An epoxy resin curing agent includes: a component (a1), which is a polyether polyamine; a component (a2), which is an aliphatic polyamine having an alicyclic structure; and a component (a3), which is an aliphatic polyamine having an aromatic ring. Also provided are: an epoxy resin composition and a cured product thereof; a fiber-reinforced composite material comprising the cured product of the epoxy resin composition and a reinforcing fiber; and a wind power generation blade.
In order to provide a film forming material for lithography or the like that has high film formability and solvent solubility, is applicable to a wet process, is excellent in curability, film heat resistance, film etching resistance, embedding properties to a substrate having difference in level, and film flatness, and is useful for forming a photoresist underlayer film, a film forming material for lithography according to the present disclosure contains a compound having an amino group bonded to an aromatic ring, and the compound is one represented by, for example, formula (1A), formula (1B), formula (2), formula (3), formula (4), or the like, as described in the specification.
G03F 7/11 - Matériaux photosensibles - caractérisés par des détails de structure, p.ex. supports, couches auxiliaires avec des couches de recouvrement ou des couches intermédiaires, p.ex. couches d'ancrage
Provided is a multilayer hollow container including: a polyester layer containing a polyester resin (X); and a polyamide layer containing a polyamide resin (Y) and a yellowing inhibitor (A) with the polyamide layer being an intermediate layer and being present from a ground contact portion to a position of from 10 to 70% of a height of the multilayer hollow container. Also provided are a method for manufacturing the multilayer hollow container, and a method for manufacturing a recycled polyester, the method thereof including a step of recovering polyester from the multilayer hollow container.
B32B 27/08 - Produits stratifiés composés essentiellement de résine synthétique comme seul composant ou composant principal d'une couche adjacente à une autre couche d'une substance spécifique d'une résine synthétique d'une sorte différente
B32B 27/18 - Produits stratifiés composés essentiellement de résine synthétique caractérisée par l'emploi d'additifs particuliers
B32B 27/34 - Produits stratifiés composés essentiellement de résine synthétique comprenant des polyamides
B32B 27/36 - Produits stratifiés composés essentiellement de résine synthétique comprenant des polyesters
B65D 1/02 - Bouteilles ou réceptacles similaires, à cols ou à ouvertures rétrécies analogues, conçus pour verser le contenu
An object of the present invention is to provide a resin composition and a resin sheet which have excellent photocurability for an active energy ray including an i-line with a wavelength of 365 nm in an exposure step, and can confer excellent alkaline developability in a development step, in the fabrication of a multilayer printed wiring board; and a high density printed wiring board and semiconductor device having a highly detailed resist pattern using the same. The resin composition of the present invention contains: a maleimide compound (A) containing a constituent unit represented by the following formula (1), and maleimide groups at both ends of the molecular chain; and a photo initiator (B) having an absorbance of 2.0 or more at a wavelength of 365 nm (i-line):
An object of the present invention is to provide a resin composition and a resin sheet which have excellent photocurability for an active energy ray including an i-line with a wavelength of 365 nm in an exposure step, and can confer excellent alkaline developability in a development step, in the fabrication of a multilayer printed wiring board; and a high density printed wiring board and semiconductor device having a highly detailed resist pattern using the same. The resin composition of the present invention contains: a maleimide compound (A) containing a constituent unit represented by the following formula (1), and maleimide groups at both ends of the molecular chain; and a photo initiator (B) having an absorbance of 2.0 or more at a wavelength of 365 nm (i-line):
A foamable resin composition for molding a polyhydroxyurethane resin foam, including: the foamable resin composition including a foamable curing agent (A) including a reaction product (a2) of an amine compound (a1), and carbon dioxide and a cyclic carbonate compound (B) having 2 or more cyclic carbonate groups; a polyhydroxyurethane resin foam obtained by foam molding the foamable resin composition; a method for producing a polyhydroxyurethane resin foam including a step of foam molding the foamable resin composition; and a foamable curing agent for molding a polyhydroxyurethane resin foam, including a reaction product (a2) of an amine compound (a1) and carbon dioxide.
C08J 9/08 - Mise en œuvre de substances macromoléculaires pour produire des matériaux ou objets poreux ou alvéolaires; Leur post-traitement utilisant des gaz de gonflage produits par un agent de gonflage introduit au préalable par un agent chimique de gonflage dégageant de l'anhydride carbonique
According to the present invention, there can be provided a thermoplastic resin comprising a constituent unit (A) derived from a monomer represented by the following general formula (1):
According to the present invention, there can be provided a thermoplastic resin comprising a constituent unit (A) derived from a monomer represented by the following general formula (1):
wherein
R1 to R12, Rk, and Rp each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a cycloalkyl group containing 5 to 20 carbon atoms, a cycloalkoxyl group containing 5 to 20 carbon atoms, an aryl group containing 6 to 20 carbon atoms, a linear or branched alkyl group containing 1 to 10 carbon atoms, an alkenyl group containing 2 to 10 carbon atoms, an alkoxy group containing 1 to 10 carbon atoms, a heteroaryl group containing 6 to 20 carbon atoms, which comprises one or more heterocyclic atoms selected from O, N and S, or an aralkyl group containing 7 to 20 carbon atoms, and
X and Y represent a single bond or an alkylene group containing 1 to 5 carbon atoms, i and ii each independently represent an integer of 0 to 4, and K1 and K2 each independently represent —OH, —COOH, or —COORq, wherein Rq represents an alkyl group containing 1 to 5 carbon atoms.
G02B 1/04 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques caractérisés par la substance dont ils sont faits; Revêtements optiques pour éléments optiques faits de substances organiques, p.ex. plastiques
An object of the present invention is to provide a resin composition which does not inhibit photocuring reaction in an exposure step, and can confer excellent alkaline developability in a development step, when used in the fabrication of a multilayer printed wiring board; and a resin sheet, a multilayer printed wiring board, and a semiconductor device. The resin composition of the present invention contains: a compound (A) represented by the following formula (1); and a compound (B) containing one or more carboxy groups, other than the compound (A) represented by the following formula (1):
An object of the present invention is to provide a resin composition which does not inhibit photocuring reaction in an exposure step, and can confer excellent alkaline developability in a development step, when used in the fabrication of a multilayer printed wiring board; and a resin sheet, a multilayer printed wiring board, and a semiconductor device. The resin composition of the present invention contains: a compound (A) represented by the following formula (1); and a compound (B) containing one or more carboxy groups, other than the compound (A) represented by the following formula (1):
wherein each R1 independently represents a group represented by the following formula (2) or a hydrogen atom; and each R2 independently represents a hydrogen atom, or a linear or branched alkyl group having 1 to 6 carbon atoms, provided that at least one R1 is a group represented by the following formula (2):
An object of the present invention is to provide a resin composition which does not inhibit photocuring reaction in an exposure step, and can confer excellent alkaline developability in a development step, when used in the fabrication of a multilayer printed wiring board; and a resin sheet, a multilayer printed wiring board, and a semiconductor device. The resin composition of the present invention contains: a compound (A) represented by the following formula (1); and a compound (B) containing one or more carboxy groups, other than the compound (A) represented by the following formula (1):
wherein each R1 independently represents a group represented by the following formula (2) or a hydrogen atom; and each R2 independently represents a hydrogen atom, or a linear or branched alkyl group having 1 to 6 carbon atoms, provided that at least one R1 is a group represented by the following formula (2):
wherein -* represents a bonding hand.
C09D 151/00 - Compositions de revêtement à base de polymères greffés dans lesquels le composant greffé est obtenu par des réactions faisant intervenir uniquement des liaisons non saturées carbone-carbone; Compositions de revêtement à base de dérivés de tels polymères
C08F 267/10 - Composés macromoléculaires obtenus par polymérisation de monomères sur des polymères d'acides polycarboxyliques non saturés ou de leurs dérivés tels que définis dans le groupe sur des polymères d'amides ou d'imides
Provided is an etching composition for a semiconductor substrate for a memory element capable of providing a semiconductor substrate for a memory element having improved performance. The etching composition for a semiconductor substrate for a memory element comprises: (A) an oxidizing agent; (B) a fluorine compound; and (C) a metal tungsten corrosion inhibitor, wherein (C) the metal tungsten corrosion inhibitor contains at least one selected from the group consisting of an ammonium salt represented by formula (1) and a heteroaryl salt having a C14-C30 alkyl group.
Provided is an etching composition for a semiconductor substrate for a memory element capable of providing a semiconductor substrate for a memory element having improved performance. The etching composition for a semiconductor substrate for a memory element comprises: (A) an oxidizing agent; (B) a fluorine compound; and (C) a metal tungsten corrosion inhibitor, wherein (C) the metal tungsten corrosion inhibitor contains at least one selected from the group consisting of an ammonium salt represented by formula (1) and a heteroaryl salt having a C14-C30 alkyl group.
C09K 13/08 - Compositions pour l'attaque chimique, la gravure, le brillantage de surface ou le décapage contenant un acide inorganique contenant un composé du fluor
H01L 29/49 - Electrodes du type métal-isolant-semi-conducteur
H10B 12/00 - Mémoires dynamiques à accès aléatoire [DRAM]
An object of the present invention is to provide a resin composition which has excellent photocurability for various active energy rays, in particular, an active energy ray including an h-line at a wavelength of 405 nm, without inhibiting photocuring reaction in an exposure step, and can confer excellent alkaline developability in a development step, when used in the fabrication of a multilayer printed wiring board; and a resin sheet, a multilayer printed wiring board, and a semiconductor device. The resin composition of the present invention is a resin composition containing: a maleimide compound (A) containing a constituent unit represented by the formula (1), and maleimide groups at both ends of the molecular chain; a photo initiator (B1) represented by the formula (2) and/or a photo initiator (B2) represented by the formula (3); and a photo initiator (C) represented by the formula (4):
An object of the present invention is to provide a resin composition which has excellent photocurability for various active energy rays, in particular, an active energy ray including an h-line at a wavelength of 405 nm, without inhibiting photocuring reaction in an exposure step, and can confer excellent alkaline developability in a development step, when used in the fabrication of a multilayer printed wiring board; and a resin sheet, a multilayer printed wiring board, and a semiconductor device. The resin composition of the present invention is a resin composition containing: a maleimide compound (A) containing a constituent unit represented by the formula (1), and maleimide groups at both ends of the molecular chain; a photo initiator (B1) represented by the formula (2) and/or a photo initiator (B2) represented by the formula (3); and a photo initiator (C) represented by the formula (4):
Proposed is a holding tool that satisfies physical properties of a flexural modulus in a circumferential direction of 50 GPa or more and a warpage of not more than 0.5 mm. The holding tool is configured using carbon fibers and a resin, has a substantially annular shape, and includes a first resin layer. In the first resin layer, the longitudinal direction of the fibers is aligned along the circumferential direction of the substantially annular shape.
H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension
B32B 1/00 - Produits stratifiés ayant essentiellement une forme générale autre que plane
B32B 27/08 - Produits stratifiés composés essentiellement de résine synthétique comme seul composant ou composant principal d'une couche adjacente à une autre couche d'une substance spécifique d'une résine synthétique d'une sorte différente
B32B 27/20 - Produits stratifiés composés essentiellement de résine synthétique caractérisée par l'emploi d'additifs particuliers utilisant des charges, des pigments, des agents thixotropiques
B32B 27/28 - Produits stratifiés composés essentiellement de résine synthétique comprenant des copolymères de résines synthétiques non complètement couverts par les sous-groupes suivants
B33Y 80/00 - Produits obtenus par fabrication additive
11.
ALICYCLIC ALCOHOL, ALICYCLIC ALCOHOL COMPOSITION, AND PERFUME COMPOSITION
An alicyclic alcohol represented by General Formula (1) below, and an alicyclic alcohol composition comprising the alicyclic alcohol, is described:
An alicyclic alcohol represented by General Formula (1) below, and an alicyclic alcohol composition comprising the alicyclic alcohol, is described:
An alicyclic alcohol represented by General Formula (1) below, and an alicyclic alcohol composition comprising the alicyclic alcohol, is described:
The alicyclic alcohol composition may comprise an alicyclic alcohol represented by Formula (3) below and an alicyclic alcohol represented by Formula (4) below:
An alicyclic alcohol represented by General Formula (1) below, and an alicyclic alcohol composition comprising the alicyclic alcohol, is described:
The alicyclic alcohol composition may comprise an alicyclic alcohol represented by Formula (3) below and an alicyclic alcohol represented by Formula (4) below:
An alicyclic alcohol represented by General Formula (1) below, and an alicyclic alcohol composition comprising the alicyclic alcohol, is described:
The alicyclic alcohol composition may comprise an alicyclic alcohol represented by Formula (3) below and an alicyclic alcohol represented by Formula (4) below:
A fragrance composition is also disclosed, which comprises the alicyclic alcohol represented by General Formula (1).
