via opening at the bottom surface of the substrate. The metal pad is electrically isolated from a remainder of the metal layer. The device also includes one or more jet-dispensed dots of a conductive die attach adhesive material on the metal pad. Electrical connections made through the metal pad and jet-dispensed dots may be preferred as compared to wire bonds or flip chip approaches, particularly for RF input and output signals. The use of jet-dispensed dots can facilitate high-volume and automated process techniques.
H01L 23/538 - Arrangements for conducting electric current within the device in operation from one component to another the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
A transistor device may include a semiconductor structure including a channel layer and a barrier layer on the channel layer, wherein the barrier layer has a higher bandgap than the channel layer; a source contact and a drain contact on the barrier layer; a gate contact on the semiconductor structure between the source contact and the drain contact, the gate contact including a drain-side wing portion extending from a central portion of the gate contact; and a field plate on the semiconductor structure between the gate contact and the drain contact and laterally offset from the gate contact by a distance. The field plate may include a first wing portion extending from a central portion of the field plate.
H01L 23/48 - Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads or terminal arrangements
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
H01L 29/417 - Electrodes characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
Power amplifiers including balanced coaxial baluns are described. One example includes first and second amplifiers coupled to a balanced pair of first and second microstrip lines on a circuit board. A balun is coupled between the microstrip lines at a balanced end and between a conductive trace and a ground plane of the circuit board at an unbalanced end of the balun. The balun includes a coaxial balun line and a surface mount balancing inductor. The coaxial line includes center and shield conductors. A first end of the center conductor is coupled to the first microstrip line and a first end of the shield conductor is coupled to the second microstrip line at the balanced end of the balun. The balancing inductor is coupled between the first microstrip line and the ground plane to maintain symmetry for the balanced pair of microstrip lines.
H01P 5/10 - Coupling devices of the waveguide type for linking lines or devices of different kinds for coupling balanced with unbalanced lines or devices
Devices and methods including hot via die attach jetting are described. An example integrated circuit device includes a semiconductor substrate, vias extending from a top to a bottom surface of the substrate, and a metal layer on the bottom surface of the substrate. The metal layer includes a metal pad extending around a via opening at the bottom surface of the substrate. The metal pad is electrically isolated from a remainder of the metal layer. The device also includes one or more jet-dispensed dots of a conductive die attach adhesive material on the metal pad. Electrical connections made through the metal pad and jet-dispensed dots may be preferred as compared to wire bonds or flip chip approaches, particularly for RF input and output signals. The use of jet-dispensed dots can facilitate high-volume and automated process techniques.
An enhanced current mirror can be utilized to accurately control a bias current associated with an amplifier. A current controller component (CCC) can employ the enhanced current mirror and can be associated with the amplifier. The CCC can comprise a comparator that can compare an adjusted supply voltage level to a reference voltage level, the adjusted supply voltage level relating to a supply voltage level of a supply voltage supplied to the amplifier and CCC. The CCC can control switching of an operational state of a transistor of the comparator to switch in or out a resistance of a reference resistor component associated with the supply voltage, based on a result of the comparison of the adjusted supply voltage level to the reference voltage level, to facilitate accurately controlling an amount of bias current associated with the amplifier. The CCC and amplifier can be situated on the same die.
A radio frequency transistor amplifier package includes a package substrate with input, output, and ground terminals, and a transistor die on the package substrate. The transistor die includes a semiconductor structure having a plurality of transistors and gate, drain, and source contacts electrically coupled thereto. An inductance adjustment element is electrically coupled between the source contacts and the ground terminal, and is configured to provide a stability factor K of greater than or equal to 1 for a first operating frequency range of the transistor die. Related devices and methods are also discussed.
H01L 23/538 - Arrangements for conducting electric current within the device in operation from one component to another the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
H01L 25/16 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different main groups of groups , or in a single subclass of , , e.g. forming hybrid circuits
H03F 1/56 - Modifications of input or output impedances, not otherwise provided for
H03F 3/195 - High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only in integrated circuits
40.
ADAPTIVE TEMPERATURE PEAKING CONTROL FOR WIDEBAND AMPLIFIERS
Amplifiers with temperature-adaptive gain and peaking gain control are described. In one example, a temperature-adaptive amplifier includes an amplifier, a temperature sense circuit, and a peaking control level shifter to bias shift the output of the amplifier and adjust a peaking gain of the amplifier based on the temperature control signal. The peaking control level shifter can adjust a peaking gain of the amplifier based on the temperature control signal. The temperature-adaptive control can help to compensate for peaking gain in amplifiers based on the operating temperature of the amplifier. The control can help to compensate for unwanted changes in amplifier peaking gain, over time, resulting in more consistent peaking gain over the full operating frequency range of amplifiers.
H03F 1/30 - Modifications of amplifiers to reduce influence of variations of temperature or supply voltage
41.
SYMMETRICAL COMMON GATE DIRECT CURRENT BIAS NETWORK FOR STACKED FIELD EFFECT TRANSMITTER DISTRIBUTED HIGH-POWER AMPLIFIER, RELATED APPARATUSES AND RELATED METHODS
A symmetrical common gate direct current bias network for stacked field effect transmitter distributed high-power amplifier (400), related apparatus, and related method are provided. An apparatus includes a plurality of amplifier stages (206, 208, 210, 212) connected in parallel between an input port (RF_IN) and an output port (RF OUT). The apparatus can also include a first common gate voltage generator operatively connected at a first side of the plurality of amplifier stages and a second common gate voltage generator operatively connected at a second side of the plurality of amplifier stages (206, 208, 210, 212). The first common gate voltage generator can be operatively connected to the second common gate voltage generator in a symmetrical configuration.
H03F 1/02 - Modifications of amplifiers to raise the efficiency, e.g. gliding Class A stages, use of an auxiliary oscillation
H03F 1/22 - Modifications of amplifiers to reduce detrimental influences of internal impedances of amplifying elements by use of cascode coupling, i.e. earthed cathode or emitter stage followed by earthed grid or base stage respectively
H03F 3/60 - Amplifiers in which coupling networks have distributed constants, e.g. with waveguide resonators
H03F 3/195 - High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only in integrated circuits
42.
