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[Owner] ASML Holding N.V. 247
ASML Netherlands B.V. 109
Date
2023 3
2022 29
2021 53
2020 34
2019 27
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Classe IPC
G03F 7/20 - Exposition; Appareillages à cet effet 189
G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique 69
H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces 20
G01N 21/956 - Inspection de motifs sur la surface d'objets 17
H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension 15
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1.

IMPROVED BROADBAND RADIATION GENERATION IN PHOTONIC CRYSTAL OR HIGHLY NON-LINEAR FIBRES

      
Numéro d'application EP2022072178
Numéro de publication 2023/025578
Statut Délivré - en vigueur
Date de dépôt 2022-08-08
Date de publication 2023-03-02
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Ajgaonkar, Mahesh, Upendra
  • Abdolvand, Amir
  • Pongers, Willem, Richard
  • Baselmans, Johannes, Jacobus, Matheus
  • Ni, Yongfeng

Abrégé

Radiation source assembly and method for generating broadband radiation by spectral broadening. The radiation source assembly comprises a pump assembly configured to provide broadband input radiation. The pump assembly comprises a pump source configured to provide first radiation at a pump wavelength, and a broadband assembly configured to provide second radiation comprising a continuous wavelength range, wherein the first radiation and the second radiation form the broadband input radiation. The radiation source assembly further comprises an optical fibre configured to receive the broadband input radiation. The optical fibre comprises a core configured along at least a part of the length of the fibre to guide the received broadband input radiation during propagation through the fibre, so as to generate broadband radiation by spectral broadening to be output by the fibre.

Classes IPC  ?

  • G02F 1/35 - Optique non linéaire
  • G02B 6/02 - Fibres optiques avec revêtement
  • G02F 1/365 - Optique non linéaire dans une structure de guide d'ondes optique

2.

METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND MICROSCOPY

      
Numéro d'application EP2022067791
Numéro de publication 2023/285138
Statut Délivré - en vigueur
Date de dépôt 2022-06-28
Date de publication 2023-01-19
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Swillam, Mohamed
  • Guo, Wei
  • Roux, Stephen

Abrégé

A metrology system includes a radiation source (708), a phased array (722a,b;724a,b;726;734), a detector, and a comparator. The phased array includes optical elements (706), waveguides (704), and phase modulators (702). The phased array generates a beam of radiation and directs the beam toward a surface of an object. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves combine to form the beam. The detector receives radiation scattered from the surface and generates a detection signal based on the received radiation. The comparator analyzes the detection signal and determines a location of a defect on the surface based on the analyzing.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G01N 21/956 - Inspection de motifs sur la surface d'objets
  • G02F 1/295 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p.ex. commutation, ouverture de porte ou modulation; Optique non linéaire pour la commande de la position ou de la direction des rayons lumineux, c. à d. déflexion dans une structure de guide d'ondes optique

3.

LITHOGRAPHIC APPARATUS, LOCKING DEVICE, AND METHOD

      
Numéro d'application EP2022067794
Numéro de publication 2023/285140
Statut Délivré - en vigueur
Date de dépôt 2022-06-28
Date de publication 2023-01-19
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Burbank, Daniel, Nathan
  • Dine, Andi

Abrégé

A lithographic apparatus includes an illumination system to illuminate a pattern of a patterning device, a projection system to project an image of the pattern onto a substrate, a movable stage to support the patterning device or the substrate, a slotted object, and a locking device (700) to prevent a motion of the movable stage. The locking device comprises an actuator (702) and a wheel device (704) comprising a ring feature (708) and coupled to the actuator. The actuator rotates the wheel device about a rotation axis (706). The ring feature has a width (710) defined parallel to the rotation axis. The width is variable with respect to azimuthal direction of the wheel device. The ring feature engages a slot of the slotted object. The rotating adjusts the width of the ring feature within the slot such that a relative motion between the device and the slotted object is prevented.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants

4.

SYSTEMS, METHODS, AND DEVICES FOR THERMAL CONDITIONING OF RETICLES IN LITHOGRAPHIC APPARATUSES

      
Numéro d'application EP2022066044
Numéro de publication 2022/268560
Statut Délivré - en vigueur
Date de dépôt 2022-06-13
Date de publication 2022-12-29
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Van Damme, Jean-Philippe, Xavier
  • Johnson, Richard, John
  • Subramanian, Raaja Ganapathy

Abrégé

Embodiments herein describe systems, methods, and devices for thermal conditioning of patterning devices at a lithographic apparatus. A patterning device cooling system for thermally conditioning a patterning device (202) of a lithographic apparatus is described, the cooling system including a thermal conditioner that thermally conditions the patterning device, and a controller that controls the thermal conditioner to determine a temperature state of the patterning device, determine a production state of the lithographic apparatus, and thermally condition the patterning device for exposures based on the temperature state and a production state of the lithographic apparatus.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

5.

METROLOGY SYSTEMS, TEMPORAL AND SPATIAL COHERENCE SCRAMBLER AND METHODS THEREOF

      
Numéro d'application EP2022062491
Numéro de publication 2022/258274
Statut Délivré - en vigueur
Date de dépôt 2022-05-09
Date de publication 2022-12-15
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Swillam, Mohamed

Abrégé

A system includes a radiation source, an optical element, a detector, and a processor. The radiation source generates a beam of radiation. The optical element produces a non-uniform change in a phase of the beam of radiation and outputs a coherence-scrambled radiation for irradiating a target. An optical property of the optical element is tunable so as to change an amount of incoherence of the coherence-scrambled radiation. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation. The processor analyzes the measurement signal to determine a characteristic of the target.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G02B 27/48 - Systèmes optiques utilisant la granulation produite par laser
  • G02F 1/295 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p.ex. commutation, ouverture de porte ou modulation; Optique non linéaire pour la commande de la position ou de la direction des rayons lumineux, c. à d. déflexion dans une structure de guide d'ondes optique
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique
  • G02F 1/01 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p.ex. commutation, ouverture de porte ou modulation; Optique non linéaire pour la commande de l'intensité, de la phase, de la polarisation ou de la couleur

6.

MODULAR WAFER TABLE AND METHODS OF MANUFACTURING THEREOF

      
Numéro d'application EP2022061381
Numéro de publication 2022/243005
Statut Délivré - en vigueur
Date de dépôt 2022-04-28
Date de publication 2022-11-24
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Shervin, Shahab
  • Uitterdijk, Tammo
  • Lipson, Matthew
  • Vermeulen, Marcus, Martinus, Petrus, Adrianus

Abrégé

The present disclosure is directed to a modular wafer table and methods for refurbishing a scrapped wafer to manufacture the modular wafer table. The method comprises removing one or more burls from a surface of a wafer table; polishing the surface of the wafer table after removing the one or more burls to form a core module; forming a burl module having a plurality of burls thereon; and bonding the core module to the burl module.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces

7.

METROLOGY SYSTEMS, MEASUREMENT OF WEAR SYSTEMS AND METHODS THEREOF

      
Numéro d'application EP2022058670
Numéro de publication 2022/214392
Statut Délivré - en vigueur
Date de dépôt 2022-03-31
Date de publication 2022-10-13
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Chillara, Venkata, Siva, Chaithanya
  • Sanna, Kellen

Abrégé

A method includes irradiating an object with an illumination beam, receiving, using a detector, scattered light from a first side of the object, generating a signal based on the scattered light, comparing the signal to a reference model, and determining a quantity of wear of the first side of the object based on the comparing. The first side of the object includes a layer of a coating material, and the irradiating is from a second side of the object. The scattered light includes transmitted light through the object from the second side to the first side.

Classes IPC  ?

  • G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur

8.

LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING SENSOR

      
Numéro d'application EP2022057360
Numéro de publication 2022/214302
Statut Délivré - en vigueur
Date de dépôt 2022-03-21
Date de publication 2022-10-13
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Ajgaonkar, Mahesh, Upendra
  • Swinkels, Gerardus, Hubertus, Petrus, Maria
  • Van Bokhoven, Laurentius, Johannes, Adrianus
  • Klugkist, Joost, André
  • Bos, Koen, Martin, Willem, Jan

Abrégé

A lithographic apparatus includes an illumination system, a projection system, a temperature- sensitive object, and a temperature sensor that includes a detector and waveguide device that is thermally coupled to the temperature-sensitive object and includes an input end, a downstream end, and first and second scattering features. The illumination system illuminates a pattern of a patterning device. The projection system projects an image of the pattern onto a substrate. Based on temperature, the first scattering feature reflects a first spectrum. Radiation not reflected by the first scattering feature is allowed downstream. Based on temperature, the second scattering feature reflects a second spectrum different from the first spectrum. Radiation not reflected by the second scattering feature is allowed downstream. The detector is disposed to receive radiation including the reflected first and second spectra from the input end and generates a measurement signal based on the received radiation.

Classes IPC  ?

9.

DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY METHOD

      
Numéro d'application EP2022055506
Numéro de publication 2022/200014
Statut Délivré - en vigueur
Date de dépôt 2022-03-04
Date de publication 2022-09-29
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Coene, Willem, Marie, Julia, Marcel
  • Tenner, Vasco, Tomas
  • Cramer, Hugo, Augustinus, Joseph
  • Den Boef, Arie, Jeffrey
  • Koek, Wouter
  • Sokolov, Sergei
  • Van De Wijdeven, Jeroen, Johan, Maarten
  • Raub, Alexander, Kenneth

Abrégé

Disclosed is a method of correcting a holographic image, a processing device, a dark field digital holographic microscope, a metrology apparatus and an inspection apparatus. The method comprises obtaining the holographic image; determining at least one attenuation function due to motion blur from the holographic image; and correcting the holographic image or a portion thereof using the at least one attenuation function.

Classes IPC  ?