A61Q 13/00 - Formulations ou additifs pour les préparations de parfums
C07C 29/141 - Préparation de composés comportant des groupes hydroxyle ou O-métal liés à un atome de carbone ne faisant pas partie d'un cycle aromatique à six chaînons par réduction d'un groupe fonctionnel contenant de l'oxygène de groupes contenant C=O, p.ex. —COOH d'un groupe —CHO avec de l'hydrogène ou des gaz contenant de l'hydrogène
Provided is a method for producing aqueous hydrogen peroxide solution, the method capable of reducing impurities such as organic substances and preventing the occurrence of foaming and odor. The solution for the aforementioned problems is a method for producing a purified aqueous hydrogen peroxide solution, the method including a predetermined osmosis membrane treatment process of bringing a crude aqueous hydrogen peroxide solution containing impurities into contact with a reverse osmosis membrane. That is, the aforementioned problems are solved by a method for producing a purified aqueous hydrogen peroxide solution, in which a first integrated value that is the integrated value of the pressure and the linear velocity are adjusted so that the pressure of reverse osmosis membrane (MPaG) and the linear velocity of the aqueous hydrogen peroxide solution (m3/(m2·h)) is less than 0.15 in the osmosis membrane treatment process.
B01D 69/02 - Membranes semi-perméables destinées aux procédés ou aux appareils de séparation, caractérisées par leur forme, leur structure ou leurs propriétés; Procédés spécialement adaptés à leur fabrication caractérisées par leurs propriétés
An object of the present invention is to provide a resin composition which has excellent photocurability for various active energy rays without inhibiting photocuring reaction in an exposure step, and can confer excellent alkaline developability in a development step, when used in the fabrication of a multilayer printed wiring board, while the resulting insulation layer has excellent adhesiveness to an adhesive metal such as titanium; and a resin sheet, a multilayer printed wiring board, and a semiconductor device. The resin composition of the present invention is a resin composition containing: a bismaleimide compound (A) containing a constituent unit represented by the following formula (1), and maleimide groups at both ends of the molecular chain; and an imidazole compound (B) represented by the following formula (2):
An object of the present invention is to provide a resin composition which has excellent photocurability for various active energy rays without inhibiting photocuring reaction in an exposure step, and can confer excellent alkaline developability in a development step, when used in the fabrication of a multilayer printed wiring board, while the resulting insulation layer has excellent adhesiveness to an adhesive metal such as titanium; and a resin sheet, a multilayer printed wiring board, and a semiconductor device. The resin composition of the present invention is a resin composition containing: a bismaleimide compound (A) containing a constituent unit represented by the following formula (1), and maleimide groups at both ends of the molecular chain; and an imidazole compound (B) represented by the following formula (2):
The present invention provides a method for producing 2-furonitrile by dehydrating 2-furamide in the presence of an Mo/SiO2 catalyst in which molybdenum (Mo) is supported on a carrier formed from SiO2. Further, a preferred embodiment of the present invention involves dehydration in the presence of a desiccant such as a molecular sieve.
B01D 53/14 - SÉPARATION Épuration chimique ou biologique des gaz résiduaires, p.ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols par absorption
15.
RESIN COMPOSITION, PREPREG, RESIN SHEET, LAMINATE, METAL FOIL-CLAD LAMINATE, AND PRINTED WIRING BOARD
A resin composition is provided having a high permittivity and a low dissipation factor, and having excellent moisture absorption and heat resistance, a high glass transition temperature, a low coefficient of thermal expansion, and good coatability and appearance, and used for producing an insulation layer of a printed wiring board; and a prepreg, a resin sheet, a laminate, a metal foil-clad laminate, and a printed wiring board. The resin composition contains: (A) a cyanate ester compound, (B) a maleimide compound, and (C) a surface-coated titanium oxide, wherein a content of the cyanate ester compound (A) is 1 to 65 parts by mass, based on 100 parts by mass of a total resin solid content in the resin composition, and a content of the maleimide compound (B) is 15 to 85 parts by mass, based on 100 parts by mass of a total resin solid content in the resin composition.
C09D 161/28 - Polymères de condensation obtenus uniquement à partir d'aldéhydes ou de cétones avec des composés contenant de l'hydrogène lié à l'azote d'aldéhydes avec des composés hétérocycliques avec la mélamine
C08G 73/10 - Polyimides; Polyester-imides; Polyamide-imides; Polyamide-acides ou précurseurs similaires de polyimides
C08K 9/02 - Ingrédients traités par des substances inorganiques
C08K 9/04 - Ingrédients traités par des substances organiques
C08L 61/28 - Polymères de condensation obtenus uniquement à partir d'aldéhydes ou de cétones avec des composés contenant de l'hydrogène lié à l'azote d'aldéhydes avec des composés hétéro cycliques avec la mélamine
An acid dianhydride represented by the following formula (1):
An acid dianhydride represented by the following formula (1):
wherein R1 to R8 each independently represent a hydrogen atom or an organic group having 1 to 10 carbon atoms; and A represents the following structure.
An acid dianhydride represented by the following formula (1):
wherein R1 to R8 each independently represent a hydrogen atom or an organic group having 1 to 10 carbon atoms; and A represents the following structure.
An amino compound useful for an epoxy resin curing agent and a method for producing the same. The amino compound has a quaternary carbon at the β-position of an amino group and is represented by the following formula (1),
An amino compound useful for an epoxy resin curing agent and a method for producing the same. The amino compound has a quaternary carbon at the β-position of an amino group and is represented by the following formula (1),
An amino compound useful for an epoxy resin curing agent and a method for producing the same. The amino compound has a quaternary carbon at the β-position of an amino group and is represented by the following formula (1),
In formula (1), A is any of: (α) a hydrocarbon group having one or more —O— bond bonded to the carbon at the γ-position of the amino group; (β) a hydrocarbon group having one or more —O— bond bonded to the carbon at the γ-position of the amino group while bonding to any one of R1 to R4; and (γ) a hydrocarbon group having one or more —O— bond bonded to the carbon at the γ-position of the amino group while bonding to R1 or R2 and R3 or R4. In formula (1), R1 to R4 are each independently a hydrocarbon group having 1 to 10 carbon atoms.
Provided are a resin composition containing a xylylenediamine-based polyamide resin, which has a short half crystallization time, is capable of effectively suppressing a decrease in Charpy impact strength, and further has small temperature dependence of half crystallization time, and a molded product formed from the resin composition. A resin composition containing a polyamide resin, a reinforcing material, and an inorganic crystallization nucleating agent,
wherein the polyamide resin contains a xylylenediamine-based polyamide resin containing diamine-derived structural units and dicarboxylic acid-derived structural units, 70 mol % or greater of the diamine-derived structural units being derived from a xylylenediamine, and 70 mol % or greater of the dicarboxylic acid-derived structural units being derived from an α,ω-linear aliphatic dicarboxylic acid having from 4 to 20 carbon atoms;
the inorganic crystallization nucleating agent has an area measured according to a specific surface area measurement method (BET method) of greater than 8.0 m2/g; and
a content of the inorganic crystallization nucleating agent is 2.0 mass % or greater of the resin composition.
One embodiment provides an anti-reflection film or the like that is a layered product having low surface reflectivity, excellent thermoformability, and, in particular, satisfactory abrasion resistance.
One embodiment provides an anti-reflection film or the like that is a layered product having low surface reflectivity, excellent thermoformability, and, in particular, satisfactory abrasion resistance.
The anti-reflection film comprises:
a base material layer including a thermoplastic resin; and
a low-refractive-index layer that is arranged on at least one surface of the base material layer and that has a refractive index lower than the refractive index of the base material layer, wherein
the low-refractive-index layer includes a polymer of a resin material including:
a urethane (meth)acrylate derived from
(a1) an aromatic diisocyanate compound and
(a2) one or more (meth)acryloyl compounds having a hydroxyl group and a (meth)acryloyl group per molecule; and
a (meth)acrylate.
Provided are a glycidyl (meth)acrylate composition, which includes a phenolic polymerization inhibitor that is unlikely to deteriorate such that the glycidyl (meth)acrylate composition can be stably stored for a long period of time, and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate resin composition. More specifically, provided are: a glycidyl (meth)acrylate composition including a glycidyl (meth)acrylate, a quaternary ammonium salt, a strong acid salt, and a phenolic polymerization inhibitor; and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate composition, the method including adjusting the content of a strong acid salt in the glycidyl (meth)acrylate composition to a certain amount relative to an amount of a quaternary ammonium salt by mole.
A cleaning composition for semiconductor substrates, containing an alkaline compound (A), a corrosion inhibitor (B), and water, wherein the alkaline compound (A) is at least one selected from the group consisting of a quaternary ammonium hydroxide (A1) and potassium hydroxide (A2), and the corrosion inhibitor (B) is at least one selected from the group consisting of 4-substituted pyrazoles, potassium tris(1-pyrazolyl)borohydride, 2-(4-thiazolyl)benzimidazole, and halogenated-8-hydroxyquinolines.
A production method for producing a target compound represented by the following formula (1), the production method including:
a step (A) of subjecting a mixed liquid containing a starting compound represented by the following formula (2) and a solvent to a hydrogenation reduction in the presence of a catalyst having hydrogenation ability,
wherein the solvent is a linear or branched secondary alcohol or tertiary alcohol:
A production method for producing a target compound represented by the following formula (1), the production method including:
a step (A) of subjecting a mixed liquid containing a starting compound represented by the following formula (2) and a solvent to a hydrogenation reduction in the presence of a catalyst having hydrogenation ability,
wherein the solvent is a linear or branched secondary alcohol or tertiary alcohol:
A production method for producing a target compound represented by the following formula (1), the production method including:
a step (A) of subjecting a mixed liquid containing a starting compound represented by the following formula (2) and a solvent to a hydrogenation reduction in the presence of a catalyst having hydrogenation ability,
wherein the solvent is a linear or branched secondary alcohol or tertiary alcohol:
wherein R represents H, CH3, or C2H5,
A production method for producing a target compound represented by the following formula (1), the production method including:
a step (A) of subjecting a mixed liquid containing a starting compound represented by the following formula (2) and a solvent to a hydrogenation reduction in the presence of a catalyst having hydrogenation ability,
wherein the solvent is a linear or branched secondary alcohol or tertiary alcohol:
wherein R represents H, CH3, or C2H5,
A production method for producing a target compound represented by the following formula (1), the production method including:
a step (A) of subjecting a mixed liquid containing a starting compound represented by the following formula (2) and a solvent to a hydrogenation reduction in the presence of a catalyst having hydrogenation ability,
wherein the solvent is a linear or branched secondary alcohol or tertiary alcohol:
wherein R represents H, CH3, or C2H5,
wherein R represents H, CH3, or C2H5, and R1 represents CH3, C2H5, C3H7, or C4H9.
C07C 29/149 - Préparation de composés comportant des groupes hydroxyle ou O-métal liés à un atome de carbone ne faisant pas partie d'un cycle aromatique à six chaînons par réduction d'un groupe fonctionnel contenant de l'oxygène de groupes contenant C=O, p.ex. —COOH d'acides carboxyliques ou de leurs dérivés avec de l'hydrogène ou des gaz contenant de l'hydrogène
C07C 29/141 - Préparation de composés comportant des groupes hydroxyle ou O-métal liés à un atome de carbone ne faisant pas partie d'un cycle aromatique à six chaînons par réduction d'un groupe fonctionnel contenant de l'oxygène de groupes contenant C=O, p.ex. —COOH d'un groupe —CHO avec de l'hydrogène ou des gaz contenant de l'hydrogène
23.
METHOD FOR PRODUCING SOLID ELECTROLYTE PARTICLES AND METHOD FOR PRODUCING ALL-SOLID-STATE BATTERY
A method for producing solid electrolyte particles includes bringing a good solvent solution and a poor solvent into contact with each other to precipitate solid electrolyte particles, the good solvent solution containing a good solvent and a solid electrolyte that contains Sn, S and at least one of an alkali metal element and an alkaline earth metal element. A method for producing an all-solid-state battery includes stacking a solid electrolyte layer to form an all-solid-state-battery, which is formed using solid electrolyte particles produced by the above-described method, a positive electrode layer and a negative electrode layer.
The present invention provides a polyacetal resin composition that is used by being kneaded with metal powders, said polyacetal resin composition comprising 100 parts by weight of a polyacetal resin (A) and 0.15 to 10.0 parts by weight of a fatty acid metal salt (B), wherein the fatty acid metal salt (B) is fatty acid zinc, fatty acid magnesium, or a combination thereof.
B22F 3/22 - Fabrication de pièces ou d'objets à partir de poudres métalliques, caractérisée par le mode de compactage ou de frittage; Appareils spécialement adaptés à cet effet pour la fabrication de pièces par coulée en moule poreux ou absorbant, c. à d. par coulée d'une suspension de poudre métallique dans un moule poreux, d'une façon analogue au coulage de la barbotine
Provided is a hollow structure for fuel, in which a conductive layer containing a fluororesin is used; that is excellent in fuel barrier properties and low-temperature impact resistance, and further is excellent in interlayer adhesion,
Provided is a hollow structure for fuel, in which a conductive layer containing a fluororesin is used; that is excellent in fuel barrier properties and low-temperature impact resistance, and further is excellent in interlayer adhesion,
The hollow structure for fuel includes a polyamide rein layer (A) a polyamide resin layer (B), a polyamide resin layer (C), and a conductive layer (D) in this order from an outside. The polyamide resin layer (A) contains a polyamide resin (a). The polyamide resin layer (B) contains a polyolefin, a polyamide resin (b1) containing a structural unit derived from metaxylylenediamine and a structural unit derived from an aliphatic dicarboxylic acid having from 4 to 8 carbon atoms, and a polyamide resin (b2) containing a structural unit derived from xylylenediamine and a structural unit derived from an aliphatic dicarboxylic acid having from 9 to 12 carbon atoms. The polyamide resin layer (C) contains a polyamide resin (c). The conductive layer (D) contains a fluororesin and a conductive substance.