SYMMETRICAL COMMON GATE DIRECT CURRENT BIAS NETWORK FOR STACKED FIELD EFFECT TRANSMITTER DISTRIBUTED HIGH-POWER AMPLIFIER, RELATED APPARATUSES AND RELATED METHODS
A symmetrical common gate direct current bias network for stacked field effect transmitter distributed high-power amplifier, related apparatus, and related method are provided. An apparatus includes a plurality of amplifier stages connected in parallel between an input port and an output port. The apparatus can also include a first common gate voltage generator operatively connected at a first side of the plurality of amplifier stages and a second common gate voltage generator operatively connected at a second side of the plurality of amplifier stages. The first common gate voltage generator can be operatively connected to the second common gate voltage generator in a symmetrical configuration.
Aspects of the present disclosure describe a voice coil actuated leaf spring prober that advantageously may be operated to probe every individual device (device under test—DUT) comprising a contemporary wafer. The prober according to aspects of the present disclosure includes one or more probe needles attached in an electrically isolated arrangement to an end of a horizontal-U-shaped, recurved, leaf spring arrangement. The prober includes—for example—a voice coil actuator positioned within the horizontal-U-shaped portion of the leaf spring which—when operated—results in leaf spring displacement and probe needle movement such that it may mechanically/electrically contact the DUT.
Aspects of the present disclosure describe a voice coil actuated leaf spring prober that advantageously may be operated to probe every individual device (device under test – DUT) comprising a contemporary wafer. The prober according to aspects of the present disclosure includes one or more probe needles attached in an electrically isolated arrangement to an end of a horizontal-U-shaped, recurved, leaf spring arrangement. The prober includes – for example – a voice coil actuator positioned within the horizontal-Ushaped portion of the leaf spring which – when operated – results in leaf spring displacement and probe needle movement such that it may mechanically/electrically contact the DUT.
Efficiency improvements for multi-stage power amplifiers are described. In one example, a power amplifier includes a driver amplifier formed on a first semiconductor die using a first semiconductor fabrication process, an output amplifier formed on a second semiconductor die using a second semiconductor fabrication process, and an inter-stage matching network formed between the driver amplifier and the output amplifier. The first semiconductor fabrication process is a lower voltage process and the second semiconductor fabrication process is a higher voltage process. The use of the two different fabrication processes leads to a number of advantages, including the simplification of the inter-stage matching network, increased radio frequency bandwidth, and improved line-up efficiency among the stages of the power amplifier.
A transistor amplifier package includes a package substrate comprising conductive patterns exposed by solder mask patterns at a surface thereof, and at least one transistor die comprising a semiconductor structure attached to the surface of the package substrate by a solder material and aligned by the solder mask patterns such that respective gate, drain, and/or source terminals of the at least one transistor die are electrically connected to respective ones of the conductive patterns. Related transistor amplifiers and fabrication methods are also discussed.
RF transistor amplifiers include a Group III nitride-based RF transistor amplifier die that includes a semiconductor layer structure, a conductive source via that is connected to a source region of the Group III nitride-based RF transistor amplifier die, the conductive source via extending through the semiconductor layer structure, and an additional conductive via that extends through the semiconductor layer structure. A first end of the additional conductive via is connected to a first external circuit and a second end of the additional conductive via that is opposite the first end is connected to a first matching circuit.
Various aspects of Schottky diodes are described. The diodes are capable of withstanding reverse-bias voltages of up to and in excess of 2000 V with reverse current leakage as low as 0.4 microamp/millimeter in some cases among other aspects. In one example, a Schottky diode includes a conduction layer, a first layer over the conduction layer, a second layer over the first layer, a first cathode and a second cathode spaced apart and in electrical contact with the conduction layer, and an anode over the second layer between the first cathode and the second cathode. The first cathode and the second cathode can be electrically connected to each other as a cathode of the Schottky diode.
H01L 29/06 - Semiconductor bodies characterised by the shapes, relative sizes, or dispositions of the semiconductor regions
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
H01L 29/205 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds in different semiconductor regions
A transistor die includes a transistor including a control terminal, an output terminal, and a first partial matching circuit. The first partial matching circuit is connected to at least one of the control terminal of the transistor and the output terminal of the transistor, and is configured to tune an input impedance of the transistor die. A packaged device is also provided.
A radio frequency (RF) power amplifier device package includes a substrate and a first die attached to the substrate at a bottom surface of the first die. The first die includes top gate or drain contacts on a top surface of the first die opposite the bottom surface. At least one of the top gate or drain contacts is electrically connected to a respective bottom gate or drain contact on the bottom surface of the first die by a respective conductive via structure. An integrated interconnect structure, which is on the first die opposite the substrate, includes a first contact pad on the top gate contact or the top drain contact of the first die, and at least one second contact pad connected to a package lead, a contact of a second die, impedance matching circuitry, and/or harmonic termination circuitry.
H01L 23/538 - Arrangements for conducting electric current within the device in operation from one component to another the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
H01L 25/065 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices all the devices being of a type provided for in the same subgroup of groups , or in a single subclass of , , e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group
H01L 29/16 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System in uncombined form
H03F 3/193 - High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only with field-effect devices
H03F 3/195 - High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only in integrated circuits
H03F 3/213 - Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only in integrated circuits
51.
ARRAYED WAVEGUIDE GRATINGS WITH STABILIZED PERFORMANCE UNDER VARYING PARAMETERS
An arrayed waveguide grating device includes an input coupler configured to receive a light signal and split the light signal into a plurality of output light signals. The device also includes a plurality of waveguides optically connected to the input coupler, each waveguide having a plurality of waveguide portions having respective sensitivities to variance in one or more parameters associated with operating of the optical arrayed grating device. Lengths of the respective portions are determined such that each waveguide applies a respective phase shift to the output light signal that propagates through the waveguide and the plurality of waveguides have at least substantially same change in phase shift with respective changes in the one or more parameters associated with operation of the device. An output coupler is optically connected to the plurality of waveguides to map respective light signals output from the plurality of waveguides to respective focal positions.