  • G03H 1/00 - Procédés ou appareils holographiques utilisant la lumière, les infrarouges ou les ultraviolets pour obtenir des hologrammes ou pour en obtenir une image; Leurs détails spécifiques
  • G03H 1/04 - Procédés ou appareils pour produire des hologrammes
  • G03H 1/08 - Procédés ou appareils pour produire des hologrammes pour faire des hologrammes synthétiques
  • G03H 1/02 - Procédés ou appareils holographiques utilisant la lumière, les infrarouges ou les ultraviolets pour obtenir des hologrammes ou pour en obtenir une image; Leurs détails spécifiques - Détails
  • G03H 1/26 - Procédés ou appareils adaptés spécialement pour produire des hologrammes multiples ou pour en obtenir des images, p.ex. procédés pour l'holographie à plusieurs couleurs

10.

TOOL FOR MODIFYING A SUPPORT SURFACE

      
Numéro d'application EP2022057339
Numéro de publication 2022/200267
Statut Délivré - en vigueur
Date de dépôt 2022-03-21
Date de publication 2022-09-29
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Moliterno, Matthew, Stephen, Beaton
  • Kochersperger, Peter, Conrad

Abrégé

Devices and methods are disclosed for modifying substrate support elements of a substrate holder. According to some embodiments, device is disclosed, the device including a substrate holder having a plurality of support elements protruding from a first side of the substrate holder, a support structure configured to hold the substrate holder in a transverse manner from a second side of the substrate holder, and a cleaning tool having a spherical main body. The device also includes a processor that aligns a predetermined region of interest of the substrate holder with a predetermined location of the cleaning tool, manipulates movement of the support structure such that the alignment produces a contact between the predetermined region of interest and the predetermined location, and initiates a cleaning operation of the predetermined region of interest.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces

11.

OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF

      
Numéro d'application EP2022052618
Numéro de publication 2022/184375
Statut Délivré - en vigueur
Date de dépôt 2022-02-03
Date de publication 2022-09-09
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Van Goch, Bram, Paul, Theodoor
  • Kunnen, Johan, Gertrudis, Cornelis
  • Na, Sae Na

Abrégé

A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an evaluation test based on the data, determining whether to proceed with exposing a substrate based on the evaluation test, selecting an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.

Classes IPC  ?

12.

CONTAMINANT-DETECTING SYSTEM AND METHOD

      
Numéro d'application EP2022051403
Numéro de publication 2022/175019
Statut Délivré - en vigueur
Date de dépôt 2022-01-21
Date de publication 2022-08-25
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Pandey, Nitesh
  • Kreuzer, Justin, Lloyd
  • Pawlowski, Michal, Emanuel
  • Guo, Wei

Abrégé

A system can include a light source configured to illuminate a surface of a pellicle, a scanner configured to scan the surface of the pellicle; a spectrometer configured to measure a Raman spectra of a reference signal and a test signal, the reference signal being based on a measurement from a surface of the pellicle and/or a reticle and the test signal being based on the illuminated surface of the pellicle, and a processor. The processor can be configured to determine a difference between the Raman spectra of the reference signal and the test signal and identify a presence of a contaminant on the surface of the pellicle in response to detecting a deviation in the Raman spectra of the reference signal and the test signal.

Classes IPC  ?

  • G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
  • G01N 21/65 - Diffusion de Raman
  • G01N 21/88 - Recherche de la présence de criques, de défauts ou de souillures
  • G03F 1/84 - Inspection

13.

AUGMENTED REALITY (AR) ASSISTED PARTICLE CONTAMINATION DETECTION

      
Numéro d'application EP2022051507
Numéro de publication 2022/175025
Statut Délivré - en vigueur
Date de dépôt 2022-01-24
Date de publication 2022-08-25
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • T Da Silva, Michael, Ryan
  • Weinlandt, Thomas, Christopher

Abrégé

An augmented reality (AR) headset includes one or more sensors and a processor coupled to the one or more sensors. The one or more sensors may be configured to scan a surface of an object during an inspection. The processor may be configured to process, in real-time during the inspection, information obtained using the one or more sensors. The processor may be further configured to determine, based on the processed information, whether a contaminant is present on the surface of the object. And, the processor may be further configured to, in response to determining that the contaminant is present on the surface of the object, display a image of the contaminant to a user of the AR headset.

Classes IPC  ?

  • G02B 27/01 - Dispositifs d'affichage "tête haute"
  • G03F 7/00 - Production par voie photomécanique, p.ex. photolithographique, de surfaces texturées, p.ex. surfaces imprimées; Matériaux à cet effet, p.ex. comportant des photoréserves; Appareillages spécialement adaptés à cet effet
  • G01N 21/94 - Recherche de souillures, p.ex. de poussières
  • G03F 7/20 - Exposition; Appareillages à cet effet

14.

METHODS AND APPARATUSES FOR SPATIALLY FILTERING OPTICAL PULSES

      
Numéro d'application EP2022050489
Numéro de publication 2022/167179
Statut Délivré - en vigueur
Date de dépôt 2022-01-12
Date de publication 2022-08-11
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Alsaqqa, Ali
  • Uebel, Patrick, Sebastian
  • Teunissen, Paulus, Antonius, Andreas

Abrégé

An optical filter apparatus comprising an optical divergence device, operable to receive optical pulses and spatially distribute the optical pulses over an optical plane in dependence with a pulse energy of each of the optical pulses; and a spatial filter, located at said optical plane, operable to apply spatial filtering to the optical pulses based on a location of each of the optical pulses at the optical plane resulting from the spatial distributing.

Classes IPC  ?

  • G02B 26/08 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la direction de la lumière
  • G01N 21/00 - Recherche ou analyse des matériaux par l'utilisation de moyens optiques, c. à d. en utilisant des ondes submillimétriques, de la lumière infrarouge, visible ou ultraviolette
  • G03F 7/20 - Exposition; Appareillages à cet effet

15.

MULTI-CHANNEL LIGHT SOURCE FOR PROJECTION OPTICS HEATING

      
Numéro d'application EP2021087888
Numéro de publication 2022/161736
Statut Délivré - en vigueur
Date de dépôt 2021-12-30
Date de publication 2022-08-04
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Van Bokhoven, Laurentius, Johannes, Adrianus
  • Ajgaonkar, Mahesh, Upendra

Abrégé

Systems, apparatuses, and methods are provided for heating a plurality of optical components. An example method can include receiving an input radiation beam from a radiation source. The example method can further include generating a plurality of output radiation beams based on the input radiation beam. The example method can further include transmitting the plurality of output radiation beams towards a plurality of heater head optics configured to heat the plurality of optical components. Optionally, the example method can further include controlling a respective power value, and realizing a flat-top far-field profile, of each of the plurality of output radiation beams.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

16.

FAST UNIFORMITY DRIFT CORRECTION

      
Numéro d'application EP2022050819
Numéro de publication 2022/161795
Statut Délivré - en vigueur
Date de dépôt 2022-01-16
Date de publication 2022-08-04
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Wiener, Roberto B.
  • Mankala, Kalyan, Kumar
  • Downey, Todd R.

Abrégé

Systems, apparatuses, and methods are provided for adjusting illumination slit uniformity in a lithographic apparatus. An example method can include irradiating, by a radiation source, a portion of a finger assembly with radiation. The example method can further include receiving, by a radiation detector, at least a portion of the radiation in response to the irradiating of the portion of the finger assembly. The example method can further include determining, by a processor, a change in a shape of the finger assembly based on the received radiation. The example method can further include generating, by the processor, a control signal configured to modify a position of the finger assembly based on the determined change in the shape of the finger assembly. Subsequently, the example method can include transmitting, by the processor, the control signal to a motion control system coupled to the finger assembly.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

17.

SYSTEMS AND METHODS FOR MEASURING INTENSITY IN A LITHOGRAPHIC ALIGNMENT APPARATUS

      
Numéro d'application EP2022050094
Numéro de publication 2022/157009
Statut Délivré - en vigueur
Date de dépôt 2022-01-04
Date de publication 2022-07-28
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Swillam, Mohamed
  • Kreuzer, Justin, Lloyd
  • Roux, Stephen
  • Nelson, Michael, Leo
  • Eralp, Muhsin

Abrégé

A metrology system includes a radiation source, an adjustable diffractive element, an optical system, an optical element, and a processor. The radiation source generates radiation. The adjustable diffractive element diffracts the radiation to generate first and second beams of radiation. The first and second beams have first and second different non-zero diffraction orders, respectively. The optical system directs the first and second beams toward a target structure such that first and second scattered beams of radiation are generated based on the first and second beams, respectively. The metrology system adjusts a phase difference of the first and second scattered beams. The optical element interferes the first and second scattered beams at an imaging detector that generates a detection signal. The processor receives and analyzes the detection signal to determine a property of the target structure based on the adjusted phase difference.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

18.

VACUUM SHEET BOND FIXTURING AND FLEXIBLE BURL APPLICATIONS FOR SUBSTRATE TABLES

      
Numéro d'application EP2021084066
Numéro de publication 2022/144144
Statut Délivré - en vigueur
Date de dépôt 2021-12-02
Date de publication 2022-07-07
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Alikhan, Abdullah
  • Uitterdijk, Tammo
  • Engelen, Johannes, Bernardus, Charles
  • Kamieniecki, Daniel
  • Van De Ven, Bastiaan, Lambertus, Wilhelmus, Marinus
  • Poiesz, Thomas
  • Levasier, Leon, Martin
  • Overkamp, Jim, Vincent
  • Pijnenburg, Johannes, Adrianus, Cornelis, Maria
  • Van Berkel, Koos
  • Diguido, Gregory, James
  • Socci, Jr., Anthony, C.
  • Sigal, Iliya
  • Lomans, Bram, Antonius, Gerardus
  • Habets, Michel, Ben, Isel

Abrégé

Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension
  • H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces

19.