Provided are an epoxy resin curing agent containing a polyamine (A) or an adduct modified product of the polyamine (A), the polyamine (A) including a diamine (A1) represented by the following formula (1), an epoxy resin composition, and a paint containing these:
wherein R1 to R8 each independently represent a hydrogen atom or an aliphatic group having 1 to 5 carbon atoms.
Provided are an epoxy resin curing agent containing a polyamine (A) or an adduct modified product of the polyamine (A), the polyamine (A) including a diamine (A1) represented by the following formula (1), an epoxy resin composition, and a paint containing these:
wherein R1 to R8 each independently represent a hydrogen atom or an aliphatic group having 1 to 5 carbon atoms.
A polyester resin including dicarboxylic acid constituent units and diol constituent units, wherein the diol constituent units include a constituent unit A1 derived from a diol having a cyclic acetal skeleton and a constituent unit A2 derived from 2,2,4,4-tetramethoxy-1,3-cyclobutanediol, and wherein the dicarboxylic acid constituent units include a constituent unit B1 derived from 2,6-naphthalenedicarboxylic acid and/or dimethyl 2,6-naphthalenedicarboxylate.
A thermoplastic polyimide resin composition containing 30 to 60 mass % of a thermoplastic polyimide resin (A), 5 to 50 mass % of carbon fiber (B), 5 to 20 mass % of a fluorine resin (C), and 1 to 40 mass % of an inorganic filler (D), and a molded product including the thermoplastic polyimide resin composition.
A thermoplastic resin composition, includes a thermoplastic resin, and an aromatic carbonate oligomer (A) serving as a compounding agent, in which the set number n is 3 or more and less than 15 or the average number of repeating units obtained by mass spectrometry measurement according to field desorption mass spectrometry (FD-MS) is 2 to 6. A compounding agent that is composed of an aromatic carbonate oligomer (A), in which the set number n is 3 or more and less than 15 or the average number of repeating units obtained by mass spectrometry measurement according to field desorption mass spectrometry (FD-MS) is 2 to 6, wherein the compounding agent is added to a thermoplastic resin to reduce the birefringence of a thermoplastic resin composition.
A61K 31/4745 - Quinoléines; Isoquinoléines condensées en ortho ou en péri avec des systèmes hétérocycliques condensées avec des systèmes cycliques ayant l'azote comme hétéro-atome d'un cycle, p.ex. phénanthrolines
A61P 3/04 - Anorexigènes; Médicaments de l'obésité
Provided is a hollow structure for fuel includes a polyamide resin layer (A), a polyamide resin layer (B) , and a polyamide resin layer (C) in this order from an outside. The polyamide resin layer (B) contains a polyolefin, the polyamide resin layer (C) contains a conductive substance, and an amount of an eluate in an eluate test using a pseudo fuel in the hollow structure for fuel is 25 g/m2 or less.
B29C 48/00 - Moulage par extrusion, c. à d. en exprimant la matière à mouler dans une matrice ou une filière qui lui donne la forme désirée; Appareils à cet effet
B29C 48/18 - Articles comprenant au moins deux composants, p.ex. couches coextrudées les composants étant des couches
B29K 77/00 - Utilisation de polyamides, p.ex. polyesteramides, comme matière de moulage
C08L 23/26 - Compositions contenant des homopolymères ou des copolymères d'hydrocarbures aliphatiques non saturés ne possédant qu'une seule liaison double carbone-carbone; Compositions contenant des dérivés de tels polymères modifiées par post-traitement chimique
C08L 77/02 - Polyamides dérivés des acides oméga-aminocarboxyliques ou de leurs lactames
C08L 77/06 - Polyamides dérivés des polyamines et des acides polycarboxyliques
32.
ISOBUTYRIC ACID ESTER COMPOUND HAVING ALKENOYLOXY GROUP AT ALPHA-POSITION, PERFUME COMPOSITION, AND USE AS PERFUME
A fragrance composition contains a compound represented by Formula (1) below as an active ingredient: where, in Formula (1), R1 is a linear or branched olefinically unsaturated hydrocarbon group having from 2 to 4 carbons, and R2 is a linear, branched, or cyclic alkyl group having from 1 to 6 carbons.
A fragrance composition contains a compound represented by Formula (1) below as an active ingredient: where, in Formula (1), R1 is a linear or branched olefinically unsaturated hydrocarbon group having from 2 to 4 carbons, and R2 is a linear, branched, or cyclic alkyl group having from 1 to 6 carbons.
C07C 69/73 - Esters d'acides carboxyliques dont le groupe carboxyle estérifié est lié à un atome de carbone acyclique et dont l'un des groupes OH, O-métal, —CHO, céto, éther, acyloxy, des groupes , des groupes ou des groupes se trouve dans la partie acide d'acides non saturés
Provided are a method for capturing carbon dioxide including irradiating a reaction product (c) of an amine compound (a) and a gas (b) containing carbon dioxide with electromagnetic waves to desorb carbon dioxide from the reaction product (c); and a carbon dioxide capture system including a housing part for housing a reaction product (c) of an amine compound (a) and a gas (b) containing carbon dioxide and an electromagnetic wave irradiation part for irradiating the reaction product (c) with the electromagnetic waves.
B01D 53/96 - Régénération, réactivation ou recyclage des réactifs
B01D 53/14 - SÉPARATION Épuration chimique ou biologique des gaz résiduaires, p.ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols par absorption
A method for producing a polyimide resin powder, which involves reacting a tetracarboxylic acid component containing a tetracarboxylic dianhydride and a diamine component containing an aliphatic diamine in the presence of a solvent containing an alkylene glycol solvent of formula (1). In formula (1), Ra1 represents a hydrogen atom or an alkyl group having from 1 to 4 carbon atoms, Ra2 represents a linear alkylene group having from 2 to 6 carbon atoms, and n represents an integer of 1 to 3. The reacting produces a solution containing a polyimide resin precursor. This solution is then heated at an average heating rate of 0.5 to 8° C./min in a temperature range of 70 to 130° C. to imidize the polyimide resin precursor to produce the polyimide resin powder in the solution with a solid content concentration of 15 to 25% by mass.
A method for producing a polyimide resin powder, which involves reacting a tetracarboxylic acid component containing a tetracarboxylic dianhydride and a diamine component containing an aliphatic diamine in the presence of a solvent containing an alkylene glycol solvent of formula (1). In formula (1), Ra1 represents a hydrogen atom or an alkyl group having from 1 to 4 carbon atoms, Ra2 represents a linear alkylene group having from 2 to 6 carbon atoms, and n represents an integer of 1 to 3. The reacting produces a solution containing a polyimide resin precursor. This solution is then heated at an average heating rate of 0.5 to 8° C./min in a temperature range of 70 to 130° C. to imidize the polyimide resin precursor to produce the polyimide resin powder in the solution with a solid content concentration of 15 to 25% by mass.
A method for producing a solid electrolyte powder includes preparing a mixed solution by adding a poor solvent to a good solvent solution that contains a good solvent and a solid electrolyte that contains an alkali metal element and/or an alkaline earth metal element, Sn and S; removing at least some of the good solvent from the mixed solution to precipitate solid electrolyte particles; and drying the solid electrolyte particles to obtain a solid electrolyte powder. The ratio of the volume of the poor solvent relative to the volume of the good solvent (volume of poor solvent/volume of good solvent) is 5 or more.
H01M 10/0525 - Batteries du type "rocking chair" ou "fauteuil à bascule", p.ex. batteries à insertion ou intercalation de lithium dans les deux électrodes; Batteries à l'ion lithium
A method for producing an LGPS-type solid electrolyte mixing Li3PS4 crystals having an average grain size (D50) of 0.1 to 5 μm and crystals that are formed of Li, Sn and S to produce a precursor, while having an average grain size (D50) of 0.1 to 5 μm; and subjecting the precursor to heat treatment at 300 to 700° C.
Provided are a resin composition having excellent oxygen barrier property under high humidity as a novel resin material, a molded body, a method for producing a molded body, and a method for producing a pellet using the resin composition. The resin composition includes a resin component and a plate-shaped talc having an aspect ratio of more than 18, 80 mass % of the resin component comprising a barrier resin having an oxygen transmission coefficient of 5.0 cc·mm/(m2·day·atm) or less as measured according to ASTM D3985 at a relative humidity of 60% and a temperature of 23° C., and a content of the plate-shaped talc being from 3.0 to 55.0 mass % when a total of the barrier resin and the plate-shaped talc is 100 mass %.
C08G 69/26 - Polyamides dérivés, soit des acides amino-carboxyliques, soit de polyamines et d'acides polycarboxyliques dérivés de polyamines et d'acides polycarboxyliques
B29C 51/00 - Façonnage par thermoformage, p.ex. façonnage de feuilles dans des moules en deux parties ou par emboutissage profond; Appareils à cet effet
B29K 77/00 - Utilisation de polyamides, p.ex. polyesteramides, comme matière de moulage
B29K 509/00 - Utilisation de matériaux inorganiques non prévus dans les groupes comme matière de remplissage
B32B 1/00 - Produits stratifiés ayant essentiellement une forme générale autre que plane
B32B 5/18 - Produits stratifiés caractérisés par l'hétérogénéité ou la structure physique d'une des couches caractérisés par le fait qu'une des couches contient un matériau sous forme de mousse ou essentiellement poreux
B32B 7/12 - Liaison entre couches utilisant des adhésifs interposés ou des matériaux interposés ayant des propriétés adhésives
B32B 27/06 - Produits stratifiés composés essentiellement de résine synthétique comme seul composant ou composant principal d'une couche adjacente à une autre couche d'une substance spécifique
B32B 27/08 - Produits stratifiés composés essentiellement de résine synthétique comme seul composant ou composant principal d'une couche adjacente à une autre couche d'une substance spécifique d'une résine synthétique d'une sorte différente
B32B 27/10 - Produits stratifiés composés essentiellement de résine synthétique comme seul composant ou composant principal d'une couche adjacente à une autre couche d'une substance spécifique de papier ou de carton
B32B 27/20 - Produits stratifiés composés essentiellement de résine synthétique caractérisée par l'emploi d'additifs particuliers utilisant des charges, des pigments, des agents thixotropiques
B32B 27/32 - Produits stratifiés composés essentiellement de résine synthétique comprenant des polyoléfines
B32B 27/34 - Produits stratifiés composés essentiellement de résine synthétique comprenant des polyamides
B32B 29/06 - Produits stratifiés composés essentiellement de papier ou de carton spécialement traité, p.ex. glacé, parcheminé
B65D 65/40 - Emploi de stratifiés pour des buts particuliers d'emballage
According to the present application, there can be provided a thermoplastic resin including a constituent unit (A) derived from a monomer represented by the following general formula (1):
According to the present application, there can be provided a thermoplastic resin including a constituent unit (A) derived from a monomer represented by the following general formula (1):
According to the present application, there can be provided a thermoplastic resin including a constituent unit (A) derived from a monomer represented by the following general formula (1):
wherein R1s, which are the same or different, each represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, a phenyl group, or a linear or branched alkyl group containing 1 to 4 carbon atoms; and ring A represents a benzene ring optionally substituted with 1 to 4 groups selected from the group consisting of a fluorine atom, a chlorine atom, a bromine atom, a phenyl group, a linear or branched alkoxy group containing 1 to 6 carbon atoms, and a linear or branched alkyl group containing 1 to 6 carbon atoms.
Provided are a platinum-group metal recovery agent represented by the following general Formula (1) and a platinum-group metal recovery method, which is a method of recovering platinum or rhodium from a hydrochloric acid solution containing platinum or rhodium using the platinum-group metal recovery agent, in which the platinum-group metal recovery agent and the hydrochloric acid solution are mixed to precipitate platinum or rhodium.
Provided are a platinum-group metal recovery agent represented by the following general Formula (1) and a platinum-group metal recovery method, which is a method of recovering platinum or rhodium from a hydrochloric acid solution containing platinum or rhodium using the platinum-group metal recovery agent, in which the platinum-group metal recovery agent and the hydrochloric acid solution are mixed to precipitate platinum or rhodium.
To provide a method for producing a (meth)acrylic acid ester compound, wherein the method enables the esterification at a high introduction rate and collecting the obtained ester compound efficiently. A method for producing a (meth)acrylic acid ester compound, includes reacting a polymer having a structure represented by formula (1) with (meth)acrylic acid anhydride in the presence of at least one of potassium carbonate, rubidium carbonate, and cesium carbonate. In formula (1), R1, R2, R3, R4, and R5 are each independently selected from a hydrogen atom and an alkyl group, and at least one of R1, R2, R3, R4, and R5 is selected from a single bond, —O—*, —S—*, —S(═O)—*, —S(═O)2—*, and an alkylene group-*; and X is a hydrogen atom, at least some of which react with (meth)acrylic acid anhydride to be (meth)acrylic groups.