G02B 6/12 - Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
52.
HIGH ELECTRON MOBILITY TRANSISTORS HAVING IMPROVED PASSIVATION STRUCTURES AND REDUCES DRAIN CURRENT DRIFT, AS WELL AS METHODS OF FABRICATING SUCH DEVICES
A high electron mobility transistor comprises a semiconductor layer structure that includes a channel layer (230) and a barrier layer (240) and source (250) and drain (252) contacts on the semiconductor layer structure. A gate contact (254) and a multi-layer passivation structure (262, 264, 266) are provided on the semiconductor layer structure between the gate contact (254) and the drain contact (252). The multi-layer passivation structure comprises at least first (262) and second (264) silicon nitride layers that have different material compositions. A spacer passivation layer (270) is provided at least between the gate contact (254) and the multi-layer passivation structure (262, 264, 266) on sidewalls of the first (262) and second (264) silicon nitride layers. A material composition of the spacer passivation layer (270) is different than a material composition of at least one of the layers of the multi-layer passivation structure (262, 264, 266). For example, the spacer passivation layer (270) may be a silicon nitride layer having a higher silicon content than the layers in the multi-layer passivation structure (262, 264, 266).
H01L 29/423 - Electrodes characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
H01L 21/338 - Field-effect transistors with a Schottky gate
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
53.
SEMICONDUCTOR STRUCTURES AND FABRICATION USING SUBLIMATION
Semiconductor structures and methods of fabricating semiconductor structures using sublimation are described. An example method includes forming an opening through a mask layer over a wafer. The wafer includes a substrate, a channel layer over the substrate, a barrier layer over the channel layer, and a cap layer over the barrier layer. The method also includes subliming away a region of the cap layer, within the opening in the mask layer, to form an opening in the cap layer down to a top surface of the barrier layer. The material properties of the cap layer, as compared to the barrier layer, can be relied upon to form the opening in the cap layer down to the top surface of the barrier layer using sublimation, with high selectivity. Sublimation will stop with higher precision and selectivity at the interface between the cap layer and the barrier layer, as compared to etching.
Semiconductor structures and methods of fabricating semiconductor structures using sublimation are described. An example method includes forming an opening through a mask layer over a wafer. The wafer includes a substrate, a channel layer over the substrate, a barrier layer over the channel layer, and a cap layer over the barrier layer. The method also includes subliming away a region of the cap layer, within the opening in the mask layer, to form an opening in the cap layer down to a top surface of the barrier layer. The material properties of the cap layer, as compared to the barrier layer, can be relied upon to form the opening in the cap layer down to the top surface of the barrier layer using sublimation, with high selectivity. Sublimation will stop with higher precision and selectivity at the interface between the cap layer and the barrier layer, as compared to etching.
H01L 29/08 - Semiconductor bodies characterised by the shapes, relative sizes, or dispositions of the semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified, or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
H01L 21/302 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
H01L 21/336 - Field-effect transistors with an insulated gate
H01L 29/778 - Field-effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT
H01L 21/337 - Field-effect transistors with a PN junction gate
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
H01L 29/10 - Semiconductor bodies characterised by the shapes, relative sizes, or dispositions of the semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified, or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
55.
SYMMETRICAL DOHERTY POWER AMPLIFIER HAVING IMPROVED EFFICIENCY
Apparatus and methods for an improved-efficiency Doherty amplifier are described. The Doherty amplifier may include a two-stage peaking amplifier that transitions from an “off” state to an “on” state later and more rapidly than a single-stage peaking amplifier used in a conventional Doherty amplifier. The improved Doherty amplifier may operate at higher gain values than a conventional Doherty amplifier, with no appreciable reduction in signal bandwidth.
Described herein are examples of improved semiconductor lasers having improved facet reliability for operation at high power and high current without significant change in device performance. The semiconductor laser may include a first semiconductor layer, an active layer, a second semiconductor layer sequentially adjacent to each other and arranged on a substrate, and a contact layer. In one example, the improved semiconductor laser may have a conductive contact less than the length of the semiconductor laser cavity and/or a dielectric layer arranged on at least one of the end portions of the contact layer.
A multi-stage driver circuit has a transmission line coupled to an output of the multi-stage driver circuit. The transmission line has inductive elements and programmable capacitive elements selected to shape the transmitted data signal. The programmable capacitive elements have a first capacitor with a first terminal coupled to a first power supply conductor, and a first transistor with a first conduction terminal coupled to a second terminal of the first capacitor, and a second conduction terminal coupled to a second power supply conductor. The programmable capacitive elements have a register with a first output coupled to a control terminal of the first transistor. The programmable capacitive elements are selected to shape the transmitted data signal by observing operational dynamics of the multi-stage driver circuit.
A multi-stage driver circuit (116) has a transmission line (119) coupled to an output of the multi-stage driver circuit (116). The transmission line (119) has inductive elements and programmable capacitive elements (130) selected to shape the transmitted data signal. The programmable capacitive elements (130) have a first capacitor with a first terminal coupled to a first power supply conductor, and a first transistor with a first conduction terminal coupled to a second terminal of the first capacitor, and a second conduction terminal coupled to a second power supply conductor. The programmable capacitive elements (130) have a register with a first output coupled to a control terminal of the first transistor. The programmable capacitive elements (130) are selected to shape the transmitted data signal by observing operational dynamics of the multi-stage driver circuit (116).
Aspects of temperature dependent stabilization and peaking control in amplifiers are described. An example amplifier includes a variable gain amplifier, a power amplifier, a variable compensation element coupled to the variable gain amplifier, and a controller that directs operation of the variable compensation element to adjust one or more operating characteristics of the amplifier. In one aspect, the variable compensation element comprises a variable impedance, and the controller varies the impedance across inputs of the variable gain amplifier based on temperature to stabilize the amplifier. In another aspect, the variable compensation element comprises a negative capacitance, and the controller varies a coupling of the negative capacitance across inputs of the variable gain amplifier based on temperature to linearize gain of the amplifier. The variable compensation element can include both a variable impedance and negative capacitance, and stability, peaking control, and linearity of the amplifier can be controlled.