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF

      
Numéro d'application EP2021084063
Numéro de publication 2022/135870
Statut Délivré - en vigueur
Date de dépôt 2021-12-02
Date de publication 2022-06-30
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Beukman, Arjan, Johannes, Anton
  • Goorden, Sebastianus, Adrianus
  • Roux, Stephen
  • Sokolov, Sergei
  • Alpeggiani, Filippo

Abrégé

A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

20.

CHARGE DISSIPATIVE RETICLE TABLE CLEANING RETICLE

      
Numéro d'application EP2021085090
Numéro de publication 2022/128750
Statut Délivré - en vigueur
Date de dépôt 2021-12-09
Date de publication 2022-06-23
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Rizo Diago, Pedro, Julian
  • Voevodkin, George, Grigorievich
  • Ebert, Earl, William

Abrégé

A reticle stage cleaning apparatus for a reticle stage in a lithographic apparatus includes a substrate having a frontside and a backside opposite the frontside and a conductive layer disposed on the frontside of the substrate. The conductive layer is configured to contact the reticle stage to dissipate charge on the reticle stage and to remove particles on the reticle stage via an electrostatic field generated between the conductive layer and the reticle stage. The substrate can include a plurality of grooves and the conductive layer can be disposed on the frontside of the substrate and on a bottom surface of the plurality of grooves. The reticle stage cleaning apparatus can include a second conductive layer configured to remove particles on the reticle stage via a second electrostatic field and be disposed atop the conductive layer in the bottom surface of the plurality of grooves.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

21.

METROLOGY SYSTEM AND COHERENCE ADJUSTERS

      
Numéro d'application EP2021084043
Numéro de publication 2022/122560
Statut Délivré - en vigueur
Date de dépôt 2021-12-02
Date de publication 2022-06-16
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Sokolov, Sergei
  • Huisman, Simon, Reinald
  • Lian, Jin
  • Goorden, Sebastianus, Adrianus
  • Eralp, Muhsin
  • Pellemans, Henricus, Petrus, Maria
  • Kreuzer, Justin, Lloyd

Abrégé

A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).

Classes IPC  ?

  • G01N 21/95 - Recherche de la présence de criques, de défauts ou de souillures caractérisée par le matériau ou la forme de l'objet à analyser
  • G01N 21/956 - Inspection de motifs sur la surface d'objets
  • G02B 6/36 - Moyens de couplage mécaniques
  • G02B 6/00 - OPTIQUE ÉLÉMENTS, SYSTÈMES OU APPAREILS OPTIQUES - Détails de structure de dispositions comprenant des guides de lumière et d'autres éléments optiques, p.ex. des moyens de couplage

22.

INTENSITY ORDER DIFFERENCE BASED METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF

      
Numéro d'application EP2021084056
Numéro de publication 2022/122565
Statut Délivré - en vigueur
Date de dépôt 2021-12-02
Date de publication 2022-06-16
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Kreuzer, Justin, Lloyd
  • Huisman, Simon, Reinald
  • Goorden, Sebastianus, Adrianus
  • Alpeggiani, Filippo

Abrégé

The system includes a radiation source, a diffractive element, an optical system, a detector, and a processor. The radiation source generates radiation. The diffractive element diffracts the radiation to generate a first beam and a second beam. The first beam includes a first non-zero diffraction order and the second beam includes a second non-zero diffraction order that is different from the first non-zero diffraction order. The optical system receives a first scattered beam and a second scattered radiation beam from a target structure and directs the first scattered beam and the second scattered beam towards a detector. The detector generates a detection signal. The processor analyzes the detection signal to determine a target structure property based on at least the detection signal. The first beam is attenuated with respect to the second beam or the first scattered beam is purposely attenuated with respect to the second scattered beam.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

23.

MULTIPLE OBJECTIVES METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF

      
Numéro d'application EP2021081887
Numéro de publication 2022/112064
Statut Délivré - en vigueur
Date de dépôt 2021-11-16
Date de publication 2022-06-02
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Cappelli, Douglas, C.

Abrégé

A metrology or inspection system, a lithographic apparatus, and a method are provided. The system includes an illumination system, an optical system, a first optical device, a second optical device, a detector, and a processor. The optical system is configured to split an illumination beam into a first sub-beam and a second sub-beam. The first optical device is configured to receive the first sub-beam and direct the first sub-beam towards a first spot on a substrate. The substrate includes one or more target structures. The second optical device is configured to receive the second sub-beam and direct the second sub-beam towards a second spot on the substrate. The first spot is a different location than the second spot. The detector is configured to receive diffracted beams and to generate a detection signal. The processor is configured to determine a property of the one or more target structures.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique
  • G03F 7/20 - Exposition; Appareillages à cet effet

24.

POLARIZATION SELECTION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF

      
Numéro d'application EP2021078546
Numéro de publication 2022/096249
Statut Délivré - en vigueur
Date de dépôt 2021-10-14
Date de publication 2022-05-12
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Cappelli, Douglas, C.

Abrégé

An inspection system, a lithographic apparatus, and a method are provided. The inspection system includes an illumination system, an optical system, a shutter system, an objective system and a detector. The illumination system is configured to generate an illumination beam. The optical system is configured to split the illumination beam into a first sub-beam and a second sub-beam. The shutter system is configured to independently control a transmittance of the first sub-beam and the second subbeam. The objective system is configured to receive the first sub-beam and the second beam from the optical system and direct the first sub-beam and the second sub-beam towards a substrate having a target structure. The detector is configured to receive an image or a diffracted image of the target structure.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique
  • G03F 7/20 - Exposition; Appareillages à cet effet

25.

METROLOGY TOOL WITH POSITION CONTROL OF PROJECTION SYSTEM

      
Numéro d'application EP2021073400
Numéro de publication 2022/063508
Statut Délivré - en vigueur
Date de dépôt 2021-08-24
Date de publication 2022-03-31
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Butler, Hans
  • Den Boef, Arie, Jeffrey
  • Baggen, Mark, Constant, Johannes
  • Raaymakers, Jeroen, Arnoldus, Leonardus, Johannes
  • Zimmerman, Richard, Carl

Abrégé

Described herein is a metrology tool. The metrology tool includes a substrate table (ST) to hold a substrate (S); a projection system (PS) configured to project a beam on a target portion (TP) of the substrate; an actuator (PEA) configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G01N 21/956 - Inspection de motifs sur la surface d'objets

26.

POD HANDLING SYSTEMS AND METHODS FOR A LITHOGRAPHIC DEVICE

      
Numéro d'application EP2021073095
Numéro de publication 2022/053283
Statut Délivré - en vigueur
Date de dépôt 2021-08-19
Date de publication 2022-03-17
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Kogan, Boris
  • Wade, Robert, Jeffrey
  • Harrold, George, Hilary
  • Boudreau, Matthew

Abrégé

Systems, apparatuses, and methods are provided for transporting a reticle chamber (pod) for processing. In one example, a system for transporting the pod is disclosed. The system may include a moving apparatus, a base coupled to the moving apparatus, and a gripping ring extending from the base. In some aspects, the gripping ring grips a flange extending from the pod. The moving apparatus moves the base in response to the gripping ring gripping the flange.

Classes IPC  ?

  • G03F 1/66 - Réceptacles spécialement adaptés aux masques, aux masques vierges ou aux pellicules; Leur préparation
  • H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces
  • H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
  • H01L 21/673 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants utilisant des supports spécialement adaptés
  • B25J 15/00 - Têtes de préhension

27.

RADIATION SOURCE ARRANGEMENT AND METROLOGY DEVICE

      
Numéro d'application EP2021071634
Numéro de publication 2022/048843
Statut Délivré - en vigueur
Date de dépôt 2021-08-03
Date de publication 2022-03-10
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Alsaqqa, Ali
  • Patel, Aabid
  • Uebel, Patrick, Sebastian
  • Abdolvand, Amir
  • Teunissen, Paulus Paulus, Antonius, Andreas
  • Kadhim, Wisam F.

Abrégé

Disclosed is a radiation source arrangement comprising; a radiation source operable to generate source radiation comprising source energy pulses; and at least one non-linear energy-filter being operable to filter said source radiation to obtain filtered radiation comprising filtered energy pulses. The at least one non-linear energy-filter is operable to mitigate variation in energy in said filtered radiation by reducing the energy level of said source energy pulses which have an energy level corresponding to one of both extremities of an energy distribution of said source energy pulses by a greater amount than said source energy pulses which have an energy level corresponding to a peak of said energy distribution.

Classes IPC  ?

28.

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEM, AND INTENSITY IMBALANCE MEASUREMENT FOR ERROR CORRECTION

      
Numéro d'application EP2021070766
Numéro de publication 2022/042966
Statut Délivré - en vigueur
Date de dépôt 2021-07-24
Date de publication 2022-03-03
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Ebert, Earl, William
  • Rezvani Naraghi, Roxana

Abrégé

A metrology system includes a beam splitter and first and second sensors. The beam splitter splits scattered radiation scattered by a target into first and second portions of radiation. The first sensor receives the first portion. The second sensor receives the second portion after the second portion propagates along a path that includes a wedge system comprising a first wedge configured to diverge the second portion.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique
  • G03F 7/20 - Exposition; Appareillages à cet effet

29.

LITHOGRAPHIC APPARATUS AND METHODS FOR MULTI-EXPOSURE OF A SUBSTRATE

      
Numéro d'application EP2021070189
Numéro de publication 2022/023106
Statut Délivré - en vigueur
Date de dépôt 2021-07-19
Date de publication 2022-02-03
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Brunner, Timothy, Allan
  • Van De Kerkhof, Marcus, Adrianus

Abrégé

A lithographic system and a method for exposing a substrate are provided. The method includes providing a plurality of mask sets. Each mask set includes complementary masks corresponding to a respective pattern. The method further comprises exposing the substrate with the plurality of mask sets. A stitch location between the complementary masks of a mask set is different than a stitch location between the complementary masks of each other mask set of the plurality of mask sets.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

30.