To provide a method for producing a (meth)acrylic acid ester compound, wherein the method enables the esterification at a high introduction rate and collecting the obtained ester compound efficiently. A method for producing a (meth)acrylic acid ester compound, includes reacting a polymer having a structure represented by formula (1) with (meth)acrylic acid anhydride in the presence of at least one of potassium carbonate, rubidium carbonate, and cesium carbonate. In formula (1), R1, R2, R3, R4, and R5 are each independently selected from a hydrogen atom and an alkyl group, and at least one of R1, R2, R3, R4, and R5 is selected from a single bond, —O—*, —S—*, —S(═O)—*, —S(═O)2—*, and an alkylene group-*; and X is a hydrogen atom, at least some of which react with (meth)acrylic acid anhydride to be (meth)acrylic groups.
A polycarbonate resin composition contains (A) a polycarbonate resin containing a structural unit that is represented by general formula (1) and (B) a silane coupling agent that is represented by general formula (2), wherein 0.06 part by mass or more of the silane coupling agent (B) is contained relative to 100 parts by mass of the polycarbonate resin (A).
C08G 64/16 - Polycarbonates aliphatique-aromatiques ou araliphatiques
C08L 69/00 - Compositions contenant des polycarbonates; Compositions contenant des dérivés des polycarbonates
C09D 11/102 - Encres d’imprimerie à base de résines artificielles contenant des composés macromoléculaires obtenus par des réactions autres que celles faisant intervenir uniquement des liaisons non saturées carbone-carbone
C09D 169/00 - Compositions de revêtement à base de polycarbonates; Compositions de revêtement à base de dérivés de polycarbonates
C09J 169/00 - Adhésifs à base de polycarbonates; Adhésifs à base de dérivés de polycarbonates
To provide a polyamide resin having excellent thermal resistance and particularly having a high glass transition temperature. The polyamide resin containing diamine-derived structural units and dicarboxylic acid-derived structural units, wherein 50 mol % or more of the diamine-derived structural units are derived from a compound represented by Formula (1), and more than 50 mol % of the dicarboxylic acid-derived structural units are derived from an aromatic dicarboxylic acid, where in Formula (1), R1 to R8 each independently represent a hydrogen atom or an aliphatic group having from 1 to 5 carbons:
To provide a polyamide resin having excellent thermal resistance and particularly having a high glass transition temperature. The polyamide resin containing diamine-derived structural units and dicarboxylic acid-derived structural units, wherein 50 mol % or more of the diamine-derived structural units are derived from a compound represented by Formula (1), and more than 50 mol % of the dicarboxylic acid-derived structural units are derived from an aromatic dicarboxylic acid, where in Formula (1), R1 to R8 each independently represent a hydrogen atom or an aliphatic group having from 1 to 5 carbons:
C08G 69/32 - Polyamides dérivés, soit des acides amino-carboxyliques, soit de polyamines et d'acides polycarboxyliques dérivés de polyamines et d'acides polycarboxyliques à partir de diamines aromatiques et d'acides aromatiques dicarboxyliques avec des groupes amino et carboxylique liés tous deux aromatiquement
43.
METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FOR MEMORY ELEMENTS
Provided is a method for producing a semiconductor substrate for high-performance memory elements with high production efficiency.
Provided is a method for producing a semiconductor substrate for high-performance memory elements with high production efficiency.
The method for producing a semiconductor substrate for memory elements, comprising a step (1) of bringing a semiconductor substrate including a titanium-containing film that includes at least one of titanium and a titanium alloy, a metallic tungsten film, and a tungsten oxide film into contact with a pretreatment agent to remove at least a part of the tungsten oxide film; and a step (2) of bringing the semiconductor substrate after being subjected to the step (1) into contact with an etching agent to remove at least a part of the titanium-containing film, wherein the pretreatment agent includes at least one tungsten oxide etchant that is selected from the group consisting of acids, ammonia, and ammonium salts.
Provided are a thermosetting resin composition comprising an adduct resin (X) that is a reaction product of an amine-epoxy resin (A) and an epoxy modifier (B) described below, and an epoxy resin curing agent (C), wherein the adduct resin (X) is a reaction product obtained by reacting 1 to 20 parts by mass of the epoxy modifier (B) with 100 parts by mass of the amine-epoxy resin (A), and a prepreg, a fiber-reinforced composite material, and a high-pressure gas container in which the thermosetting resin composition is used.
Provided are a thermosetting resin composition comprising an adduct resin (X) that is a reaction product of an amine-epoxy resin (A) and an epoxy modifier (B) described below, and an epoxy resin curing agent (C), wherein the adduct resin (X) is a reaction product obtained by reacting 1 to 20 parts by mass of the epoxy modifier (B) with 100 parts by mass of the amine-epoxy resin (A), and a prepreg, a fiber-reinforced composite material, and a high-pressure gas container in which the thermosetting resin composition is used.
Epoxy modifier (B): at least one selected from the group consisting of meta-xylylenediamine, para-xylylenediamine, 4,4′-diaminodiphenylmethane, and 4,4′-diaminodiphenylsulfone.
To provide an optical laminate that exhibits an achromatic silver color even when observed from any angle in the case of using an optical laminate including a cholesteric liquid crystal layer exhibiting a silver color, and a polarizing lens and eyewear using the same.
To provide an optical laminate that exhibits an achromatic silver color even when observed from any angle in the case of using an optical laminate including a cholesteric liquid crystal layer exhibiting a silver color, and a polarizing lens and eyewear using the same.
An optical laminate for eyewear includes a light reflecting layer comprising at least one cholesteric liquid crystal layer; and a support sandwiching the light reflecting layer, in which a reflection hue of the light reflecting layer exhibits a silver color, the light reflecting layer has a reflection characteristic over a wavelength range of at least 380 nm to 900 nm, and an absolute value of a difference (ΔR1−R2) between an average reflectance (R1) at 500 nm to 700 nm and an average reflectance (R2) at 701 nm to 900 nm of the light reflecting layer is 10 points or less in the wavelength range.
G02B 5/30 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques autres que les lentilles Éléments polarisants
G02C 7/08 - Verres auxiliaires; Dispositions pour faire varier la distance focale
G02F 1/137 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p.ex. commutation, ouverture de porte ou modulation; Optique non linéaire pour la commande de l'intensité, de la phase, de la polarisation ou de la couleur basés sur des cristaux liquides, p.ex. cellules d'affichage individuelles à cristaux liquides caractérisés par l'effet électro-optique ou magnéto-optique, p.ex. transition de phase induite par un champ, effet d'orientation, interaction entre milieu récepteur et matière additive ou diffusion dynamique
46.
ALDEHYDE COMPOUND AND METHOD FOR PRODUCING SAME, AND FRAGRANCE COMPOSITION
Provided are a novel aldehyde compound suitable for a fragrance and a fragrance ingredient, or a raw material thereof, and a method for producing the aldehyde compound, as well as a fragrance composition containing the aldehyde compound as an active ingredient, and use of the aldehyde compound as a fragrance.
Provided are a novel aldehyde compound suitable for a fragrance and a fragrance ingredient, or a raw material thereof, and a method for producing the aldehyde compound, as well as a fragrance composition containing the aldehyde compound as an active ingredient, and use of the aldehyde compound as a fragrance.
A compound represented by Formula (1):
Provided are a novel aldehyde compound suitable for a fragrance and a fragrance ingredient, or a raw material thereof, and a method for producing the aldehyde compound, as well as a fragrance composition containing the aldehyde compound as an active ingredient, and use of the aldehyde compound as a fragrance.
A compound represented by Formula (1):
Provided are a novel aldehyde compound suitable for a fragrance and a fragrance ingredient, or a raw material thereof, and a method for producing the aldehyde compound, as well as a fragrance composition containing the aldehyde compound as an active ingredient, and use of the aldehyde compound as a fragrance.
A compound represented by Formula (1):
where in Formula (1), R is a hydrogen atom or a methyl group.
C07C 47/228 - Composés non saturés comportant des groupes —CHO liés à des atomes de carbone acycliques contenant des cycles aromatiques à six chaînons, p.ex. le phénylacétaldéhyde
C07C 45/45 - Préparation de composés comportant des groupes C=O liés uniquement à des atomes de carbone ou d'hydrogène; Préparation des chélates de ces composés par condensation
C07C 45/62 - Préparation de composés comportant des groupes C=O liés uniquement à des atomes de carbone ou d'hydrogène; Préparation des chélates de ces composés par des réactions ne créant pas de groupe C=O par hydrogénation de liaisons doubles ou triples carbone-carbone
A material for assisting metal machining process, having a polymer compound, wherein a content of the polymer compound is 50% by mass or more based on the total amount of the material for assisting metal machining process, a melting point is 40° C. or more, and a temperature at 5% weight loss is 275° C. or more.
C10M 107/44 - Composés macromoléculaires obtenus par des réactions autres que celles faisant intervenir uniquement des liaisons non saturées carbone-carbone
B23B 35/00 - Méthodes d'alésage ou de perçage ou autres méthodes de travail impliquant l'utilisation de machines à aléser ou à percer; Utilisation d'équipements auxiliaires en relation avec ces méthodes
B23P 17/04 - Opérations d'usinage non couvertes par une seule autre sous-classe ou un autre groupe de la présente sous-classe caractérisées par la nature du matériau considéré, ou par le genre de produit quelle que soit sa forme
Provided is an oxygen scavenger powder containing an iron powder, a metal halide, and an alkaline agent, in which the alkaline agent has a solubility of less than 0.1 g in 100 g of water at 25° C., and an aqueous dispersion of the alkaline agent has a pH of from 8 to 12 at 25° C.
B01J 20/04 - Compositions absorbantes ou adsorbantes solides ou compositions facilitant la filtration; Absorbants ou adsorbants pour la chromatographie; Procédés pour leur préparation, régénération ou réactivation contenant une substance inorganique contenant des composés des métaux alcalins, des métaux alcalino-terreux ou du magnésium
B01J 20/20 - Compositions absorbantes ou adsorbantes solides ou compositions facilitant la filtration; Absorbants ou adsorbants pour la chromatographie; Procédés pour leur préparation, régénération ou réactivation contenant une substance inorganique contenant du carbone obtenu par des procédés de carbonisation
Provided is an oxygen absorber including an unsaturated group-containing liquid oligomer, an oxygen absorption-promoting substance, a carrier supporting the unsaturated group-containing liquid oligomer and the oxygen absorption-promoting substance, gas-absorbing inorganic particles, and activated carbon. An amount of the unsaturated group-containing liquid oligomer adsorbed on the gas-absorbing inorganic particles is 6.5 parts by mass or less per 100 parts by mass of the gas-absorbing inorganic particles.
B01J 20/10 - Compositions absorbantes ou adsorbantes solides ou compositions facilitant la filtration; Absorbants ou adsorbants pour la chromatographie; Procédés pour leur préparation, régénération ou réactivation contenant une substance inorganique contenant de la silice ou un silicate
B01J 20/20 - Compositions absorbantes ou adsorbantes solides ou compositions facilitant la filtration; Absorbants ou adsorbants pour la chromatographie; Procédés pour leur préparation, régénération ou réactivation contenant une substance inorganique contenant du carbone obtenu par des procédés de carbonisation
B01J 20/28 - Compositions absorbantes ou adsorbantes solides ou compositions facilitant la filtration; Absorbants ou adsorbants pour la chromatographie; Procédés pour leur préparation, régénération ou réactivation caractérisées par leur forme ou leurs propriétés physiques
Provided is an oxygen absorber containing: a liquid oligomer of an unsaturated hydrocarbon; a transition metal catalyst; a carrier supporting the liquid oligomer of the unsaturated hydrocarbon and the transition metal catalyst; granular activated carbon; and crystalline thermoplastic resin particles. In an analysis curve derived by subjecting the crystalline thermoplastic resin particles and the granular activated carbon to a pyrolysis-gas chromatography analysis under a pyrolysis condition of 600° C., a ratio [Cref/Pref] of a peak area (Cref) of a decomposition product of a low molecular weight component of the crystalline thermoplastic resin particles adsorbed on the granular activated carbon per unit mass of the activated carbon to a peak area (Pref) of the crystalline thermoplastic resin particle decomposition product per unit mass of the crystalline thermoplastic resin particles is 0.20 or less.