Semiconductor structures that inhibit the conductivity of parasitic channels are described. In one example, a semiconductor structure includes a substrate, a III-nitride material region over a top surface of the substrate, a first species implanted within at least one region of surface region of the substrate in a first pattern spatially defined across a lateral dimension of the substrate, and a second species implanted within at least one region of the III-nitride material region. The second species can be implanted in a second pattern spatially defined across the lateral dimension of the substrate. The surface region of the substrate includes a parasitic channel. The at least one region of the substrate in which the first species is implanted includes a low-conductivity parasitic channel or is free of the parasitic channel.
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
H01L 29/205 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds in different semiconductor regions
H01L 29/778 - Field-effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT
H01L 29/10 - Semiconductor bodies characterised by the shapes, relative sizes, or dispositions of the semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified, or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
A distributed driver for an optic signal generator comprising amplifier cells having an amplifier cell input configured to receive the input signal and amplifiers configured to amplify the received signal to create an amplified signal, and an amplifier cell output. The distributed driver also includes an input path connected to the amplifier cell input to receive the input signal and distribute the input signal to the two or more amplifier cells. The input path includes one or more buffers configured to introduce a delay into the input signal. An output path is provided and connects to the amplifier cell outputs of the two or more amplifier cells. The output path is configured to receive the amplified signal and the output path includes one or more inductors that incorporated with the parasitic capacitance from the two or more amplifier cells form the LC segments of an artificial transmission line.
A distributed driver for an optic signal generator comprising amplifier cells having an amplifier cell input configured to receive the input signal and amplifiers configured to amplify the received signal to create an amplified signal, and an amplifier cell output. The distributed driver also includes an input path connected to the amplifier cell input to receive the input signal and distribute the input signal to the two or more amplifier cells. The input path includes one or more buffers configured to introduce a delay into the input signal. An output path is provided and connects to the amplifier cell outputs of the two or more amplifier cells. The output path is configured to receive the amplified signal and the output path includes one or more inductors that incorporated with the parasitic capacitance from the two or more amplifier cells form the LC segments of an artificial transmission line.
An amplifier circuit that includes an RF amplifier; an impedance matching network; a higher order harmonic termination circuit; a fundamental frequency matching circuit; and an integrated passive device (IPD) that includes a silicon carbide (SiC) substrate. The integrated passive device (IPD) includes one or more reactive components of the fundamental frequency matching circuit and one or more reactive components of the higher order harmonic termination circuit.
H01L 25/18 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different subgroups of the same main group of groups , or in a single subclass of ,
H01L 27/01 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate comprising only passive thin-film or thick-film elements formed on a common insulating substrate
H01L 25/065 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices all the devices being of a type provided for in the same subgroup of groups , or in a single subclass of , , e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group
H03F 1/56 - Modifications of input or output impedances, not otherwise provided for
H03F 3/195 - High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only in integrated circuits
64.
RADIO FREQUENCY POWER AMPLIFIER IMPLEMENTING A GAIN EQUALIZER AND A PROCESS OF IMPLEMENTING THE SAME
An amplifier includes an input impedance matching network; at least one transistor; and a gain equalizer configured to equalize gain. The gain equalizer is connected to components of the input impedance matching network.
A transistor device package includes a transistor die comprising a gate terminal, a drain terminal, and a source terminal, and a passive component assembly including the transistor die on a surface thereof and comprising one or more passive electrical components electrically coupled to the gate terminal, the drain terminal, and/or the source terminal. A mold structure may be provided on the one or more passive electrical components. One or more conductive pads may be exposed by the mold structure. A support structure may extend along one or more sides of the transistor die on the surface of the passive component assembly. The support structure may provide a cavity that extends around the transistor die, and/or may be thermally conductive. Related devices and component assemblies are also discussed.
H01L 25/16 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different main groups of groups , or in a single subclass of , , e.g. forming hybrid circuits
H01L 23/055 - Containers; Seals characterised by the shape the container being a hollow construction and having an insulating base as a mounting for the semiconductor body the leads having a passage through the base
H01L 23/367 - Cooling facilitated by shape of device
A tracking detector device for use in a free-space optics (FSO) system includes a position sensor and an optical receiver coupled to the bottom surface of the position sensor. The position sensor has an optical aperture configured to allow a portion of incoming light to pass through the position sensor and a plurality of position receivers located adjacent to the optical aperture and configured to sense portions of the incoming light. The tracking detector device may also include a focusing optic disposed adjacent to the bottom surface of the position sensor and configured to focus the portion of the incoming light that passed through the position sensor onto the optical receiver. The tracking detector may advantageously be employed in FSO communications systems and provide fully automated alignment with an incoming light beam under computer control.
A tracking detector device for use in a free-space optics (FSO) system includes a position sensor and an optical receiver coupled to the bottom surface of the position sensor. The position sensor has an optical aperture configured to allow a portion of incoming light to pass through the position sensor and a plurality of position receivers located adjacent to the optical aperture and configured to sense portions of the incoming light. The tracking detector device may also include a focusing optic disposed adjacent to the bottom surface of the position sensor and configured to focus the portion of the incoming light that passed through the position sensor onto the optical receiver. The tracking detector may advantageously be employed in FSO communications systems and provide fully automated alignment with an incoming light beam under computer control.
G01S 3/781 - Direction-finders for determining the direction from which infrasonic, sonic, ultrasonic, or electromagnetic waves, or particle emission, not having a directional significance, are being received using electromagnetic waves other than radio waves - Details
H04B 10/11 - Arrangements specific to free-space transmission, i.e. transmission through air or vacuum
68.