DOUBLE-SCANNING OPTO-MECHANICAL CONFIGURATIONS TO IMPROVE THROUGHPUT OF PARTICLE INSPECTION SYSTEMS

      
Numéro d'application EP2021070305
Numéro de publication 2022/023129
Statut Délivré - en vigueur
Date de dépôt 2021-07-20
Date de publication 2022-02-03
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Pawlowski, Michal, Emanuel

Abrégé

Systems, apparatuses, and methods are provided for increasing the throughput of a particle inspection system. During a first portion of an exposure time period of the particle inspection system, an example method can include irradiating a first region of a substrate surface, blocking all reflected radiation outside the first region, and generating a first sub-image of the first region based on radiation reflected from the first region. During a second portion of the exposure time period, the example method can further include irradiating a second region of the substrate surface, blocking all reflected radiation outside the second region, and generating a second sub-image of the second region based on radiation reflected from the second region. Subsequently, the example method can include generating a composite image based on the first sub-image and the second sub-image.

Classes IPC  ?

  • G03F 1/84 - Inspection
  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G01N 21/47 - Dispersion, c. à d. réflexion diffuse
  • G01N 21/88 - Recherche de la présence de criques, de défauts ou de souillures
  • G01N 21/94 - Recherche de souillures, p.ex. de poussières

31.

SYSTEMS, METHODS, AND DEVICES FOR THERMAL CONDITIONING OF RETICLES IN LITHOGRAPHIC APPARATUSES

      
Numéro d'application EP2021067913
Numéro de publication 2022/017741
Statut Délivré - en vigueur
Date de dépôt 2021-06-29
Date de publication 2022-01-27
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Judge, Andrew
  • Taresh, Walter, Joseph
  • Figueroa, Dustin, Anthony

Abrégé

Embodiments herein describe systems, methods, and devices for thermal conditioning of reticles at a patterning device handling apparatus and a support structure in lithographic apparatuses. A patterning device handling apparatus includes a gripping device (510) with a plurality of pneumatic lines (530). The patterning device handling apparatus positions a first surface of a patterning device (502) below the gripping device, and the gripping device applies a first air flow to the patterning device using the plurality of pneumatic lines. The patterning device handling apparatus positions a second surface of the patterning device in the support structure. One or more vacuum pads (516) in clamping interfaces (506) in the support structure apply a second air flow (520) to the patterning device. The first and second air flows result in thermal conditioning of the patterning device.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

32.

SPECTROMETRIC METROLOGY SYSTEMS BASED ON MULTIMODE INTERFERENCE AND LITHOGRAPHIC APPARATUS

      
Numéro d'application EP2021067910
Numéro de publication 2022/012927
Statut Délivré - en vigueur
Date de dépôt 2021-06-29
Date de publication 2022-01-20
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Swillam, Mohamed
  • Kreuzer, Justin, Lloyd
  • Roux, Stephen

Abrégé

A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor. The radiation source generates radiation. The optical element directs radiation toward a target to generate scattered radiation from the target. The first detector receives a first portion of the scattered radiation and generates a first detection signal based on the received first portion. The multimode waveguide interferes a second portion of the scattered radiation using modes of the multimode waveguide. The second detector receives the interfered second portion and generates a second detection signal based on the received interfered second portion. The processor receives the first and second detection signals. The processor analyzes the received first portion, the received interfered second portion, and a propagation property of the multimode waveguide. The processor determines the property of the target based on the analysis.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique
  • G01N 21/956 - Inspection de motifs sur la surface d'objets

33.

SELF-REFERENCING INTEGRATED ALIGNMENT SENSOR

      
Numéro d'application EP2021065537
Numéro de publication 2021/259645
Statut Délivré - en vigueur
Date de dépôt 2021-06-09
Date de publication 2021-12-30
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Swillam, Mohamed
  • Kreuzer, Justin, Lloyd
  • Roux, Stephen

Abrégé

Systems, apparatuses, and methods are provided for determining the alignment of a substrate. An example method can include emitting a multi-wavelength radiation beam including a first wavelength and a second wavelength toward a region of a surface of a substrate. The example method can further include measuring a first diffracted radiation beam indicative of first order diffraction at the first wavelength in response to an irradiation of the region by the multi-wavelength radiation beam. The example method can further include measuring a second diffracted radiation beam indicative of first order diffraction at the second wavelength in response to the irradiation of the region by the multi-wavelength radiation beam. Subsequently, the example method can include generating, based on the measured first set of photons and the measured second set of photons, an electronic signal for use in determining an alignment position of the substrate.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

34.

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, ILLUMINATION SWITCHES AND METHODS THEREOF

      
Numéro d'application EP2021065078
Numéro de publication 2021/259618
Statut Délivré - en vigueur
Date de dépôt 2021-06-04
Date de publication 2021-12-30
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Swillam, Mohamed
  • Reijnders, Marinus, Petrus

Abrégé

A system includes an illumination system, an optical element, a switching element and a detector. The illumination system includes a broadband light source that generates a beam of radiation. The dispersive optical element receives the beam of radiation and generates a plurality of light beams having a narrower bandwidth than the broadband light source. The optical switch receives the plurality of light 5 beams and transmits each one of the plurality of light beams to a respective one of a plurality of alignment sensor of a sensor array. The detector receives radiation returning from the sensor array and to generate a measurement signal based on the received radiation.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique
  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G02B 6/293 - Moyens de couplage optique ayant des bus de données, c. à d. plusieurs guides d'ondes interconnectés et assurant un système bidirectionnel par nature en mélangeant et divisant les signaux avec des moyens de sélection de la longueur d'onde

35.

SUB MICRON PARTICLE DETECTION ON BURL TOPS BY APPLYING A VARIABLE VOLTAGE TO AN OXIDIZED WAFER

      
Numéro d'application EP2021065079
Numéro de publication 2021/259619
Statut Délivré - en vigueur
Date de dépôt 2021-06-04
Date de publication 2021-12-30
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Uitterdijk, Tammo

Abrégé

Systems, apparatuses, methods, and computer program products are provided for determining a free form flatness of a substrate table. An example system can include a substrate table that includes a first substrate table surface and a grounded substrate table electrical connection configured to ground the substrate table. The system can further include a substrate that includes a semiconducting layer, a thermally-grown insulating layer, a first substrate surface disposed on the insulating layer, and a substrate electrical connection configured to transmit a voltage to the semiconducting layer. The system can further include a metrology system configured to apply a voltage to the substrate electrical connection to electrostatically clamp the substrate to the substrate table, measure a flatness of the first substrate surface, and determine a free form flatness of the first substrate table surface based on the measured flatness of the first substrate surface.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension

36.

MONOLITHIC PARTICLE INSPECTION DEVICE

      
Numéro d'application EP2021065540
Numéro de publication 2021/259646
Statut Délivré - en vigueur
Date de dépôt 2021-06-09
Date de publication 2021-12-30
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Van Weperen, Ilse
  • Beukman, Arjan, Johannes, Anton
  • Swillam, Mohamed
  • Kreuzer, Justin, Lloyd
  • Roux, Stephen

Abrégé

Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.

Classes IPC  ?

  • G01N 21/95 - Recherche de la présence de criques, de défauts ou de souillures caractérisée par le matériau ou la forme de l'objet à analyser
  • G01N 21/956 - Inspection de motifs sur la surface d'objets
  • G03F 1/84 - Inspection

37.

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF

      
Numéro d'application EP2021065197
Numéro de publication 2021/254810
Statut Délivré - en vigueur
Date de dépôt 2021-06-07
Date de publication 2021-12-23
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Huisman, Simon, Reinald
  • Malyk, Sergey
  • Lin, Yuxiang
  • Slotboom, Daan, Maurits

Abrégé

A system includes an illumination system, an optical element, a switching element and a detector. The illumination system includes a broadband light source that generates a beam of radiation. The dispersive optical element receives the beam of radiation and generates a plurality of light beams having a narrower bandwidth than the broadband light source. The optical switch receives the plurality of light beams and transmits each one of the plurality of light beams to a respective one of a plurality of alignment sensor of a sensor array. The detector receives radiation returning from the sensor array and to generate a measurement signal based on the received radiation.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

38.

LITHOGRAPHIC PRE-ALIGNMENT IMAGING SENSOR WITH BUILD-IN COAXIAL ILLUMINATION

      
Numéro d'application EP2021063554
Numéro de publication 2021/249739
Statut Délivré - en vigueur
Date de dépôt 2021-05-20
Date de publication 2021-12-16
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Vladimirsky, Yuli
  • Ryzhikov, Lev

Abrégé

A patterning device pre-alignment sensor system is disclosed. The system comprises at least one illumination source configured to provide an incident beam along a normal direction towards a patterning device. The system further comprises an object lens group channel along the normal direction configured to receive a 0th order refracted beam from the patterning device. The system further comprises a first light reflector configured to redirect the 0th order refracted beam to form a first retroreflected beam. The system further comprises a first image lens group channel configured to transmit the first retroreflected beam to a first light sensor. The first light sensor is configured to detect the first retroreflected beam to determine a location feature of the patterning device.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

39.

SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS AND A METHOD OF MANUFACTURING A SUBSTRATE HOLDER

      
Numéro d'application EP2021063942
Numéro de publication 2021/249768
Statut Délivré - en vigueur
Date de dépôt 2021-05-25
Date de publication 2021-12-16
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • De Groot, Antonius, Franciscus, Johannes
  • Akbas, Mehmet, Ali
  • Ciftci Sandikci, Aysegul
  • Deng, Jerry, Jianguo
  • Neklyudova, Mariya
  • Mayer, Ryan
  • Gupta, Sonia
  • Steneken, Ryan, Charles
  • Van De Winkel, Jimmy, Matheus, Wilhelmus
  • Olexovitch, Christopher M.
  • Perry, Michael

Abrégé

Described herein is a method of producing a substrate holder for use in a lithographic apparatus, the substrate holder comprising a plurality of burls projecting from the substrate holder and each burl having a distal end surface configured to engage with a substrate. The method including applying, via a plasma enhanced chemical vapor deposition, a coating of a wear-resistant material at the distal end surface of one or more burls of the plurality of burls. The applying of the coating includes adjusting radio frequency (RF) power of RF electrodes in a range 100 to 1000 W for creating plasma; and exposing, in a chamber, the one or more plurality of burls to a precursor gas at a gas flow rate between 20 to 300 seem, the pre-cursor gas being Flexane.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces

40.

OBJECT HOLDER, ELECTROSTATIC SHEET AND METHOD FOR MAKING AN ELECTROSTATIC SHEET

      
Numéro d'application EP2021065418
Numéro de publication 2021/250074
Statut Délivré - en vigueur
Date de dépôt 2021-06-09
Date de publication 2021-12-16
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Van De Ven, Bastiaan, Lambertus, Wilhelmus, Marinus
  • Van Berkel, Koos
  • Van De Kerkhof, Marcus, Adrianus
  • Hamelinck, Roger, Franciscus, Mattheus, Maria
  • Shervin, Shahab
  • Verschuren, Marinus, Augustinus, Christiaan
  • Engelen, Johannes, Bernardus, Charles
  • Kruizinga, Matthias
  • Uitterdijk, Tammo
  • Galaktionov, Oleksiy, Sergiyovich
  • Janssen, Kjeld, Gertrudus, Hendrikus
  • Pijnenburg, Johannes, Adrianus, Cornelis, Maria
  • Van Delft, Peter

Abrégé

An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from a space between the object and the core body.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

41.

CLEANING TOOL AND METHOD FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS

      
Numéro d'application EP2021062221
Numéro de publication 2021/244822
Statut Délivré - en vigueur
Date de dépôt 2021-05-07
Date de publication 2021-12-09
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Sloan, Eric, Scott
  • Harlalka, Akshay, Dipakkumar
  • Rodak, Daniel, Paul

Abrégé

The described system comprises a cleaning tool. The cleaning tool is configured to be inserted into a lithography apparatus. The cleaning tool includes a body configured to be inserted into the lithography apparatus; a cleaner material configured to clean a portion of the lithography apparatus upon contact therewith; and a film carrying the cleaner material, the film configured to attached to the body and prevent the cleaner material from contacting a surface of the body. The includes, for example, a first layer at least partially covered with the cleaner material, and a second layer configured to attach to the surface of the body and prevent the cleaner material from contacting the surface of the cleaning tool, the second layer being disposed between the first layer and the surface of the body.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

42.

LITHOGRAPHIC APPARATUS, MULTI-WAVELENGTH PHASE-MODULATED SCANNING METROLOGY SYSTEM AND METHOD

      
Numéro d'application EP2021062894
Numéro de publication 2021/239479
Statut Délivré - en vigueur
Date de dépôt 2021-05-14
Date de publication 2021-12-02
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Goorden, Sebastianus, Adrianus
  • Alpeggiani, Filippo
  • Huisman, Simon, Reinald
  • Baselmans, Johannes, Jacobus, Matheus
  • Kok, Haico, Victor
  • Swillam, Mohamed
  • Beukman, Arjan, Johannes, Anton

Abrégé

A metrology system includes a radiation source, first, second, and third optical systems, and a processor. The first optical system splits the radiation into first and second beams of radiation and impart one or more phase differences between the first and second beams. The second optical system directs the first and second beams toward a target structure to produce first and second scattered beams of radiation. The third optical system interferes the first and second scattered beams at an imaging detector. The imaging detector generates a detection signal based on the interfered first and second scattered beams. The metrology system modulates one or more phase differences of the first and second scattered beams based on the imparted one or more phase differences. The processor analyzes the detection signal to determine a property of the target structure based on at least the modulated one or more phase differences.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

43.

GENERATING AN ALIGNMENT SIGNAL BASED ON LOCAL ALIGNMENT MARK DISTORTIONS

      
Numéro d'application EP2021060595
Numéro de publication 2021/233642
Statut Délivré - en vigueur
Date de dépôt 2021-04-22
Date de publication 2021-11-25
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Dastouri, Zahrasadat
  • Aarts, Igor, Matheus, Petronella
  • Mathijssen, Simon, Gijsbert, Josephus
  • Engblom, Peter, David

Abrégé

A method for generating an alignment signal is described. The method comprises detecting local dimensional distortions of an alignment mark and generating the alignment signal based on the alignment mark. The alignment signal is weighted based on the local dimensional distortions of the alignment mark. Detecting the local dimensional distortions comprises: irradiating the alignment mark with radiation, the alignment mark comprising a geometric feature; and detecting one or more phase and/or amplitude shifts in reflected radiation from the geometric feature. The one or more phase and/or amplitude shifts correspond to the local dimensional distortions of the geometric feature. A parameter of the radiation, an alignment inspection location within the geometric feature, an alignment inspection location on a layer of a structure, and/or a radiation beam trajectory across the geometric feature may be determined based on the one or more detected phase and/or amplitude shifts.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

44.

CONTAMINANT IDENTIFICATION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF

      
Numéro d'application EP2021059243
Numéro de publication 2021/213813
Statut Délivré - en vigueur
Date de dépôt 2021-04-08
Date de publication 2021-10-28
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Judge, Andrew
  • Kalluri, Ravi, Chaitanya
  • Pawlowski, Michal, Emanuel
  • Walsh, James, Hamilton
  • Kreuzer, Justin, Lloyd

Abrégé

An inspection system (1600), a lithography apparatus, and an inspection method are provided. The inspection system (1600) includes an illumination system (1602), a detection system (1606), and processing circuitry (1622). The illumination system generates a first illumination beam (1610) at a first wavelength and a second illumination beam (1618) at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object (1612) simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation (1620) scattered by a particle (1624) present at a surface (1626) of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.

Classes IPC  ?

  • G03F 1/84 - Inspection
  • G01N 21/88 - Recherche de la présence de criques, de défauts ou de souillures
  • G01N 21/94 - Recherche de souillures, p.ex. de poussières
  • G03F 7/20 - Exposition; Appareillages à cet effet

45.

CONTAMINANT ANALYZING METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF

      
Numéro d'application EP2021058739
Numéro de publication 2021/209273
Statut Délivré - en vigueur
Date de dépôt 2021-04-01
Date de publication 2021-10-21
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Pawlowski, Michal, Emanuel
  • Bendiksen, Aage
  • Dohan, Christopher, Michael
  • Onvlee, Johannes

Abrégé

An inspection system, a lithography apparatus, and an inspection method are provided. The inspection system includes an illumination system, a detection system, and processing circuitry. The illumination system generates a broadband beam and illuminates a surface of an object with the broadband illumination beam. The broadband beam has a continuous spectral range. The detection system receives radiation scattered at the surface and by a structure near the surface. The detection system generates a detection signal based on an optical response to the broadband illumination beam. The processing circuitry analyzes the detection signal. The processing circuitry distinguishes between a spurious signal and a signal corresponding to a defect on the surface based on the analyzing. The spurious signal is diminished for at least a portion of the continuous spectral range.

Classes IPC  ?

  • G01N 21/25 - Couleur; Propriétés spectrales, c. à d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes
  • G01N 21/47 - Dispersion, c. à d. réflexion diffuse
  • G01N 21/94 - Recherche de souillures, p.ex. de poussières
  • G01N 21/956 - Inspection de motifs sur la surface d'objets
  • G03F 1/84 - Inspection
  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G01N 21/88 - Recherche de la présence de criques, de défauts ou de souillures
  • G01N 21/95 - Recherche de la présence de criques, de défauts ou de souillures caractérisée par le matériau ou la forme de l'objet à analyser

46.

SYSTEMS AND METHODS FOR FORMING STRUCTURES ON A SURFACE

      
Numéro d'application EP2021056708
Numéro de publication 2021/197838
Statut Délivré - en vigueur
Date de dépôt 2021-03-16
Date de publication 2021-10-07
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Lyrintzis, Sotrios
  • Levy, Keane, Michael

Abrégé

Systems and methods for forming structures (e.g., a plurality of support peaks) on a surface are described. Forming structures on a surface includes (1) masking one or more portions of the surface; (2) removing material from one or more unmasked portions of the surface; and (3) iteratively repeating (1) and (2) to reshape the unmasked portions of the surface until the plurality of structures (e.g., support peaks) are formed such that regions of the surface between individual structures (support peaks) have a target characteristic such as a target topography, roughness, etc.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01J 37/305 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour couler, fondre, évaporer ou décaper
  • H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces

47.

OPTICAL APPARATUS AND LITHOGRAPHIC APPARATUS USING THE OPTICAL APPARATUS

      
Numéro d'application EP2021056715
Numéro de publication 2021/191005
Statut Délivré - en vigueur
Date de dépôt 2021-03-16
Date de publication 2021-09-30
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Trancho, Joe
  • Chapin, William, Pierce
  • Westover, Ryan, Richard
  • Mcdoom, Gerald, W.
  • Horton, Edward

Abrégé

Described herein is an optical element and a lithographic apparatus including the optical element. The optical apparatus includes a substrate having an aperture for passing light; a transmissive optical element covering the aperture of the substrate; and an optical contact bond between the substrate and transmissive optical element, the optical contact bond being spaced from the aperture a sufficient distance such that stress forces in the transmissive optical element from the optical contact bond to the aperture are below an acceptable stress threshold. The optical contact bond geometry herein, for example, minimizes a contact area and provides a quasi-kinematic (near-exactly constrained) interface between the substrate and the optical element.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G02B 7/02 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour lentilles

48.