B01J 20/20 - Compositions absorbantes ou adsorbantes solides ou compositions facilitant la filtration; Absorbants ou adsorbants pour la chromatographie; Procédés pour leur préparation, régénération ou réactivation contenant une substance inorganique contenant du carbone obtenu par des procédés de carbonisation
B01D 53/46 - Elimination des composants de structure définie
B01J 20/22 - Compositions absorbantes ou adsorbantes solides ou compositions facilitant la filtration; Absorbants ou adsorbants pour la chromatographie; Procédés pour leur préparation, régénération ou réactivation contenant une substance organique
B01J 20/28 - Compositions absorbantes ou adsorbantes solides ou compositions facilitant la filtration; Absorbants ou adsorbants pour la chromatographie; Procédés pour leur préparation, régénération ou réactivation caractérisées par leur forme ou leurs propriétés physiques
B65D 81/26 - Adaptations pour empêcher la détérioration ou l'altération du contenu; Applications au réceptacle ou au matériau d'emballage d'agents de conservation des aliments, de fongicides, d'insecticides ou de produits repoussant les animaux avec dispositifs pour évacuer ou absorber les fluides, p.ex. s'écoulant du contenu; Emploi de produits empêchant la corrosion ou de dessiccateurs
Provided are a glycidyl (meth)acrylate composition, which includes a phenolic polymerization inhibitor that is unlikely to deteriorate such that the glycidyl (meth)acrylate composition can be stably stored for a long period of time, and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate resin composition. More specifically, provided are: a glycidyl (meth)acrylate composition including a glycidyl (meth)acrylate, a quaternary ammonium salt, and a phenolic polymerization inhibitor, wherein a content of the quaternary ammonium salt is 1.00 ppm or less; and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate composition, including adjusting a content of a quaternary ammonium salt in the glycidyl (meth)acrylate composition to 1.00 ppm or less.
C07D 303/16 - Composés contenant des cycles oxirane avec des radicaux hydrocarbonés, substitués par des atomes d'oxygène liés par des liaisons simples ou doubles par des radicaux hydroxyle estérifiés
C08F 2/40 - Polymérisation utilisant des régulateurs, p.ex. des agents d'arrêt de chaîne utilisant un agent retardateur
C08F 20/32 - Esters contenant de l'oxygène en plus de l'oxygène de la fonction carboxyle contenant des radicaux époxyde
52.
PRODUCTION METHOD FOR PRODUCING DIMETHANOL COMPOUND HAVING NORBORNANE SKELETON
A production method for producing a target compound represented by the following formula (1), the production method including:
a step (A) of subjecting a mixed liquid containing a starting compound represented by the following formula (2) and a solvent to a hydrogenation reduction in the presence of a catalyst having hydrogenation ability,
wherein, in the step (A), water is removed from the reaction system:
A production method for producing a target compound represented by the following formula (1), the production method including:
a step (A) of subjecting a mixed liquid containing a starting compound represented by the following formula (2) and a solvent to a hydrogenation reduction in the presence of a catalyst having hydrogenation ability,
wherein, in the step (A), water is removed from the reaction system:
A production method for producing a target compound represented by the following formula (1), the production method including:
a step (A) of subjecting a mixed liquid containing a starting compound represented by the following formula (2) and a solvent to a hydrogenation reduction in the presence of a catalyst having hydrogenation ability,
wherein, in the step (A), water is removed from the reaction system:
wherein R represents H, CH3, or C2H5,
A production method for producing a target compound represented by the following formula (1), the production method including:
a step (A) of subjecting a mixed liquid containing a starting compound represented by the following formula (2) and a solvent to a hydrogenation reduction in the presence of a catalyst having hydrogenation ability,
wherein, in the step (A), water is removed from the reaction system:
wherein R represents H, CH3, or C2H5,
A production method for producing a target compound represented by the following formula (1), the production method including:
a step (A) of subjecting a mixed liquid containing a starting compound represented by the following formula (2) and a solvent to a hydrogenation reduction in the presence of a catalyst having hydrogenation ability,
wherein, in the step (A), water is removed from the reaction system:
wherein R represents H, CH3, or C2H5,
wherein R represents H, CH3, or C2H5, and R1 represents CH3, C2H5, C3H7, or C4H9.
C07C 29/149 - Préparation de composés comportant des groupes hydroxyle ou O-métal liés à un atome de carbone ne faisant pas partie d'un cycle aromatique à six chaînons par réduction d'un groupe fonctionnel contenant de l'oxygène de groupes contenant C=O, p.ex. —COOH d'acides carboxyliques ou de leurs dérivés avec de l'hydrogène ou des gaz contenant de l'hydrogène
An object of the present invention is to provide a method for producing 2,4-dialkylbenzaldehyde with excellent conversion rate and yield, and excellent regioselectivity for formylation, by allowing carbon monoxide to react on a starting material containing a specific m-dialkylbenzene in the presence of hydrogen fluoride and boron trifluoride. The method for producing 2,4-dialkylbenzaldehyde according to the present invention comprises a step of allowing carbon monoxide to react on a starting material containing m-dialkylbenzene represented by formula (1) in the presence of hydrogen fluoride and boron trifluoride for formylation at least at a position (a), wherein the starting material is a dialkylbenzene containing more than 90 mol % of m-dialkylbenzene represented by formula (1), and the number of moles of boron trifluoride relative to 1 mole of m-dialkylbenzene represented by formula (1) is 0.7 mol or more and 3.0 mol or less:
An object of the present invention is to provide a method for producing 2,4-dialkylbenzaldehyde with excellent conversion rate and yield, and excellent regioselectivity for formylation, by allowing carbon monoxide to react on a starting material containing a specific m-dialkylbenzene in the presence of hydrogen fluoride and boron trifluoride. The method for producing 2,4-dialkylbenzaldehyde according to the present invention comprises a step of allowing carbon monoxide to react on a starting material containing m-dialkylbenzene represented by formula (1) in the presence of hydrogen fluoride and boron trifluoride for formylation at least at a position (a), wherein the starting material is a dialkylbenzene containing more than 90 mol % of m-dialkylbenzene represented by formula (1), and the number of moles of boron trifluoride relative to 1 mole of m-dialkylbenzene represented by formula (1) is 0.7 mol or more and 3.0 mol or less:
a wherein R1 represents an alkyl group having 1 or more and 3 or less carbon atoms, and R2represents a chain or cyclic alkyl group having 2 or more and 7 or less carbon atoms, with a secondary or tertiary carbon at the benzylic position, provided that the number of carbons of R2 is larger than the number of carbons of R1.
C07C 45/49 - Préparation de composés comportant des groupes C=O liés uniquement à des atomes de carbone ou d'hydrogène; Préparation des chélates de ces composés par réaction avec le monoxyde de carbone
A carbon dioxide absorbent containing a polyamine compound (A) having an alicyclic hydrocarbon structure, wherein a content of the polyamine compound (A) is 60% by mass or more.
According to the present invention, a resin composition can be provided, which comprises a solvent represented by general formula (1) and a polycarbonate resin containing a structural unit (a) represented by general formula (A) (provided that a polycarbonate homopolymer composed only of a structural unit represented by formula (i) is excluded). (In formula (1), Ra represents a hydrogen atom or the like; Rb represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or the like; Rc to Rf independently represent a hydrogen atom or the like; and n represents an integer of 1 to 10.) (In formula (A), R1 to R8 independently represent a hydrogen atom or the like; and X represents —O— or the like.)
C08G 64/06 - Polycarbonates aromatiques ne contenant pas d'insaturations aliphatiques
C09D 7/63 - Adjuvants non macromoléculaires organiques
C09D 11/102 - Encres d’imprimerie à base de résines artificielles contenant des composés macromoléculaires obtenus par des réactions autres que celles faisant intervenir uniquement des liaisons non saturées carbone-carbone
C09D 169/00 - Compositions de revêtement à base de polycarbonates; Compositions de revêtement à base de dérivés de polycarbonates
56.
METHODS FOR PRODUCING POLYCARBONATE COPOLYMER AND POLYSILOXANE COMPOUND, POLYCARBONATE COPOLYMER, POLYSILOXANE COMPOUND, COMPOSITION, AND MOLDED BODY
A polycarbonate copolymer which has siloxane constituent units represented by any of formulae (1-1) to (1-4) and prescribed polycarbonate constituent units.
A polycarbonate copolymer which has siloxane constituent units represented by any of formulae (1-1) to (1-4) and prescribed polycarbonate constituent units.
C08L 83/16 - Compositions contenant des composés macromoléculaires obtenus par des réactions créant dans la chaîne principale de la macromolécule une liaison contenant uniquement du silicium, avec ou sans soufre, azote, oxygène ou carbone; Compositions contenant des dérivés de tels polymères dans lesquels tous les atomes de silicium sont liés autrement que par des atomes d'oxygène
C08G 64/16 - Polycarbonates aliphatique-aromatiques ou araliphatiques
C08G 64/38 - Procédés généraux de préparation utilisant d'autres monomères
C08G 77/60 - Composés macromoléculaires obtenus par des réactions créant dans la chaîne principale de la macromolécule une liaison contenant du silicium, avec ou sans soufre, azote, oxygène ou carbone dans lesquels tous les atomes de silicium sont liés autrement que par des atomes d'oxygène
C08L 69/00 - Compositions contenant des polycarbonates; Compositions contenant des dérivés des polycarbonates
57.
POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION
A polymer having a constituent unit derived from a monomer represented by the following formula (0), wherein the polymer has sites in which the constituent units are linked by direct bonding between aromatic rings of the monomer represented by the formula (0):
A polymer having a constituent unit derived from a monomer represented by the following formula (0), wherein the polymer has sites in which the constituent units are linked by direct bonding between aromatic rings of the monomer represented by the formula (0):
A polymer having a constituent unit derived from a monomer represented by the following formula (0), wherein the polymer has sites in which the constituent units are linked by direct bonding between aromatic rings of the monomer represented by the formula (0):
wherein R is a monovalent group, and m is an integer of 1 to 5, wherein at least one R is a hydroxyl group, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, or an amino group having 0 to 40 carbon atoms and optionally having a substituent.
C08G 61/02 - Composés macromoléculaires contenant uniquement des atomes de carbone dans la chaîne principale de la molécule, p.ex. polyxylylènes
C08G 8/16 - Polymères de condensation obtenus uniquement à partir d'aldéhydes ou de cétones avec des phénols d'aldéhydes de formaldéhyde, p.ex. de formaldéhyde formé in situ avec des amino- ou nitrophénols
G03F 7/11 - Matériaux photosensibles - caractérisés par des détails de structure, p.ex. supports, couches auxiliaires avec des couches de recouvrement ou des couches intermédiaires, p.ex. couches d'ancrage
G03F 7/22 - Exposition successive avec le même motif lumineux de différentes zones de la même surface
G03F 7/26 - Traitement des matériaux photosensibles; Appareillages à cet effet
H01L 21/027 - Fabrication de masques sur des corps semi-conducteurs pour traitement photolithographique ultérieur, non prévue dans le groupe ou
58.
COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE
Provided is a composition for cleaning semiconductor substrates, having high removal rate of tungsten oxide with high Ti/W etching selectivity.
Provided is a composition for cleaning semiconductor substrates, having high removal rate of tungsten oxide with high Ti/W etching selectivity.
The composition for cleaning semiconductor substrates, comprising an oxidizing agent (A), a fluorine compound (B), a metallic tungsten corrosion inhibiter (C), and a tungsten oxide etching accelerator (D), wherein the addition ratio of the oxidizing agent (A) is from 0.0001 to 10% by mass relative to the total mass of the composition for cleaning semiconductor substrates; the addition ratio of the fluorine compound (B) is from 0.005 to 10% by mass relative to the total mass of the composition for cleaning semiconductor substrates; and the addition ratio of the metallic tungsten corrosion inhibiter (C) is from 0.0001 to 5% by mass relative to the total mass of the composition for cleaning semiconductor substrates.
A composition for an oil or gas well formation, containing a viscoelastic surfactant; and a modified nanomaterial and a producing method of the composition, and a forming method of the oil or gas well. The modified nanomaterial optionally contains a nanocellulose. The modified nanomaterial optionally has, on its surface, a sulfate group, a sulfite group, a carboxy group, an ethylene oxide chain, an amino group, an ester group, a silane group, a tertiary ammonium group or a mixture thereof.
C09K 8/20 - Composés organiques naturels ou leurs dérivés, p.ex. polysaccharides ou dérivés de la lignine
60.
COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, COMPOSITION FOR OPTICAL MEMBER FORMATION, RESIN FOR UNDERLAYER FILM FORMATION, RESIST RESIN, RADIATION-SENSITIVE RESIN, AND RESIN FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY
A composition for film formation containing a polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1-0), (1A), and (1B), wherein the repeating units are linked by a direct bond between aromatic rings:
A composition for film formation containing a polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1-0), (1A), and (1B), wherein the repeating units are linked by a direct bond between aromatic rings:
C08G 61/02 - Composés macromoléculaires contenant uniquement des atomes de carbone dans la chaîne principale de la molécule, p.ex. polyxylylènes
C08G 61/12 - Composés macromoléculaires contenant d'autres atomes que le carbone dans la chaîne principale de la macromolécule
C09D 165/00 - Compositions de revêtement à base de composés macromoléculaires obtenus par des réactions créant une liaison carbone-carbone dans la chaîne principale; Compositions de revêtement à base de dérivés de tels polymères
G03F 7/038 - Composés macromoléculaires rendus insolubles ou sélectivement mouillables
G03F 7/11 - Matériaux photosensibles - caractérisés par des détails de structure, p.ex. supports, couches auxiliaires avec des couches de recouvrement ou des couches intermédiaires, p.ex. couches d'ancrage
61.