Printed circuit board configuration blocks and edge projections
Examples of printed circuit boards (PCBs) with board configuration blocks and board edge projections are described. In one example, a PCB includes a core material and a metal layer comprising a plurality of metal traces on the core material. The plurality of metal traces can include component interconnect traces and a board configuration block. The board configuration block can include a plan diagram for the PCB, an operational diagram for the PCB, or a combination of plan and operational diagrams. In other examples, a PCB can include a core material having a peripheral edge. The peripheral edge can include one or more board edge scheme projections positioned within projection edge regions of the peripheral edge. The scheme projections have a projection shape based on operational characteristics for the PCB. In some cases, the board configuration blocks can be located on the board edge scheme projections.
A baseline wander and offset correction system having inputs configured to receive input signals to be transmitted. Also part of the system is a driver circuit configured to receive and amplify the input signals. The driver circuit is configured with one or more transistors having an optional back bias terminal. A replica circuit receives the input signals and responsive thereto, generates back bias signals which are provided to the back bias terminal of the one or more transistors to change the back bias in response to the input signals having consecutive one values or consecutive zero values. This reduces the size of the one or more AC coupling capacitors located between the driver circuit and a channel. An embodiment may store back bias values in a memory. The back bias values are processed by DAC to generate the back bias signals for offset correction.
A number of Monolithic Microwave Integrated Circuit (MMIC) devices including combinations of PIN and Schottky diodes, with integrated passive electrical components fabricated and electrically connected among them, are described herein, along with new process techniques for forming the MMIC devices. In one example, a monolithic semiconductor includes a substrate, a plurality of layers of semiconductor materials over the substrate, Schottky and Ohmic contacts on a first subset of the plurality of layers for a Schottky diode, and PIN diode Ohmic contacts on a second subset of the plurality of layers for a PIN diode. The device can also include an etch stop layer between the first subset of the plurality of layers and the second subset of the plurality of layers. The etch stop layer facilitates selective etching and isolation of the Schottky diode from the PIN diode by consecutive etchings.
H01L 21/8252 - Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using III-V technology
71.
MONOLITHIC PIN AND SCHOTTKY DIODE INTEGRATED CIRCUITS
A number of Monolithic Microwave Integrated Circuit (MMIC) devices including combinations of PIN and Schottky diodes, with integrated passive electrical components fabricated and electrically connected among them, are described herein, along with new process techniques for forming the MMIC devices. In one example, a monolithic semiconductor includes a substrate, a plurality of layers of semiconductor materials over the substrate, Schottky and Ohmic contacts on a first subset of the plurality of layers for a Schottky diode, and PIN diode Ohmic contacts on a second subset of the plurality of layers for a PIN diode. The device can also include an etch stop layer between the first subset of the plurality of layers and the second subset of the plurality of layers. The etch stop layer facilitates selective etching and isolation of the Schottky diode from the PIN diode by consecutive etchings.
H01L 21/8252 - Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using III-V technology
H01L 27/06 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
H01L 27/08 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
A baseline wander and offset correction system having inputs configured to receive input signals to be transmitted. Also part of the system is a driver circuit configured to receive and amplify the input signals. The driver circuit is configured with one or more transistors having an optional back bias terminal. A replica circuit receives the input signals and responsive thereto, generates back bias signals which are provided to the back bias terminal of the one or more transistors to change the back bias in response to the input signals having consecutive one values or consecutive zero values. This reduces the size of the one or more AC coupling capacitors located between the driver circuit and a channel. An embodiment may store back bias values in a memory. The back bias values are processed by DAC to generate the back bias signals for offset correction.
H04B 1/38 - Transceivers, i.e. devices in which transmitter and receiver form a structural unit and in which at least one part is used for functions of transmitting and receiving
73.
PLASMA-BASED BARRIER LAYER REMOVAL METHOD FOR INCREASING PEAK TRANSCONDUCTANCE WHILE MAINTAINING ON-STATE RESISTANCE AND RELATED DEVICES
A transistor device includes a semiconductor structure comprising a channel layer and a barrier layer; source and drain contacts on the semiconductor structure; and a gate on the semiconductor structure between the source and drain contacts. A first portion of the barrier layer extending between the source or drain contact and the gate has a first thickness, a second portion of the barrier layer between the gate and the channel layer has a second thickness, and the first thickness is about 1.5 times to 4 times greater than the second thickness. Related methods of fabrication using a looped recess process are also discussed.
H01L 29/423 - Electrodes characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
H01L 29/205 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds in different semiconductor regions
H01L 29/778 - Field-effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT
H01L 21/285 - Deposition of conductive or insulating materials for electrodes from a gas or vapour, e.g. condensation
An acoustic wave resonator has a first conductive layer, piezoelectrical material formed over the first conductive layer, and second conductive layer formed over the piezoelectric material. An alignment of the first conductive layer, piezoelectric material and second conductive area defines an active region of the resonator and the active region includes a core area and a plurality of fractals extending from or recessed into the core area. The fractals maximize a perimeter-to-area ratio of the active region of the resonator. The fractals increase electromechanical coupling and a quality factor of the resonator. The fractals can have a star shape, rounded shape, asymmetric shape, or other shape that optimizes the perimeter-to-area ratio of the active region to maximize performance of the resonator. A frame can be disposed over or within the piezoelectric material. The frame is raised above the second conductive layer or recessed below the second conductive layer.
H03H 9/25 - Constructional features of resonators using surface acoustic waves
H03H 3/08 - Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
75.
ACOUSTIC WAVE RESONATOR WITH FRACTAL ACTIVE REGION AND METHOD OF FORMING IT
An acoustic wave resonator has a first conductive layer (210), piezoelectrical material (212) formed over the first conductive layer, and second conductive layer (214) formed over the piezoelectric material. An alignment of the first conductive layer, piezoelectric material and second conductive area defines an active region (226) of the resonator and the active region includes a core area and a plurality of fractals extending from or recessed into the core area. The fractals maximize a perimeter-to-area ratio of the active region of the resonator. The fractals increase electromechanical coupling and a quality factor of the resonator. The fractals can have a star shape, rounded shape, asymmetric shape, or other shape that optimizes the perimeter-to-area ratio of the active region to maximize performance of the resonator. A frame can be disposed over or within the piezoelectric material. The frame is raised above the second conductive layer or recessed below the second conductive layer.