END-OF-LIFE MONITORING OF DYNAMIC GAS LOCK MEMBRANES AND PUPIL FACET MIRRORS AND DETECTION OF MEMBRANE RUPTURE IN LITHOGRAPHIC APPARATUSES

      
Numéro d'application EP2021055081
Numéro de publication 2021/175797
Statut Délivré - en vigueur
Date de dépôt 2021-03-01
Date de publication 2021-09-10
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Lyons, Joseph, Harry
  • Hendriks, Jimi
  • Zhou, Ping
  • Huang, Zhuangxiong
  • Jilisen, Reinier, Theodorus, Martinus

Abrégé

Embodiments herein describe methods, devices, and systems for rupture detection and end-of- life monitoring of dynamic gas lock (DGL) membranes and pupil facet mirrors in lithographic apparatuses. A method for detecting rupture of a dynamic gas lock membrane in a lithographic apparatus includes illuminating the dynamic gas lock membrane with a measurement beam using a radiation source, in which the dynamic gas lock membrane is arranged between a wafer and projection optics of the lithography apparatus, and determining whether any radiation from the measurement beam is reflected from the dynamic gas lock membrane by using reflection collection optics, in which the reflection collection optics are arranged above the dynamic gas lock membrane. A rupture in the dynamic gas lock membrane is detected if no radiation is reflected from the dynamic gas lock membrane. If radiation is reflected from the dynamic gas lock membrane, the dynamic gas lock membrane is not ruptured.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

49.

RETICLE GRIPPER DAMPER AND ISOLATION SYSTEM FOR LITHOGRAPHIC APPARATUSES

      
Numéro d'application EP2021051758
Numéro de publication 2021/160423
Statut Délivré - en vigueur
Date de dépôt 2021-01-26
Date de publication 2021-08-19
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Wiener, Roberto B.
  • Kochersperger, Peter, Conrad
  • Kogan, Boris
  • Cuijpers, Martinus, Agnes, Willem
  • Wade, Robert, Jeffrey
  • Evans, Shaun

Abrégé

Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems. A reticle handler apparatus includes a reticle handler arm, a reticle baseplate configured to hold the reticle, and a gripper arranged to connect the reticle baseplate to the reticle handler arm. The gripper includes a static structure that is coupled to the reticle handler arm, an isolation structure that is coupled to the static structure, and one or more damping elements. The gripper is configured to reduce vibrations of the reticle in the reticle handler apparatus using the one or more damping elements.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension

50.

APPARATUS FOR SENSING ALIGNMENT MARKS

      
Numéro d'application EP2021051363
Numéro de publication 2021/156069
Statut Délivré - en vigueur
Date de dépôt 2021-01-21
Date de publication 2021-08-12
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Shome, Krishanu
  • Kreuzer, Justin, Lloyd

Abrégé

An apparatus for and method of sensing multiple alignment marks in which the optical axis of a detector is divided into multiple axes each of which can essentially simultaneously detect a separate alignment mark to generate a signal which can then be multiplexed and presented to a single detector or multiple detectors thus permitting more rapid detection of multiple marks.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

51.

IMPROVED ALIGNMENT OF SCATTEROMETER BASED PARTICLE INSPECTION SYSTEM

      
Numéro d'application EP2021051366
Numéro de publication 2021/156070
Statut Délivré - en vigueur
Date de dépôt 2021-01-21
Date de publication 2021-08-12
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Dohan, Christopher, Michael
  • Walsh, James, Hamilton
  • Wiener, Roberto B.

Abrégé

A pattering device inspection apparatus, system and method are described. According to one aspect, an inspection method is disclosed, the method including receiving, at a multi-element detector within an inspection system, radiation scattered at a surface of an object. The method further includes measuring, with processing circuitry, an output of each element of the multi-element detector, the output corresponding to the received scattered radiation. Moreover, the method includes calibrating, with the processing circuitry, the multi-element detector by identifying an active pixel area comprising one or more elements of the multi-element detector with a measured output being above a predetermined threshold. The method also includes identifying an inactive pixel area comprising a remainder of elements of the multi-element detector. Additionally, the method includes setting the active pixel area as a default alignment setting between the multi-element detector and a light source causing the scattered radiation.

Classes IPC  ?

52.

OPTICAL DESIGNS OF MINIATURIZED OVERLAY MEASUREMENT SYSTEM

      
Numéro d'application EP2021051340
Numéro de publication 2021/151775
Statut Délivré - en vigueur
Date de dépôt 2021-01-21
Date de publication 2021-08-05
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Swillam, Mohamed
  • Elazhary, Tamer, Mohamed, Tawfik, Ahmed, Mohamed
  • Roux, Stephen
  • Shmarev, Yevgeniy, Konstantinovich

Abrégé

A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system. The beam shaping system is configured to shape an illumination beam generated from the illumination system and generate a flat top beam spot of the illumination beam over a wavelength range from 400 nm to 2000 nm. The polarization modulation system is configured to provide tunability of linear polarization state of the illumination beam. The beam projection system is configured to project the flat top beam spot toward a target, such as an alignment mark on a substrate. The signal detection system is configured to collect a signal beam comprising diffraction order sub-beams generated from the target, and measure a characteristic (e.g., overlay) of the target based on the signal beam.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

53.

LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGING A TRAJECTORY OF PARTICULATE DEBRIS

      
Numéro d'application EP2020087889
Numéro de publication 2021/148224
Statut Délivré - en vigueur
Date de dépôt 2020-12-24
Date de publication 2021-07-29
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Albright, Ronald, Peter
  • Bal, Kursat
  • Banine, Vadim, Yevgenyevich
  • Bruls, Richard, Joseph
  • De Vries, Sjoerd, Frans
  • Frijns, Olav, Waldemar, Vladimir
  • Huang, Yang-Shan
  • Huang, Zhuangxiong
  • Jacobs, Johannes, Henricus, Wilhelmus
  • Moors, Johannes, Hubertus, Josephina
  • Nenchev, Georgi, Nenchev
  • Nikipelov, Andrey
  • Raasveld, Thomas, Maarten
  • Ranjan, Manish
  • Te Sligte, Edwin
  • Umstadter, Karl, Robert
  • Uzgören, Eray
  • Van De Kerkhof, Marcus, Adrianus
  • Yaghoobi, Parham

Abrégé

An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p.ex. utilisant la génération d'un plasma

54.

METHOD FOR REGION OF INTEREST PROCESSING FOR RETICLE PARTICLE DETECTION

      
Numéro d'application EP2021051365
Numéro de publication 2021/148550
Statut Délivré - en vigueur
Date de dépôt 2021-01-21
Date de publication 2021-07-29
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Kochersperger, Peter, Conrad
  • Dohan, Christopher, Michael
  • Kreuzer, Justin, Lloyd
  • Pawlowski, Michal, Emanuel
  • Bendiksen, Aage
  • Sobolev, Kirill, Urievich
  • Walsh, James, Hamilton
  • Wiener, Roberto B.
  • Venkataraman, Arun, Mahadevan

Abrégé

An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.

Classes IPC  ?

55.

SUBSTRATE, PATTERNING DEVICE AND LITHOGRAPHIC APPARATUSES

      
Numéro d'application EP2020084787
Numéro de publication 2021/144066
Statut Délivré - en vigueur
Date de dépôt 2020-12-07
Date de publication 2021-07-22
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Bijnen, Franciscus, Godefridus, Casper
  • Vu, Tran, Thanh, Thuy
  • Shome, Krishanu

Abrégé

A substrate, associated patterning device and a method. The substrate includes at least one periodic alignment mark and at least one neighboring structure. The alignment mark comprises at least a first part having a direction of periodicity in a first direction and at least a second part having a direction of periodicity in a second direction. Over the extent of a scan length of a scanning of a measurement spot over the alignment mark, the alignment mark is such that when a first region of the measurement spot comprises neighboring structure, a second region of the measurement spot comprises no parallel structure to the neighboring structure within the first region. The first region and second region comprise regions which correspond when one is rotated 180 degrees relative to the other within the measurement spot.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G01B 9/02 - Interféromètres
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique
  • H01L 23/544 - Marques appliquées sur le dispositif semi-conducteur, p.ex. marques de repérage, schémas de test

56.

LITHOGRAPHIC APPARATUS AND METHOD FOR DRIFT COMPENSATION

      
Numéro d'application EP2021050024
Numéro de publication 2021/144159
Statut Délivré - en vigueur
Date de dépôt 2021-01-04
Date de publication 2021-07-22
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Der Kinderen, Ronny
  • Gang, Tian
  • Downey, Todd R.

Abrégé

Described herein is a system, method, a lithographic apparatus and a software product configured to determine a drift in an attribute of an illumination and corresponding drift corrections. The system includes a lithographic apparatus that includes at least two sensors, each configured to measure a property related to an illumination region provided for imaging a substrate. Furthermore, a processor is configured to: determine, based on a ratio of the measured property, a drift of the illumination region with respect to a reference position; determine, based on the drift of the illumination region, a drift in an attribute related to the illumination upstream of the illumination region measured by the at least two sensors, and determine, based the drift in the attribute, the drift correction to be applied to the attribute to compensate for the drift in the attribute.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

57.