MOLDED ARTICLE MANUFACTURING METHOD, RESIN IMPREGNATING APPARATUS, AND 3D PRINTER
Provided are a method for manufacturing a molded article consisting of a fiber-reinforced composite material containing a cured product of a thermosetting resin or a thermosetting resin composition and continuous reinforcing fibers, the method including, in this order, Steps (I) to (III) described below, a resin impregnating apparatus suitably used for the manufacturing method, and a 3D printer. Step (I): A coating step of coating a surface of a continuous reinforcing fiber bundle with a thermosetting resin or a thermosetting resin composition. Step (II): A resin impregnating step of twisting the continuous reinforcing fiber bundle after step (I) and obtaining a prepreg impregnated with the thermosetting resin or the thermosetting resin composition. Step (III): A heating and molding step of disposing the prepreg obtained in step (II) above and then heating the prepreg.
An object of the present invention is to provide a novel resin that is useful as a film forming material for lithography and the like. The problem can be solved by a resin containing a constituent unit represented by the following formula (1) or (1)′:
An object of the present invention is to provide a novel resin that is useful as a film forming material for lithography and the like. The problem can be solved by a resin containing a constituent unit represented by the following formula (1) or (1)′:
An object of the present invention is to provide a novel resin that is useful as a film forming material for lithography and the like. The problem can be solved by a resin containing a constituent unit represented by the following formula (1) or (1)′:
wherein the variables in the formulas are as described in the specification.
C08G 8/20 - Polymères de condensation obtenus uniquement à partir d'aldéhydes ou de cétones avec des phénols d'aldéhydes de formaldéhyde, p.ex. de formaldéhyde formé in situ avec des phénols polyhydriques
G03F 7/11 - Matériaux photosensibles - caractérisés par des détails de structure, p.ex. supports, couches auxiliaires avec des couches de recouvrement ou des couches intermédiaires, p.ex. couches d'ancrage
A carbon dioxide absorbent containing an amine compound (A) having a heterocyclic structure (X) selected from the group consisting of an oxygen-containing heterocyclic structure and a sulfur-containing heterocyclic structure, a content of the amine compound (A) being 65% by mass or more.
B01D 53/14 - SÉPARATION Épuration chimique ou biologique des gaz résiduaires, p.ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols par absorption
C07D 295/13 - Composés hétérocycliques contenant des cycles polyméthylène imine d'au moins cinq chaînons, des cycles aza-3 bicyclo [3.2.2] nonane, piperazine, morpholine ou thiomorpholine, ne comportant que des atomes d'hydrogène liés directement aux atomes de car avec des radicaux hydrocarbonés substitués liés aux atomes d'azote du cycle substitués par des atomes d'azote liés par des liaisons simples ou doubles avec les atomes d'azote du cycle et les atomes d'azote substituants liés à la même chaîne carbonée, qui n'est pas interrompue par des cycles carbocycliques à une chaîne acyclique saturée
C07D 307/14 - Radicaux substitués par des atomes d'azote ne faisant pas partie d'un radical nitro
C07D 307/52 - Radicaux substitués par des atomes d'azote ne faisant par partie d'un radical nitro
C07D 309/04 - Composés hétérocycliques contenant des cycles à six chaînons comportant un atome d'oxygène comme unique hétéro-atome du cycle, non condensés avec d'autres cycles ne comportant pas de liaison double entre chaînons cycliques ou entre chaînons cycliques et chaînons non cycliques avec uniquement des atomes d'hydrogène, des radicaux hydro-carbonés ou des radicaux hydrocarbonés substitués, liés directement aux atomes de carbone du cycle
C07D 333/20 - Radicaux substitués par des hétéro-atomes, autres que les halogènes, liés par des liaisons simples par des atomes d'azote
A bisimide phenyl ester acid dianhydride represented by the following formula (2):
A bisimide phenyl ester acid dianhydride represented by the following formula (2):
A bisimide phenyl ester acid dianhydride represented by the following formula (2):
where R3 and R4 each independently represents a hydrogen atom or an organic group having 1 to 10 carbon atoms; each m is independently an integer of 1 to 4; and each A independently represents an aromatic ring or an alicyclic ring.
According to the present invention, there can be provided a photocurable composition comprising a sulfur (a) having a cyclic structure represented by the following formula (1), an episulfide compound (b), and a photopolymerization initiator (c), wherein the content of the sulfur (a) is 1 to 28 parts by mass, with respect to the total mass (100 parts by mass) of the sulfur (a) and the episulfide compound (b):
According to the present invention, there can be provided a photocurable composition comprising a sulfur (a) having a cyclic structure represented by the following formula (1), an episulfide compound (b), and a photopolymerization initiator (c), wherein the content of the sulfur (a) is 1 to 28 parts by mass, with respect to the total mass (100 parts by mass) of the sulfur (a) and the episulfide compound (b):
C08J 3/28 - Traitement par ondes énergétiques ou par rayonnement de particules
C08K 5/375 - Sulfures contenant des cycles aromatiques à six chaînons
C08K 5/45 - Composés hétérocycliques comportant du soufre dans le cycle
G02B 1/04 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques caractérisés par la substance dont ils sont faits; Revêtements optiques pour éléments optiques faits de substances organiques, p.ex. plastiques
66.
PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE
A photosensitive polyimide resin composition containing: a ring-closed polyimide resin (A) having a structure represented by Formula (1) and a weight average molecular weight of 70000 or less; and a polyfunctional radically polymerizable compound (B) having 4 or more and 100 or less radically polymerizable functional groups.
A photosensitive polyimide resin composition containing: a ring-closed polyimide resin (A) having a structure represented by Formula (1) and a weight average molecular weight of 70000 or less; and a polyfunctional radically polymerizable compound (B) having 4 or more and 100 or less radically polymerizable functional groups.
A polyester resin containing: a diol constituent unit containing a unit a1 derived from spiroglycol represented by formula (1) and a unit a2 derived from ethylene glycol; and a dicarboxylic acid constituent unit containing a unit b derived from terephthalic acid and/or an ester thereof. A content of the unit a1 is from 5 to 60 mol % and a content of the unit a2 is from 30 to 95 mol %, based on a total amount of the unit a1 and the unit a2. A content of the unit b is from 80 to 100 mol % based on a total amount of the dicarboxylic acid constituent unit.
A polyester resin containing: a diol constituent unit containing a unit a1 derived from spiroglycol represented by formula (1) and a unit a2 derived from ethylene glycol; and a dicarboxylic acid constituent unit containing a unit b derived from terephthalic acid and/or an ester thereof. A content of the unit a1 is from 5 to 60 mol % and a content of the unit a2 is from 30 to 95 mol %, based on a total amount of the unit a1 and the unit a2. A content of the unit b is from 80 to 100 mol % based on a total amount of the dicarboxylic acid constituent unit.
Provided is a production system for producing a hydrocarbon compound, which is a hydrocarbon compound production system capable of managing an environmental load reducing effect derived from a raw material. The hydrocarbon compound production system includes a hydrogen production device that generates hydrogen, a carbon dioxide supply device that supplies a carbon dioxide, and a hydrocarbon compound production device that generates a hydrocarbon compound from each of the hydrogen generated by the hydrogen production device and the carbon dioxide supplied from the carbon dioxide supply device, wherein, on the basis of at least either one of respective environmental indicators of the hydrogen generated by the hydrogen production device and the carbon dioxide supplied from the carbon dioxide supply device, an environmental load level of the hydrocarbon compound generated by the hydrocarbon compound production device is categorized.
A composition that includes Compound (a) and Compound (b). Compound (a) is represented by formula (1):
A composition that includes Compound (a) and Compound (b). Compound (a) is represented by formula (1):
A composition that includes Compound (a) and Compound (b). Compound (a) is represented by formula (1):
where: Ar represents an aromatic ring; m represents an integer of 2 to 8; n represents an integer of 0 to 6, provided that m+n is the number of carbon atoms constituting the aromatic ring, or less; and R1 each independently represents an alkylthio group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group. Compound (b) is represented by formula (2):
A composition that includes Compound (a) and Compound (b). Compound (a) is represented by formula (1):
where: Ar represents an aromatic ring; m represents an integer of 2 to 8; n represents an integer of 0 to 6, provided that m+n is the number of carbon atoms constituting the aromatic ring, or less; and R1 each independently represents an alkylthio group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group. Compound (b) is represented by formula (2):
A composition that includes Compound (a) and Compound (b). Compound (a) is represented by formula (1):
where: Ar represents an aromatic ring; m represents an integer of 2 to 8; n represents an integer of 0 to 6, provided that m+n is the number of carbon atoms constituting the aromatic ring, or less; and R1 each independently represents an alkylthio group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group. Compound (b) is represented by formula (2):
where p represents an integer of 0 to 4, and q represents an integer of 0 to 2.
C08G 75/08 - Polythioéthers à partir de thioéthers cycliques à partir de thiiranes
G02B 1/04 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques caractérisés par la substance dont ils sont faits; Revêtements optiques pour éléments optiques faits de substances organiques, p.ex. plastiques
70.
ROUGHENING TREATMENT METHOD FOR STAINLESS STEEL SURFACE, METHOD FOR MANUFACTURING ROUGHENED STAINLESS STEEL, AND AQUEOUS COMPOSITION USED IN SAID METHODS
The problem of the present invention is to provide a roughening treatment method in which the surface of stainless steel is sufficiently roughened in an efficient manner with few steps, while maintaining good surface quality of the stainless steel after treatment. The above problem is solved by a roughening treatment method for stainless steel, which comprises a roughening treatment step that uses a first aqueous composition, and a post-treatment step that uses a second aqueous composition. Namely, the roughening treatment step is to roughen the surface of stainless steel containing copper or a metal having an ionization tendency larger than copper by bringing the first aqueous composition into contact with the surface, wherein the first aqueous composition comprises 0.1% to 20% by mass of hydrogen peroxide based on the total amount of the first aqueous composition, 0.25% to 40% by mass of copper ions based on the total amount of the first aqueous composition, and 1% to 30% by mass of halide ions based on the total amount of the first aqueous composition, wherein the post-treatment step is to perform a post-treatment by bringing the second aqueous composition into contact, under acidic conditions, with the surface of the stainless steel that has been treated in the roughening treatment step, and wherein the second aqueous composition comprises at least a peroxide.
The problem of the present invention is to provide an aqueous composition with which the surface of stainless steel is sufficiently roughened in an efficient manner with few steps, while maintaining good quality (e.g., thickness) of the stainless steel after treatment. The above problem is solved by the following aqueous composition for roughening the surface of stainless steel. Namely, the aqueous composition comprises 0.1% to 10% by mass of hydrogen peroxide based on the total amount of the aqueous composition, 1% to 30% by mass of halide ions based on the total amount of the aqueous composition, and 0% to 3% by mass of copper ions based on the total amount of the aqueous composition.
A recess etching solution for recess etching a metal wiring in a semiconductor substrate manufacturing process; and a recess etching method employing the same. The recess etching solution is for applying recess etching to a surface of a cobalt-containing metal layer embedded in a via or a trench formed in a semiconductor substrate, and contains (A) an organic acid, one of or both of (B) a nitrogen-containing heterocyclic compound and (C) an organic solvent, and (D) water. The recess etching method includes applying recess etching to a surface of a cobalt-containing metal layer by bringing the recess etching solution into contact with the surface of the cobalt-containing metal layer embedded in a via or a trench formed in a semiconductor substrate.
H01L 21/3213 - Gravure physique ou chimique des couches, p.ex. pour produire une couche avec une configuration donnée à partir d'une couche étendue déposée au préalable
C09K 13/00 - Compositions pour l'attaque chimique, la gravure, le brillantage de surface ou le décapage
73.
RESIN COMPOSITION, PREPREG, RESIN SHEET, LAMINATE, METAL FOIL-CLAD LAMINATE, AND PRINTED WIRING BOARD
An object is to provide a resin composition having a high permittivity and a low dissipation factor, and also a low coefficient of thermal expansion and a good appearance, and suitably used for producing an insulation layer of a printed wiring board, and a prepreg, a resin sheet, a laminate, a metal foil-clad laminate, and a printed wiring board obtainable by using the resin composition. The resin composition contains: (A) BaTi4O9; (B) a filler different from the BaTi4O9 (A); and (C) a thermosetting resin; wherein a median particle size of the BaTi4O9 (A) is 0.10 to 1.00 μm, and a volume ratio of the BaTi4O9 (A) to the filler (B), the BaTi4O9(A):the filler (B), ranges from 15:85 to 80:20.
Provided are a pressure vessel with excellent gas barrier properties, less likely to cause cracks, and excellent internal pressure fatigue properties, and a production method thereof. The pressure vessel includes a layer at least in the body part, and the layer includes a fiber-reinforced resin material that contains a resin component and a continuous reinforcing fiber. A ratio (inner region/outer region) of the continuous reinforcing fiber content (vol. %) in the inner region to a continuous reinforcing fiver content (vol. %) in the outer region is from 0.80 to 0.99, where the inner region is up to 0.1% from the inner side of the layer in the thickness direction, and the outer region is up to 0.1% from the outer side of the layer in the thickness direction, and the continuous reinforcing fiber content (vol. %) in the central region of the layer, which is between up to more than 0.1% from the inner side in the thickness direction and up to more than 0.1% from the outer side in the thickness direction, is from 40 to 60 vol. %.