H03H 9/13 - Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
H03H 9/145 - Driving means, e.g. electrodes, coils for networks using surface acoustic waves
H03H 9/17 - Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
H03H 3/04 - Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
Microstrip technology boards including microstrip traces matched over a range of different impedances are described. The microstrip boards include impedance-offset openings in ground planes under certain microstrip traces. The openings result in different effective dielectric constants and higher impedances for microstrip traces aligned with the openings, as compared to microstrip traces aligned over metal ground planes. The microstrip boards can also be mounted to conductive heatsinks. The conductive heatsinks act as ground planes for the microstrip traces aligned with the impedance-offset ground plane openings. The conductive heatsinks can include depressions co-located with the ground plane openings. Impedances of microstrip traces aligned with the ground plane openings are thus a function of the dielectric constant of the central core of the boards, the thickness of the central core, and the thickness of the air gap provided by the heatsink depressions.
H03F 1/08 - Modifications of amplifiers to reduce detrimental influences of internal impedances of amplifying elements
H03F 1/56 - Modifications of input or output impedances, not otherwise provided for
H03F 3/189 - High-frequency amplifiers, e.g. radio frequency amplifiers
H03F 3/19 - High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
H03F 3/50 - Amplifiers in which input is applied to, or output is derived from, an impedance common to input and output circuits of the amplifying element, e.g. cathode follower
H03F 1/10 - Modifications of amplifiers to reduce detrimental influences of internal impedances of amplifying elements by use of amplifying elements with multiple electrode connections
H03F 1/12 - Modifications of amplifiers to reduce detrimental influences of internal impedances of amplifying elements by use of attenuating means
Optical waveguides may include a substrate and a silicon based optical waveguide supported on the substrate. The silicon based optical waveguide may include a central ridge portion and a plurality of spaced apart wing portions connected through connecting portions. The number of wing portions may be greater than two. The central ridge portion may have a central ridge lateral width extent greater than a lateral width extent of at least one of the wing portions. Optical waveguides may include a substrate, a silicon based optical waveguide supported on the substrate, and a concentrator supported on the substrate and positioned within a lateral width extent of the silicon based optical waveguide and outside of a height extent of the silicon based optical waveguide. The optical waveguides may be included as part of an optical modulator.
G02F 1/025 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements with at least one potential jump barrier, e.g. PN, PIN junction in an optical waveguide structure
G02B 6/12 - Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
G02B 6/122 - Basic optical elements, e.g. light-guiding paths
78.
Circuit and Method of Providing Common Mode Suppression for Amplifier
A semiconductor device has an amplifier and common mode suppression (CMS) circuit formed on a common substrate. The CMS circuit has a first input and second input coupled for receiving an input signal and further has a first output coupled to a first input of the amplifier and a second output coupled to a second input of the amplifier to reduce common mode. The CMS circuit further has a ground plane, a first conductive trace disposed over the ground plane and coupled between the first input and first output, second conductive trace disposed over the ground plane and coupled between the second input and second output, and third conductive trace disposed over the ground plane with a first end of the third conductive trace coupled to the ground plane and a second end of the third conductive trace open circuit to form a resonator.
Semiconductor device packages and methods of manufacture are described. In one example, a semiconductor device package includes a flange, a frame secured to a major surface of the flange, with the frame forming an air cavity bounded in part by a surface of the flange, and at least one conductive lead that extends from outside the frame, through a portion of the frame, and is exposed within the air cavity for wire bonding. Other packages without air cavities are also described. The flange can incorporate a composite core material including diamond particles distributed in metal. The flange offers improved thermal conductivity, for greater heat dissipation from and additional performance of semiconductor devices within the packages. The flange exhibits thermal conductivity greater than that of Copper and other materials. The flange also exhibits a coefficient of thermal expansion suitable for bonding semiconductor die including GaN and SiC materials to the flange.
H01L 23/373 - Cooling facilitated by selection of materials for the device
H01L 23/057 - Containers; Seals characterised by the shape the container being a hollow construction and having an insulating base as a mounting for the semiconductor body the leads being parallel to the base
H01L 21/48 - Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups
80.
DIAMOND-METAL COMPOSITE HIGH POWER DEVICE PACKAGES
Semiconductor device packages and methods of manufacture are described. In one example, a semiconductor device package includes a flange, a frame secured to a major surface of the flange, with the frame forming an air cavity bounded in part by a surface of the flange, and at least one conductive lead that extends from outside the frame, through a portion of the frame, and is exposed within the air cavity for wire bonding. Other packages without air cavities are also described. The flange can incorporate a composite core material including diamond particles distributed in metal. The flange offers improved thermal conductivity, for greater heat dissipation from and additional performance of semiconductor devices within the packages. The flange exhibits thermal conductivity greater than that of Copper and other materials. The flange also exhibits a coefficient of thermal expansion suitable for bonding semiconductor die including GaN and SiC materials to the flange.
H01L 23/047 - Containers; Seals characterised by the shape the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body the other leads being parallel to the base
H01L 23/373 - Cooling facilitated by selection of materials for the device
Radio frequency (RF) power pallets including primary or first circuit boards and daughter or second circuit boards are described. An example RF power pallet includes a first circuit board comprising a first side, a second side, a first metal layer, and a second metal layer. The power pallet also includes an RF power amplifier coupled to the first metal layer and a second circuit board electrically coupled to the first metal layer. The second circuit board includes a bias voltage driver for the RF power amplifier, and the first metal layer includes a bias voltage trace that extends from a contact of the second circuit board to a gate of the power amplifier. The second circuit board extends the features of the RF pallet, while avoiding some increases in size, costs, and complexity that would typically be associated with the new features.