CONTAMINANT DETECTION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF

      
Numéro d'application EP2020085105
Numéro de publication 2021/136631
Statut Délivré - en vigueur
Date de dépôt 2020-12-08
Date de publication 2021-07-08
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Pawlowski, Michal, Emanuel
  • Bendiksen, Aage
  • Munden, Ryan, Alan
  • Nienhuys, Han-Kwang

Abrégé

A system (400) includes an illumination system (402), a detector (404), and a comparator (406). The illumination system includes a radiation source (408) and a spatial light modulator (410). The radiation source generates a beam of radiation (442). The spatial light modulator directs the beam toward a surface (436) of an object (428) and adjusts a spatial intensity distribution of the beam at the surface. The detector receives radiation (444) scattered at the surface and by a structure (434) near the surface. The detector generates a detection signal based on the received radiation. The comparator receives the detection signal, generates a first image based on the detection signal, and distinguishes between a spurious signal and a signal corresponding to a presence of a foreign particle on the surface based on the first image and the adjusted spatial intensity distribution.

Classes IPC  ?

58.

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, ILLUMINATION SOURCES AND METHODS THEREOF

      
Numéro d'application EP2020085111
Numéro de publication 2021/136632
Statut Délivré - en vigueur
Date de dépôt 2020-12-08
Date de publication 2021-07-08
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Reijnders, Marinus, Petrus
  • Swillam, Mohamed

Abrégé

A system includes an illumination system, an optical element, and a detector. The optical system is implemented on a substrate. The illumination system includes first and second sources and first and second generators. The illumination system generates a beam of radiation. The first and second sources generate respective first and second different wavelength bands. The first and second resonators are optically coupled to respective ones of the first and second sources and narrow respective ones of the first and second wavelength bands. The optical element directs the beam toward a target structure. The detector receives radiation from the target structure and to generate a measurement signal based on the received radiation.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G01B 11/02 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur

59.

SYSTEMS AND METHODS FOR MANUFACTURING A DOUBLE-SIDED ELECTROSTATIC CLAMP

      
Numéro d'application EP2020084727
Numéro de publication 2021/136628
Statut Délivré - en vigueur
Date de dépôt 2020-12-04
Date de publication 2021-07-08
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Lipson, Matthew
  • Akbas, Mehmet, Ali

Abrégé

Systems, apparatuses, and methods are provided for manufacturing an electrostatic clamp. An example method can include forming, during a first duration of time comprising a first time, a top clamp comprising a first set of electrodes and a plurality of burls. The method can further include forming, during a second duration of time comprising a second time that overlaps the first time, a core comprising a plurality of fluid channels configured to carry a thermally conditioned fluid. The method can further include forming, during a third duration of time comprising a third time that overlaps the first time and the second time, a bottom clamp comprising a second set of electrodes. In some aspects, the example method can include manufacturing the electrostatic clamp without an anodic bond.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension

60.

WAFER CLAMP HARD BURL PRODUCTION AND REFURBISHMENT

      
Numéro d'application EP2020085107
Numéro de publication 2021/130015
Statut Délivré - en vigueur
Date de dépôt 2020-12-08
Date de publication 2021-07-01
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Lipson, Matthew
  • Akbas, Mehmet, Ali
  • Uitterdijk, Tammo
  • Zhao, Fei

Abrégé

Systems, apparatuses, and methods are provided for manufacturing a wafer clamp having hard burls. The method can include providing a first layer that includes a first surface. The method can further include forming a plurality of burls over the first surface of the first layer. The forming of the plurality of burls can include forming a subset of the plurality of burls to a hardness of greater than about 6.0 gigapascals (GPa).

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces

61.

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

      
Numéro d'application EP2020084387
Numéro de publication 2021/122016
Statut Délivré - en vigueur
Date de dépôt 2020-12-03
Date de publication 2021-06-24
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Tinnemans, Patricius, Aloysius, Jacobus
  • Aarts, Igor, Matheus, Petronella
  • Bhattacharyya, Kaustuve
  • Brinkhof, Ralph
  • Karssemeijer, Leendert, Jan
  • Keij, Stefan, Carolus, Jacobus, Antonius
  • Kok, Haico, Victor
  • Mathijssen, Simon, Gijsbert, Josephus
  • Megens, Henricus, Johannes, Lambertus
  • Rehman, Samee, Ur

Abrégé

Disclosed is a metrology method relating to measurement of a structure on a substrate, said structure being subject to one or more asymmetric deviation. The method comprises obtaining at least one intensity asymmetry value relating to the asymmetric deviation, wherein the at least one intensity asymmetry value comprises a metric related to a difference or imbalance between the respective intensities or amplitudes of at least two diffraction orders of radiation diffracted by said structure; determining at least one phase offset value corresponding to the one or more asymmetric deviation based on said at least one intensity asymmetry value; and determining one or more measurement correction for said one or more asymmetric deviation from the one or more phase offset.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

62.

OVERLAY MEASUREMENT SYSTEM USING LOCK-IN AMPLIFIER TECHNIQUE

      
Numéro d'application EP2020082575
Numéro de publication 2021/110416
Statut Délivré - en vigueur
Date de dépôt 2020-11-18
Date de publication 2021-06-10
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Swillam, Mohamed
  • Huisman, Simon, Reinald
  • Kreuzer, Justin, Lloyd

Abrégé

A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumination beam (218) along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target (204) on a substrate (202). The first optical system is further configured to transmit a signal beam including diffraction order sub-beams (222, 224, 226) that are diffracted by the diffraction target. The phase modulator is configured to modulate the illumination beam or the signal beam based on a reference signal. The lock-in detector is configured to collect the signal beam and to measure a characteristic of the diffraction target based on the signal beam and the reference signal. The function generator is configured to generate the reference signal for the phase modulator and the lock-in detector.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

63.

OPTIMIZATION USING A NON-UNIFORM ILLUMINATION INTENSITY PROFILE

      
Numéro d'application EP2020082570
Numéro de publication 2021/099408
Statut Délivré - en vigueur
Date de dépôt 2020-11-18
Date de publication 2021-05-27
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Nath, Janardan
  • Mason, Christopher, John
  • Hsu, Duan-Fu, Stephen
  • Downey, Todd R.
  • Gang, Tian

Abrégé

A method for source mask optimization or mask only optimization used to image a pattern onto a substrate is described. The method comprises determining a non-uniform illumination intensity profile for illumination from an illumination source; and determining one or more adjustments for the pattern based on the non-uniform illumination intensity profile until a determination that features patterned onto the substrate substantially match a target design. The non- uniform illumination intensity profile may be determined based on an illumination source and the projection optics of a lithographic apparatus. In some embodiments, the projection optics comprise a slit, and the non-uniform illumination profile is a through slit non-uniform illumination intensity profile. Determining the one or more adjustments for the pattern may comprise performing optical proximity correction, for example.

Classes IPC  ?

  • G03F 1/36 - Masques à correction d'effets de proximité; Leur préparation, p.ex. procédés de conception à correction d'effets de proximité [OPC optical proximity correction]
  • G03F 1/70 - Adaptation du tracé ou de la conception de base du masque aux exigences du procédé lithographique, p.ex. correction par deuxième itération d'un motif de masque pour l'imagerie
  • G03F 7/20 - Exposition; Appareillages à cet effet

64.

SYSTEMS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS

      
Numéro d'application EP2020079526
Numéro de publication 2021/089320
Statut Délivré - en vigueur
Date de dépôt 2020-10-20
Date de publication 2021-05-14
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Rodak, Daniel, Paul

Abrégé

The described system comprises a cleaning tool. The cleaning tool is configured to be inserted into a lithography apparatus in a first configuration, engaged by a tool handler of the lithography apparatus, and used for cleaning a portion of the lithography apparatus. The cleaning tool is configured to move from the first configuration to a second, expanded configuration, after engagement by the tool handler such that the cleaning tool is in the second configuration when used for cleaning the portion of the lithography apparatus. The system comprises a container configured to hold the cleaning tool in the first configuration and fit into the lithography apparatus. The cleaning tool is configured to be inserted into the lithography apparatus in the container, moved from the container by the tool handler for the cleaning, and returned to the container by the tool handler after the cleaning.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

65.

OPTICAL COMPONENT AND CLAMP USED IN LITHOGRAPHIC APPARATUS

      
Numéro d'application EP2020079650
Numéro de publication 2021/089329
Statut Délivré - en vigueur
Date de dépôt 2020-10-21
Date de publication 2021-05-14
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Perez-Falcon, Victor, Antonio

Abrégé

Described herein is an optical element and a lithographic apparatus including the optical element. The optical element includes a first member having a curved optical surface and a heat transfer surface; and a second member comprises at least one recess, the at least one recess sealed against the heat transfer surface to form at least one closed channel between the first member and the second member to allow fluid to flow therethrough for thermal conditioning of the curved optical surface. In an embodiment, regions of the heat transfer surface exposed to the at least one closed channel are positioned along a curved profile similar to that of the curved optical surface.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G02B 7/18 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour miroirs

66.

LITHOGRAPHIC APPARATUS AND ELECTROSTATIC CLAMP DESIGNS

      
Numéro d'application EP2020077877
Numéro de publication 2021/083617
Statut Délivré - en vigueur
Date de dépôt 2020-10-05
Date de publication 2021-05-06
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Perez-Falcon, Victor, Antonio
  • Van De Kerkhof, Marcus, Adrianus
  • Hall, Daniel, Leslie
  • Mason, Christopher, John
  • Minnaert, Arthur, Winfried, Eduardus
  • Moors, Johannes, Hubertus, Josephina
  • Nayfeh, Samir A.

Abrégé

Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension
  • H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces

67.

VARIABLE DIFFRACTION GRATING

      
Numéro d'application EP2020078615
Numéro de publication 2021/083649
Statut Délivré - en vigueur
Date de dépôt 2020-10-12
Date de publication 2021-05-06
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Alsaqqa, Ali
  • El-Ghussein, Fadi
  • Kessels, Lambertus, Gerardus, Maria
  • Rezvani Naraghi, Roxana
  • Shome, Krishanu
  • Brunner, Timothy, Allan
  • Sokolov, Sergei

Abrégé

A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

68.