A method for producing a patterned substrate, including: step (a) of forming a film composed of a photosensitive polyimide resin composition on a substrate; step (b) of exposing the film; and step (c) of developing the exposed film using a developer to form a pattern formed of the film on the substrate, wherein a relative energy difference (RED) between the developer and the film before exposure is 0.50 or greater and 1.4 or less.
An oxygen absorbing resin composition containing a polyolefin, an iron powder, titanium oxide, and calcium oxide, a content of the iron powder being from 10 to 50 mass % in the oxygen absorbing resin composition, a mass ratio of the titanium oxide to the iron powder [titanium oxide/iron powder] being from 0.1 to 0.5, and a mass ratio of the calcium oxide to the iron powder [calcium oxide/iron powder] being from 0.1 to 0.5.
B65D 65/40 - Emploi de stratifiés pour des buts particuliers d'emballage
B32B 15/20 - Produits stratifiés composés essentiellement de métal comportant de l'aluminium ou du cuivre
B32B 15/085 - Produits stratifiés composés essentiellement de métal comprenant un métal comme seul composant ou comme composant principal d'une couche adjacente à une autre couche d'une substance spécifique de résine synthétique comprenant des polyoléfines
B32B 27/32 - Produits stratifiés composés essentiellement de résine synthétique comprenant des polyoléfines
B32B 27/18 - Produits stratifiés composés essentiellement de résine synthétique caractérisée par l'emploi d'additifs particuliers
B32B 27/30 - Produits stratifiés composés essentiellement de résine synthétique comprenant une résine acrylique
B32B 27/34 - Produits stratifiés composés essentiellement de résine synthétique comprenant des polyamides
B32B 27/08 - Produits stratifiés composés essentiellement de résine synthétique comme seul composant ou composant principal d'une couche adjacente à une autre couche d'une substance spécifique d'une résine synthétique d'une sorte différente
77.
RESIN COMPOSITION, COATING FILM USING SAME, AND ELECTROLYTE
According to the present invention, there can be provided a resin composition, comprising: a polycarbonate resin comprising a constituent unit represented by the following general formula (1):
According to the present invention, there can be provided a resin composition, comprising: a polycarbonate resin comprising a constituent unit represented by the following general formula (1):
According to the present invention, there can be provided a resin composition, comprising: a polycarbonate resin comprising a constituent unit represented by the following general formula (1):
wherein R1 to R4 and R11 to R14 each independently hydrogen, fluorine, chlorine, bromine or iodine, etc., a represents an integer of 1 to 1,000, and X represents —S—, etc.; and a carbonate-based organic solvent, wherein the content of the polycarbonate resin in the resin composition is 0.05% to 50% by mass; the content of the carbonate-based organic solvent in the resin composition is 50% to 99.5% by mass, and the total percentage of constituent units represented by the following formulae (2) to (4) in all of the constituent units represented by the general formula (1) is 0% to 75% at a molar percentage:
According to the present invention, there can be provided a resin composition, comprising: a polycarbonate resin comprising a constituent unit represented by the following general formula (1):
wherein R1 to R4 and R11 to R14 each independently hydrogen, fluorine, chlorine, bromine or iodine, etc., a represents an integer of 1 to 1,000, and X represents —S—, etc.; and a carbonate-based organic solvent, wherein the content of the polycarbonate resin in the resin composition is 0.05% to 50% by mass; the content of the carbonate-based organic solvent in the resin composition is 50% to 99.5% by mass, and the total percentage of constituent units represented by the following formulae (2) to (4) in all of the constituent units represented by the general formula (1) is 0% to 75% at a molar percentage:
Provided is a method for producing a methyl-adduct compound, the method including methylating, in the presence of potassium carbonate and dimethyl carbonate, a dinitrile compound represented by Formula (1) below to obtain a methyl-adduct compound represented by Formula (2) below:
4 are each methyl.
C07C 211/27 - Composés contenant des groupes amino liés à un squelette carboné ayant des groupes amino liés à des atomes de carbone acycliques d'un squelette carboné non saturé contenant au moins un cycle aromatique à six chaînons ayant des groupes amino reliés au cycle aromatique à six chaînons par l'intermédiaire de chaînes carbonées saturées
C07C 209/48 - Préparation de composés contenant des groupes amino liés à un squelette carboné par réduction d'acides carboxyliques ou de leurs esters en présence d'ammoniac ou d'amines ou par réduction de nitriles, d'amides d'acides carboxyliques, d'imines ou d'imino-éthers par réduction de nitriles
C07C 253/30 - Préparation de nitriles d'acides carboxyliques par des réactions n'impliquant pas la formation de groupes cyano
C07C 255/33 - Nitriles d'acides carboxyliques ayant des groupes cyano liés à des atomes de carbone acycliques ayant des groupes cyano liés à des atomes de carbone acycliques d'un squelette carboné contenant au moins un cycle aromatique à six chaînons avec des groupes cyano reliés au cycle aromatique à six chaînons ou au système cyclique condensé contenant ce cycle, par l'intermédiaire de chaînes carbonées saturées
79.
EPOXY RESIN CURING AGENT, EPOXY RESIN COMPOSITION, PAINT, AND ADHESIVE
Provided are an epoxy resin curing agent containing an amine composition or a modified product thereof, wherein the amine composition contains metaxylylenediamine and paraxylylenediamine at a mass ratio of 99/1 to 51/49, an epoxy resin composition, and a paint and an adhesive containing these.
An epoxy resin composition containing an epoxy resin, an epoxy resin curing agent containing an amine-based curing agent, and a polyalkylene glycol, as well as a gas barrier laminate and a packaging material in which the epoxy resin composition is used.
A photosensitive polyimide resin composition containing: a ring-closed polyimide resin (A) having a structure represented by Formula (1); and a polyfunctional radically polymerizable compound (B) having radically polymerizable functional groups and oxyalkylene groups, wherein a number of the radically polymerizable functional groups in the polyfunctional radically polymerizable compound (B) is 3 or greater and 100 or less, and wherein a total number of moles of the oxyalkylene groups added in the polyfunctional radically polymerizable compound (B) is 5 or greater and 100 or less.
A method for producing fluorenone including a pretreatment step of heating fluorene in the presence of a lower aliphatic carboxylic acid, a bromine compound, and a metal catalyst, and an oxidation step of continuously supplying fluorene and oxygen to perform an oxidation reaction, in the order indicated.
C07C 45/36 - Préparation de composés comportant des groupes C=O liés uniquement à des atomes de carbone ou d'hydrogène; Préparation des chélates de ces composés par oxydation avec l'oxygène moléculaire de restes —CHx dans des composés non saturés dans des composés contenant des cycles aromatiques à six chaînons
B01J 31/04 - Catalyseurs contenant des hydrures, des complexes de coordination ou des composés organiques contenant des composés organiques ou des hydrures métalliques contenant des acides carboxyliques ou leurs sels
B01J 35/12 - Catalyseurs caractérisés par leur forme ou leurs propriétés physiques, en général liquides ou fondus
83.
THERMOPLASTIC RESIN AND OPTICAL LENS INCLUDING SAME
A thermoplastic resin including a constituent unit (A) derived from a monomer represented by general formula (1). In general formula (1), R1 and R11 each independently represent a hydrogen atom, an aryl group having 6-12 carbon atoms, or a linear or branched alkyl group having 1-4 carbon atoms, and X represents one of general formulas (a) to (d). In general formulas (a) to (d), R21 to R57 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, a linear or branched alkyl group having 1-4 carbon atoms, or a linear or branched alkoxy group having 1-7 carbon atoms.
C08L 69/00 - Compositions contenant des polycarbonates; Compositions contenant des dérivés des polycarbonates
C08G 64/16 - Polycarbonates aliphatique-aromatiques ou araliphatiques
G02B 1/04 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques caractérisés par la substance dont ils sont faits; Revêtements optiques pour éléments optiques faits de substances organiques, p.ex. plastiques
84.
FILAMENT, MATERIAL, AND METHOD FOR PRODUCING THE MATERIAL
Provided are a filament that does not impair the strength that is intrinsic to the filament and contains a disperse dye, and has excellent color fastness, a material using the filament, and a method for producing the material. The filament containing a polyamide resin having an aromatic ring and/or a hetero ring, and a disperse dye having an aromatic ring and/or a hetero ring.
D01F 6/60 - Filaments, ou similaires, faits par l’homme, à un seul composant, formés de polymères synthétiques; Leur fabrication à partir de produits d'homopolycondensation à partir de polyamides
D06P 3/26 - Polyamides; Polyuréthanes utilisant des colorants en dispersion
D01F 8/12 - Filaments, ou similaires, faits par l’homme, conjugués, c. à d. à plusieurs composants; Leur fabrication à partir de polymères synthétiques avec au moins un polyamide comme constituant
An aldehyde composition containing an aldehyde represented by Formula (1) and an aldehyde represented by Formula (2) is provided. A mass ratio [(1)/(2)] of the aldehyde represented by Formula (1) to the aldehyde represented by Formula (2) is from 96/4 to 99.97/0.03.
An aldehyde composition containing an aldehyde represented by Formula (1) and an aldehyde represented by Formula (2) is provided. A mass ratio [(1)/(2)] of the aldehyde represented by Formula (1) to the aldehyde represented by Formula (2) is from 96/4 to 99.97/0.03.
C07C 47/228 - Composés non saturés comportant des groupes —CHO liés à des atomes de carbone acycliques contenant des cycles aromatiques à six chaînons, p.ex. le phénylacétaldéhyde
National University Corporation Tokai National Higher Education and Research System (Japon)
Inventeur(s)
Maehara, Akira
Hirata, Hitoshi
Murayama, Atsuhiko
Nakagawa, Yasunobu
Abrégé
An object of the present invention is to provide a bioabsorbable and stretchable fibrous medical material that enables formation of ligation which provides a small and hard-to-unravel knot even with a weak force. The present invention provides a fibrous medical material which is a fibrous material composed of a molded article provided by spinning and drawing a bioabsorbable aliphatic polymer, wherein an elongation at break is 75% or greater, an intermediate elastic modulus in tension at a strain ranging from 0.25% and 10% is lower than an initial elastic modulus in tension at a strain ranging from 0.05% to 0.25%, the intermediate elastic modulus in tension is 400 MPa or less, and a residual strain rate after 100% deformation is 70% or less.
An alicyclic alcohol of Formula (1) and a fragrance composition including the same is described. An alicyclic alcohol composition containing an alicyclic alcohol of Formula (1) and an alicyclic alcohol of Formula (2), is also described, and this composition may also include an alicyclic alcohol of Formula (3). The alicyclic alcohol composition may comprise Formula (1) at a content of 85 mass % to 98 mass %.
An alicyclic alcohol of Formula (1) and a fragrance composition including the same is described. An alicyclic alcohol composition containing an alicyclic alcohol of Formula (1) and an alicyclic alcohol of Formula (2), is also described, and this composition may also include an alicyclic alcohol of Formula (3). The alicyclic alcohol composition may comprise Formula (1) at a content of 85 mass % to 98 mass %.
The present invention relates to triarylmethane compounds of the formula (I), which suitable as monomers for preparing thermoplastic resins having beneficial optical properties and which can be used for producing optical devices. R1 , R2 are e.g. hydrogen; Y is an alkylene group having 2, 3 or 4 carbon atoms, Ar is selected from mono- or polycyclic aryl and mono- or polycyclic hetaryl; X1, X2, X3, X4 are CH, C—Rx or N, provided that in each ring at most two of X1, X2, X3, X4 are N; Rx is e.g. halogen, CN or CH═CH2. The invention also relates to thermoplastic resins comprising a polymerized unit of the compound of formula (I).
The present invention relates to triarylmethane compounds of the formula (I), which suitable as monomers for preparing thermoplastic resins having beneficial optical properties and which can be used for producing optical devices. R1 , R2 are e.g. hydrogen; Y is an alkylene group having 2, 3 or 4 carbon atoms, Ar is selected from mono- or polycyclic aryl and mono- or polycyclic hetaryl; X1, X2, X3, X4 are CH, C—Rx or N, provided that in each ring at most two of X1, X2, X3, X4 are N; Rx is e.g. halogen, CN or CH═CH2. The invention also relates to thermoplastic resins comprising a polymerized unit of the compound of formula (I).