Techniques regarding patterning a silicon layer of a semiconductor device are provided. For example, one or more embodiments described herein can regard a method comprising positioning an etch stop layer between a dielectric layer and the silicon layer. Additionally, the method can comprise etching the silicon layer with a chemical etchant. Further, the etching can have a selectivity ratio characterizing etch rates of the silicon layer to the etch stop layer that is at least 200:1.
Semiconductor devices are provided that include a Group III nitride-based semiconductor layer structure. A first metal layer is formed on an upper surface of the semiconductor layer structure, a first dielectric layer is formed on an upper surface of the first metal layer, and a second metal layer is formed on an upper surface of the first dielectric layer. The first metal layer, the first dielectric layer and the second metal layer form a first capacitor. A second dielectric layer is formed on an upper surface of the second metal layer, a third dielectric layer is formed on an upper surface of the second dielectric layer, and a third metal layer is formed on upper surfaces of the second and third dielectric layers. The second metal layer, the second dielectric layer and the third metal layer form a second capacitor that is stacked on the first capacitor.
A semiconductor optical device includes a first facet bounding a first end of the semiconductor optical device. The semiconductor optical device further includes a waveguide having a first end proximate the first facet, the first end of the waveguide being tapered towards the first facet. The first facet has a curvature to increase modal reflectivity at a first interface at which the first end of the waveguide meets the first facet.
A semiconductor optical device (100) includes a first facet (110) bounding a first end of the semiconductor optical device (100). The semiconductor optical device further includes a waveguide (101) having a first end proximate the first facet (110), the first end of the waveguide being tapered towards the first facet (110). The first facet has a curvature to increase modal reflectivity at a first interface at which the first end of the waveguide (101) meets the first facet (110).
G02B 6/122 - Basic optical elements, e.g. light-guiding paths
G02F 1/00 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
G02B 6/136 - Integrated optical circuits characterised by the manufacturing method by etching
H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
A number of diode limiter semiconductor structures are described. The diode limiters can include a hybrid arrangement of diodes with different intrinsic regions, all formed over the same semiconductor substrate. In one example, a diode limiter includes a first diode having a first doped region formed to a first depth into an intrinsic layer of a semiconductor structure, a second diode having a second doped region formed to a second depth into the intrinsic layer of the semiconductor structure, and at least one passive component. The first diode includes a first effective intrinsic region of a first thickness, the second diode includes a second effective intrinsic region of a second thickness. The first thickness is greater than the second thickness. The passive component is over the intrinsic layer and electrically coupled as part of the diode limiter.
H01L 27/06 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
H01L 21/225 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regions; Redistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a solid phase, e.g. a doped oxide layer
H01L 21/265 - Bombardment with wave or particle radiation with high-energy radiation producing ion implantation
H01L 27/08 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
H01L 21/822 - Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
Techniques for efficient alignment of a semiconductor laser in a Photonic Integrated Circuit (PIC) are disclosed. In some embodiments, a photonic integrated circuit (PIC) may include a semiconductor laser that includes a laser mating surface, and a substrate that includes a substrate mating surface. A shape of the laser mating surface and a shape of the substrate mating surface may be configured to align the semiconductor laser with the substrate in three dimensions.
A transistor device includes a plurality of gate fingers that extend in a first direction and are spaced apart from each other in a second direction, each of the gate fingers comprising at least spaced-apart and generally collinear first and second gate finger segments that are electrically connected to each other. The first gate finger segments are separated from the second gate finger segments in the first direction by a gap region that extends in the second direction. A resistor is disposed in the gap region.
H01L 29/778 - Field-effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT
H01L 29/417 - Electrodes characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
H01L 29/423 - Electrodes characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
H01L 23/522 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
H01L 23/528 - Layout of the interconnection structure
H01L 29/06 - Semiconductor bodies characterised by the shapes, relative sizes, or dispositions of the semiconductor regions
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
H01L 29/205 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds in different semiconductor regions
89.
SEMICONDUCTOR LASERS AND PROCESSES FOR THE PLANARIZATION OF SEMICONDUCTOR LASERS
A laser structure may include a substrate, an active region arranged on the substrate, and a waveguide arranged on the active region. The waveguide may include a first surface and a second surface that join to form a first angle relative to the active region. A material may be deposited on the first surface and the second surface of the waveguide.
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H01L 21/68 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for positioning, orientation or alignment
H01S 5/22 - Structure or shape of the semiconductor body to guide the optical wave having a ridge or a stripe structure
H01S 5/10 - Construction or shape of the optical resonator
H01S 5/02 - Structural details or components not essential to laser action
H01S 5/343 - Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser
90.
METHODS, SYSTEMS, AND APPARATUSES FOR PASSIVE OPTICAL NETWORKS
In various embodiments, the present disclosure includes a system for sending 50 gigabits per second (Gbps), 75 Gbps, and 100 Gbps at 50 gigabaud (GBaud) for passive optical networks (PON) downstream and upstream. The system allows for transmission of three data rates at a single baud-rate while only using 2-bits of information per sample. A motivation for sending three data rates at a single baud-rate is to allow for further granularity in the control of the data-rates for downstream and upstream traffic in a flexible PON system based on the link margin. For example, the system can use non-return-to-zero (NRZ) at 50 GBaud for 50 Gbps and can use four-level pulse-amplitude modulation (PAM-4) at 50 GBaud for 100 Gbps. In addition for 75 Gbps, a double square-8 (DSQ-8) constellation can be used at 50 GBaud.
A multi-level optical signal is sampled to generate an eye diagram. The signal can be adjusted when eyes in the eye diagram have different heights. More specifically, a first value is determined, and the height of a first eye is adjusted using the first value. The first value is multiplied by a stored factor to produce a second value, and the height of a second eye is adjusted using the second value, and so on for other eyes. As a result, eye heights are the same. Similarly, optical power levels of the signal can be adjusted when the levels are not equally spaced. As a result, the optical power levels are equally spaced.