C07C 43/23 - Ethers une liaison sur l'oxygène de la fonction éther étant sur un atome de carbone d'un cycle aromatique à six chaînons contenant des groupes hydroxyle ou O-métal
C08G 64/06 - Polycarbonates aromatiques ne contenant pas d'insaturations aliphatiques
C08G 64/30 - Procédés généraux de préparation utilisant des carbonates
G02B 1/04 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques caractérisés par la substance dont ils sont faits; Revêtements optiques pour éléments optiques faits de substances organiques, p.ex. plastiques
C08G 63/193 - Composés hydroxylés contenant des cycles aromatiques contenant plusieurs cycles aromatiques
Provided is a method for producing fluorenone comprising an oxidation step of oxidizing fluorene in the presence of an aliphatic carboxylic acid having 2 to 3 carbon atoms, a metal catalyst, a bromine compound, and oxygen, a solvent removal step of removing the aliphatic carboxylic acid, a heating step at 120 to 350° C., and a distillation step in the order indicated.
C07C 49/675 - Composés non saturés comportant un groupe cétone faisant partie d'un cycle contenant des cycles aromatiques à six chaînons un groupe cétone faisant partie d'un système cyclique condensé comportant trois cycles
90.
RESIN COMPOSITION, CURED PRODUCT, SEALING MATERIAL, ADHESIVE, INSULATING MATERIAL, COATING MATERIAL, PREPREG, MULTILAYERED BODY, AND FIBER-REINFORCED COMPOSITE MATERIAL
C08G 18/10 - Procédés mettant en œuvre un prépolymère impliquant la réaction d'isocyanates ou d'isothiocyanates avec des composés contenant des hydrogènes actifs, dans une première étape réactionnelle
C08J 5/24 - Imprégnation de matériaux avec des prépolymères pouvant être polymérisés en place, p.ex. fabrication des "prepregs"
91.
Epoxy resin curing agent, epoxy resin composition, and use of amine composition
A composition containing: a compound (a) represented by Formula (1):
A composition containing: a compound (a) represented by Formula (1):
A composition containing: a compound (a) represented by Formula (1):
wherein Ar represents an aromatic ring, m represents an integer of 2 to 8, n represents an integer of 0 to 6, provided that m+n is equal to or less than a number of carbon atoms that constitute the aromatic ring, and R1 each independently represents an alkylthio group, an epoxyalkylthio group, a thiol group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group; and 1,2,3,5,6-pentathiepane (b).
C08G 18/38 - Composés de bas poids moléculaire contenant des hétéro-atomes autres que l'oxygène
G02B 1/04 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques caractérisés par la substance dont ils sont faits; Revêtements optiques pour éléments optiques faits de substances organiques, p.ex. plastiques
Provided are: a filament containing a polyamide resin, the filament having a high strength and a high retention percentage of mechanical properties after water absorption; a structure; a resin composition; and a method for producing the filament. The filament includes a polyamide resin containing diamine-derived structural units and dicarboxylic acid-derived structural units. 70 mol % or more of the diamine-derived structural units are derived from xylylenediamine, and 70 mol % or more of the dicarboxylic acid-derived structural units are derived from α,ω-linear aliphatic dicarboxylic acid having from 11 to 14 carbons. The content of a compound with a molecular weight of 310 or more and 1000 or less is 0.1 mass % or more and 1.5 mass % or less, and the content of a compound with a molecular weight of less than 310 is 0.1 mass % or less.
D01F 6/60 - Filaments, ou similaires, faits par l’homme, à un seul composant, formés de polymères synthétiques; Leur fabrication à partir de produits d'homopolycondensation à partir de polyamides
C08G 69/26 - Polyamides dérivés, soit des acides amino-carboxyliques, soit de polyamines et d'acides polycarboxyliques dérivés de polyamines et d'acides polycarboxyliques
D01F 8/12 - Filaments, ou similaires, faits par l’homme, conjugués, c. à d. à plusieurs composants; Leur fabrication à partir de polymères synthétiques avec au moins un polyamide comme constituant
94.
COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD
Provided is a single-layer container containing a polyester resin (X), a polyamide resin (Y), a blue colorant (A), and a red colorant (B). The content of the polyamide resin (Y) is from 0.05 to 7.0 mass%, and the content of the blue colorant (A) is from 1 to 40 ppm.
B29C 49/00 - Moulage par soufflage, c. à d. en soufflant une préforme ou une paraison dans un moule pour obtenir la forme désirée; Appareils à cet effet
C08G 69/26 - Polyamides dérivés, soit des acides amino-carboxyliques, soit de polyamines et d'acides polycarboxyliques dérivés de polyamines et d'acides polycarboxyliques
C08K 5/098 - Sels métalliques d'acides carboxyliques
C08J 11/06 - Récupération ou traitement des résidus des polymères sans réaction chimique
96.
PRODUCTION METHOD FOR POLYSILOXANE, COMPOSITION INCLUDING POLYSILOXANE, AND MOLDED BODY
The present invention provides, for example, a method for efficiently producing a polysiloxane having a siloxane constituent unit while making it possible to improve safety and reduce environmental burden. The above-mentioned problem is solved by a method comprising a polymerization step of polymerizing a silane-based compound and a diol compound in the presence of a transesterification catalyst including at least a phosphorus compound, in which the silane-based compound is selected from a specific diaryloxysilane compound, a specific dialkoxysilane compound, and a specific silicon compound, and in the polymerization step, a polysiloxane having a siloxane constituent unit represented by any of formula (1-1) to formula (1-4) is produced. (In the formulas, R1-R10, R30-R33, Z1, Z2, J1, K1, A1, A2, L1, L2, and X are as described in the description of the present application.)
The present invention provides, for example, a method for efficiently producing a polysiloxane having a siloxane constituent unit while making it possible to improve safety and reduce environmental burden. The above-mentioned problem is solved by a method comprising a polymerization step of polymerizing a silane-based compound and a diol compound in the presence of a transesterification catalyst including at least a phosphorus compound, in which the silane-based compound is selected from a specific diaryloxysilane compound, a specific dialkoxysilane compound, and a specific silicon compound, and in the polymerization step, a polysiloxane having a siloxane constituent unit represented by any of formula (1-1) to formula (1-4) is produced. (In the formulas, R1-R10, R30-R33, Z1, Z2, J1, K1, A1, A2, L1, L2, and X are as described in the description of the present application.)
C08G 77/18 - Polysiloxanes contenant du silicium lié à des groupes contenant de l'oxygène à des groupes alcoxyle ou aryloxyle
C08G 77/08 - Procédés de préparation caractérisés par les catalyseurs utilisés
G02B 1/04 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES Éléments optiques caractérisés par la substance dont ils sont faits; Revêtements optiques pour éléments optiques faits de substances organiques, p.ex. plastiques
C08L 83/06 - Polysiloxanes contenant du silicium lié à des groupes contenant de l'oxygène
97.
METHOD FOR PRODUCING AROMATIC NITRILE COMPOUND AND METHOD FOR PRODUCING CARBONATE ESTER
The present invention provides a method for producing an aromatic nitrile compound, the method comprising a dehydration reaction wherein a desired compound can be selectively obtained with high yield while suppressing the generation of byproducts during the regeneration of an aromatic amide compound into the corresponding aromatic nitrile compound. In addition, the present invention realizes a method for efficiently producing a carbonate ester by applying the abovementioned production method to a method for producing a carbonate ester. The above are achieved by means of a method for producing an aromatic nitrile compound involving a dehydration reaction wherein an aromatic amide compound is dehydrated, the method having a contact step for bringing the aromatic amide compound into contact with a catalyst in a gas phase during the dehydration reaction.
B01J 23/10 - Catalyseurs contenant des métaux, oxydes ou hydroxydes métalliques non prévus dans le groupe des terres rares
C07C 68/04 - Préparation des esters de l'acide carbonique ou de l'acide formique halogéné à partir de l'anhydride carbonique ou de carbonates inorganiques
COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND
Provided is a compound, a polymer, a composition, a composition for film formation, a pattern formation method, an insulating film formation method, and a method for producing a compound, by which a resist having excellent exposure sensitivity can be obtained.
Provided is a compound, a polymer, a composition, a composition for film formation, a pattern formation method, an insulating film formation method, and a method for producing a compound, by which a resist having excellent exposure sensitivity can be obtained.
A compound represented by the following formula (1):
Provided is a compound, a polymer, a composition, a composition for film formation, a pattern formation method, an insulating film formation method, and a method for producing a compound, by which a resist having excellent exposure sensitivity can be obtained.
A compound represented by the following formula (1):
Provided is a compound, a polymer, a composition, a composition for film formation, a pattern formation method, an insulating film formation method, and a method for producing a compound, by which a resist having excellent exposure sensitivity can be obtained.
A compound represented by the following formula (1):
wherein RA is a hydrogen atom, a methyl group, or a trifluoromethyl group; RX is ORB or a hydrogen atom; RB is a substituted or unsubstituted alkyl group having 1 to 30 carbon atoms; and P is a hydroxy group, an alkoxy group, an ester group, an acetal group, a carboxyalkoxy group, a carbonate ester group, a nitro group, an amino group, a carboxyl group, a thiol group, an ether group, a thioether group, a phosphine group, a phosphone group, a urethane group, a urea group, an amide group, an imide group, or a phosphate group.
C07C 37/20 - Préparation de composés comportant des groupes hydroxyle ou O-métal liés à un atome de carbone d'un cycle aromatique à six chaînons par des réactions augmentant le nombre d'atomes de carbone au moyen d'aldéhydes ou de cétones
C07C 39/373 - Dérivés halogénés tous les groupes hydroxyle étant liés à des cycles non condensés et avec une insaturation autre que celle des cycles aromatiques
C07C 41/22 - Préparation d'éthers par des réactions ne formant pas de liaisons sur l'oxygène de la fonction éther par substitution d'atomes d'halogène par des atomes d'autres halogènes
C07C 41/26 - Préparation d'éthers par des réactions ne formant pas de liaisons sur l'oxygène de la fonction éther par introduction de groupes hydroxyle ou O-métal
C07C 41/30 - Préparation d'éthers par des réactions ne formant pas de liaisons sur l'oxygène de la fonction éther par augmentation du nombre d'atomes de carbone, p.ex. par oligomérisation
C07C 43/225 - Ethers une liaison sur l'oxygène de la fonction éther étant sur un atome de carbone d'un cycle aromatique à six chaînons contenant des atomes d'halogène
C07C 43/23 - Ethers une liaison sur l'oxygène de la fonction éther étant sur un atome de carbone d'un cycle aromatique à six chaînons contenant des groupes hydroxyle ou O-métal
C07C 45/63 - Préparation de composés comportant des groupes C=O liés uniquement à des atomes de carbone ou d'hydrogène; Préparation des chélates de ces composés par des réactions ne créant pas de groupe C=O par substitution d'atomes d'halogène par des atomes d'autres halogènes
C07C 49/84 - Cétones comportant un groupe cétone lié à un cycle aromatique à six chaînons contenant des groupes éther, des groupes , des groupes ou des groupes
C07C 67/08 - Préparation d'esters d'acides carboxyliques par réaction d'acides carboxyliques ou d'anhydrides symétriques avec le groupe hydroxyle ou O-métal de composés organiques
C07C 69/63 - Esters contenant des atomes d'halogène d'acides saturés
C07C 69/712 - Ethers le groupe hydroxyle de l'ester étant éthérifié par un composé hydroxylé dont le groupe hydroxyle est lié à un atome de carbone d'un cycle aromatique à six chaînons
C07C 69/96 - Esters de l'acide carbonique ou de l'acide formique halogéné
C07D 309/12 - Atomes d'oxygène uniquement des atomes d'hydrogène et un atome d'oxygène liés directement aux atomes de carbone du cycle, p.ex. éthers du tétrahydropyranne
C08F 212/14 - Monomères contenant un seul radical aliphatique non saturé contenant un cycle substitué par des hétéro-atomes ou des groupes contenant des hétéro-atomes
C08F 246/00 - Copolymères dans lesquels la nature des monomères n'est définie que pour les monomères en minorité
G03F 7/038 - Composés macromoléculaires rendus insolubles ou sélectivement mouillables
NATIONAL UNIVERSITY CORPORATION KOBE UNIVERSITY (Japon)
AGC Inc. (Japon)
MITSUBISHI GAS CHEMICAL COMPANY, INC. (Japon)
Inventeur(s)
Tsuda, Akihiko
Okazoe, Takashi
Harada, Hidefumi
Abrégé
The objective of the present invention is to provide a method for producing a carbonyl halide efficiently to the used halogenated methane. The method for producing a carbonyl halide according to the present invention is characterized in comprising the steps of preparing a mixed gas comprising oxygen and a halogenated methane having one or more halogeno groups selected from the group consisting of chloro, bromo and iodo, and flowing the mixed gas and irradiating a high energy light to the flowed mixed gas.
Provided is a cyanine compound being bound counterions consisting of an anion and a cation, wherein the anion is represented by the following formula (I-1):
Provided is a cyanine compound being bound counterions consisting of an anion and a cation, wherein the anion is represented by the following formula (I-1):
Provided is a cyanine compound being bound counterions consisting of an anion and a cation, wherein the anion is represented by the following formula (I-1):
wherein R1 and R2 each independently represent a hydrogen atom or a monovalent organic group; R3 and R4 each independently represent a monovalent group such as a phenyl group; X represents a hydrogen atom, a halogen atom or a monovalent organic group; and Y represents a divalent group such as a n-propenyl group.
brevets