H04B 10/079 - Arrangements for monitoring or testing transmission systems; Arrangements for fault measurement of transmission systems using an in-service signal using measurements of the data signal
In various embodiments, the present disclosure includes a system for sending 50 gigabits per second (Gbps), 75 Gbps, and 100 Gbps at 50 gigabaud (GBaud) for passive optical networks (PON) downstream and upstream. The system allows for transmission of three data rates at a single baud-rate while only using 2-bits of information per sample. A motivation for sending three data rates at a single baud-rate is to allow for further granularity in the control of the data-rates for downstream and upstream traffic in a flexible PON system based on the link margin. For example, the system can use non-return-to-zero (NRZ) at 50 GBaud for 50 Gbps and can use four-level pulse-amplitude modulation (PAM-4) at 50 GBaud for 100 Gbps. In addition for 75 Gbps, a double square-8 (DSQ-8) constellation can be used at 50 GBaud.
Structures for suppressing parasitic acoustic waves in semiconductor structures and integrated circuit devices are described. Such integrated circuit devices can, typically, produce undesirable acoustic wave resonances, and the acoustic waves can degrade the performance of the devices. In that context, some embodiments described herein relate to spoiling a conductive path that participates in the generation of acoustic waves. Some embodiments relate to spoiling acoustic characteristics of an acoustic resonant structure that may be present in the vicinity of the device. Combined embodiments that spoil the conductive path and acoustic characteristics are also possible.
H01L 29/06 - Semiconductor bodies characterised by the shapes, relative sizes, or dispositions of the semiconductor regions
H01L 29/778 - Field-effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT
H01L 29/10 - Semiconductor bodies characterised by the shapes, relative sizes, or dispositions of the semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified, or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
H01L 29/267 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, elements provided for in two or more of the groups , , , , in different semiconductor regions
94.
Device having a coupled interstage transformer and process implementing the same
A device that includes a metal submount; a first transistor die arranged on said metal submount; a second transistor die arranged on said metal submount; a set of primary interconnects; and a set of secondary interconnects. Additionally, the set of primary interconnects and the set of secondary interconnects are configured to provide RF signal coupling between the first transistor die and the second transistor die by electromagnetic coupling.
H01L 25/00 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices
H01L 25/18 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different subgroups of the same main group of groups , or in a single subclass of ,
95.
MICROWAVE INTEGRATED CIRCUITS INCLUDING GALLIUM-NITRIDE DEVICES ON SILICON
Various integrated circuits formed using gallium nitride and other materials are described. In one example, an integrated circuit includes a first integrated device formed over a first semiconductor structure in a first region of the integrated circuit, a second integrated device formed over a second semiconductor structure in a second region of the integrated circuit, and a passive component formed over a third region of the integrated circuit, between the first region and the second region. The third region comprises an insulating material, which can be glass in some cases. The insulating material extends through the semiconductor substrate and separates the semiconductor substrate between the first semiconductor structure and the second semiconductor structure.
H01L 27/06 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
H01L 21/8258 - Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using a combination of technologies covered by , , or
Various methods of forming integrated circuits formed using gallium nitride and other materials are described. An example method includes forming a first integrated device over a first semiconductor structure in a first region of the integrated circuit, forming a second integrated device over a second semiconductor structure in a second region of the integrated circuit, etching a cavity in a third region of the of the integrated circuit located between the first region and the second region, filling the cavity with an insulating material, and forming a passive component over the insulating material in the third region of the integrated circuit. In other aspects, the method can include grinding a back side of a semiconductor substrate of the integrated circuit to electrically isolate the first semiconductor structure from the second semiconductor structure and, after the grinding, forming a ground plane over the back side of the semiconductor substrate.
H01L 27/06 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
H01L 21/8258 - Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using a combination of technologies covered by , , or
A metal-insulator-metal (MIM) capacitor component that includes a substrate, where the metal-insulator-metal (MIM) capacitor component is configured to form a first capacitor with a top metal and a first bottom metal having a dielectric layer therebetween; and where the metal-insulator-metal (MIM) capacitor component is configured to form a second capacitor with the top metal and a second bottom metal having the dielectric layer therebetween. Additionally, the top metal, the dielectric layer, the first bottom metal, and the second bottom metal are arranged on the substrate.
H01L 23/522 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
H01L 27/08 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
98.
METHOD AND APPARATUS FOR ELECTROMIGRATION REDUCTION
A semiconductor circuit configured to reduce electromigration. The circuit comprises a power rail and ground rail located on a first layer. A power finger and a ground finger are located on a second layer. Cells are located on the second layer, such that the one or more cells are electrically connected to a power finger and a ground finger. The circuit also includes one or more power vias electrically connecting the power rail to the power finger. The one or more power vias extend from the first layer to the second layer. One or more ground vias electrically connecting the ground rail to the ground finger, such that the one or more ground vias extend from the first layer to the second layer. The placement of the fingers on a different level than the rails establishing the fingers as non-contiguous sections thereby reducing electromigration and overcoming design analysis errors.
H01L 23/528 - Layout of the interconnection structure
H01L 23/522 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
99.
MULTI-TYPED INTEGRATED PASSIVE DEVICE (IPD) COMPONENTS AND DEVICES AND PROCESSES IMPLEMENTING THE SAME
A transistor device includes a metal submount; a transistor die arranged on said metal submount; a first integrated passive device (IPD) component that includes a first substrate arranged on said metal submount; and a second integrated passive device (IPD) component that includes a second substrate arranged on the metal submount. Additionally, the first substrate is a different material from the second substrate.
H01L 25/16 - Assemblies consisting of a plurality of individual semiconductor or other solid state devices the devices being of types provided for in two or more different main groups of groups , or in a single subclass of , , e.g. forming hybrid circuits
100.
IPD COMPONENTS HAVING SIC SUBSTRATES AND DEVICES AND PROCESSES IMPLEMENTING THE SAME
A transistor device includes a metal submount; a transistor die arranged on said metal submount; at least one integrated passive device (IPD) component that includes a substrate arranged on said metal submount; and one or more interconnects extending between the transistor die and the at least one integrated passive device (IPD) component. The substrate includes a silicon carbide (SiC) substrate.