APPARATUS FOR AND METHOD OF SENSING ALIGNMENT MARKS

      
Numéro d'application EP2020077141
Numéro de publication 2021/078474
Statut Délivré - en vigueur
Date de dépôt 2020-09-28
Date de publication 2021-04-29
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Shome, Krishanu
  • Aarts, Igor, Matheus, Petronella
  • Lee, Junwon

Abrégé

An apparatus for and method of sensing alignment marks in which a self-referencing interferometer based sensor outputs standing images of the alignment marks and camera device is used to capture the images as output by the sensor and a detector is used to obtain phase information about the alignment marks from the images as output by the sensor.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique
  • G01B 9/02 - Interféromètres
  • G01J 9/02 - Mesure du déphasage des rayons lumineux; Recherche du degré de cohérence; Mesure de la longueur d'onde des rayons lumineux par des méthodes interférométriques

69.

METROLOGY MARK STRUCTURE AND METHOD OF DETERMINING METROLOGY MARK STRUCTURE

      
Numéro d'application EP2020076986
Numéro de publication 2021/073854
Statut Délivré - en vigueur
Date de dépôt 2020-09-25
Date de publication 2021-04-22
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Elazhary, Tamer, Mohamed, Tawfik, Ahmed, Mohamed
  • Socha, Robert, John
  • Roux, Stephen
  • Huisman, Simon, Reinald

Abrégé

Described herein is a structure of the semiconductor device with a sub-segmented grating structure as a metrology mark and a method for configuring the metrology mark. A method for configuring a metrology mark may be used in a lithography process. The method includes determining an initial characteristic function of an initial metrology mark disposed within a layer stack. The method also includes perturbing one or more variables of the plurality of subsegments of the metrology mark (e.g., pitch, duty cycle, and/or line width of the plurality of subsegments) and further perturbing a thickness of one or more layers within the layer stack. The method further includes iteratively performing the perturbations until a minimized characteristic function of an initial metrology mark is determined to set a configuration for the plurality of subsegments.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

70.

ALIGNMENT SENSOR WITH MODULATED LIGHT SOURCE

      
Numéro d'application EP2020075658
Numéro de publication 2021/063663
Statut Délivré - en vigueur
Date de dépôt 2020-09-14
Date de publication 2021-04-08
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Alsaqqa, Ali
  • Adams, Joshua
  • Li, Bin

Abrégé

An apparatus for and a method of determining alignment of a substrate in which the intensity of a radiation source illuminating an alignment mark is varied in accordance with whether an element in the system for converting an analog signal into a digital signal is in a mode in which it is sampling the signal or in a mode in which it is converting the signal and so not sensitive changes in the signal, thus to reduce the amount of exposure of the substrate or system optical components to the illuminating radiation.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

71.

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEM, AND ILLUMINATION SYSTEMS WITH STRUCTURED ILLUMINATION

      
Numéro d'application EP2020075668
Numéro de publication 2021/058313
Statut Délivré - en vigueur
Date de dépôt 2020-09-14
Date de publication 2021-04-01
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Lin, Yuxiang
  • Adams, Joshua
  • Elazhary, Tamer, Mohamed, Tawfik, Ahmed, Mohamed
  • Shome, Krishanu

Abrégé

A system (500) includes an illumination system (502), a lens element (506), and a detector (504). The illumination system generates a beam of radiation (510) having a first spatial intensity distribution (800) at a pupil plane (528) and a second spatial intensity distribution (900) at a plane of a target (514). The first spatial intensity distribution comprises an annular intensity profile (802) or an intensity profile corresponding to three or more beams. The lens element focuses the beam onto the target. The second spatial intensity distribution is a conjugate of the first intensity distribution and has an intensity profile corresponding to a central beam (902) and one or more side lobes (904) that are substantially isolated from the central beam. The central beam has a beam diameter of approximately 20 microns or less at the target. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation..

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G01N 21/956 - Inspection de motifs sur la surface d'objets
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

72.

METROLOGY SYSTEMS, COHERENCE SCRAMBLER ILLUMINATION SOURCES AND METHODS THEREOF

      
Numéro d'application EP2020075785
Numéro de publication 2021/058338
Statut Délivré - en vigueur
Date de dépôt 2020-09-15
Date de publication 2021-04-01
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Setija, Irwan, Dani
  • Den Boef, Arie, Jeffrey
  • Swillam, Mohamed
  • Beukman, Arjan, Johannes, Anton

Abrégé

A system includes a radiation source and a phased array. The phased array includes optical elements, waveguides and phase modulators. The phased array generates a beam of radiation. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves accumulate to form the beam. An amount of incoherence of the beam is based on randomization of the phases.

Classes IPC  ?

  • G02F 1/295 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p.ex. commutation, ouverture de porte ou modulation; Optique non linéaire pour la commande de la position ou de la direction des rayons lumineux, c. à d. déflexion dans une structure de guide d'ondes optique
  • G02B 27/48 - Systèmes optiques utilisant la granulation produite par laser
  • G03F 7/20 - Exposition; Appareillages à cet effet

73.

METROLOGY SYSTEMS AND PHASED ARRAY ILLUMINATION SOURCES

      
Numéro d'application EP2020076578
Numéro de publication 2021/058571
Statut Délivré - en vigueur
Date de dépôt 2020-09-23
Date de publication 2021-04-01
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Swillam, Mohamed
  • Elazhary, Tamer, Mohamed, Tawfik, Ahmed, Mohamed
  • Roux, Stephen
  • Lin, Yuxiang
  • Kreuzer, Justin, Lloyd

Abrégé

A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

74.

A METHOD FOR FILTERING AN IMAGE AND ASSOCIATED METROLOGY APPARATUS

      
Numéro d'application EP2020074621
Numéro de publication 2021/052772
Statut Délivré - en vigueur
Date de dépôt 2020-09-03
Date de publication 2021-03-25
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN (Pays‑Bas)
  • STICHTING VU (Pays‑Bas)
  • UNIVERSITEIT VAN AMSTERDAM (Pays‑Bas)
Inventeur(s)
  • Koolen, Armand, Eugene, Albert
  • Kreuzer, Justin
  • Mehta, Nikhil
  • Warnaar, Patrick
  • Tenner, Vasco, Tomas
  • Tinnemans, Patricius, Aloysius Jacobus
  • Cramer, Hugo

Abrégé

Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure. The method comprises receiving a radiation information representing a portion of radiation scattered by the are, and using a filter in a Fourier domain for removing or suppressing at least a portion of the received radiation information that does not relate to radiation that has been scattered by the target structure for obtaining a filtered radiation information for the metrology measurement, wherein characteristics of the filter are based on target information about the target structure.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G01N 21/956 - Inspection de motifs sur la surface d'objets

75.

LASER MODULE AS ALIGNMENT SOURCE, METROLOGY SYSTEM, AND LITHOGRAPHIC APPARATUS

      
Numéro d'application EP2020074863
Numéro de publication 2021/052790
Statut Délivré - en vigueur
Date de dépôt 2020-09-04
Date de publication 2021-03-25
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Ajgaonkar, Mahesh, Upendra

Abrégé

An improved light laser module is disclosed. The laser module can include a laser source (310) configured to generate laser light, and an infinite impulse response filter configured to reduce coherence effect of the laser light by decorrelating phase of components of the laser light. The infinite impulse response filter can include a plurality of optic couplers (410,420,430,440,450) to form a plurality of optical propagation loops with different optical path lengths (L1,L2,L3), respectively. The laser module can further include an acoustic-optic modulator arranged in an optical propagation loop, and configured to shift optical carrier frequency, such that an output of the laser module has a widen spectral to further reduce coherence effect.

Classes IPC  ?

  • G02B 6/24 - Couplage de guides de lumière
  • G02B 27/48 - Systèmes optiques utilisant la granulation produite par laser
  • H04B 10/25 - Dispositions spécifiques à la transmission par fibres
  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

76.

INVARIABLE MAGNIFICATION MULTILEVEL OPTICAL DEVICE WITH TELECENTRIC CONVERTER

      
Numéro d'application EP2020073778
Numéro de publication 2021/047903
Statut Délivré - en vigueur
Date de dépôt 2020-08-25
Date de publication 2021-03-18
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Ryzhikov, Lev
  • Vladimirsky, Yuli

Abrégé

A pre-alignment system includes a common object lens group configured to collect diffracted beams from a patterning device, wherein the common object lens group is further configured to produce telecentricity in an object space of the pre-alignment system. The pre- alignment system also includes a multipath sensory array having at least one image lens system, wherein the at least one image lens system includes a telecentric converter lens configured to produce telecentricity in an image space of the pre-alignment system.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

77.

ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT

      
Numéro d'application EP2020072063
Numéro de publication 2021/037509
Statut Délivré - en vigueur
Date de dépôt 2020-08-05
Date de publication 2021-03-04
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Swillam, Mohamed
  • Roux, Stephen
  • Elazhary, Tamer, Mohamed, Tawfik, Ahmed, Mohamed
  • Den Boef, Arie, Jeffrey

Abrégé

A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 31/0232 - Dispositifs à semi-conducteurs sensibles aux rayons infrarouges, à la lumière, au rayonnement électromagnétique d'ondes plus courtes, ou au rayonnement corpusculaire, et spécialement adaptés, soit comme convertisseurs de l'énergie dudit rayonnement e; Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de ces dispositifs ou de leurs parties constitutives; Leurs détails - Détails Éléments ou dispositions optiques associés au dispositif
  • G02B 6/42 - Couplage de guides de lumière avec des éléments opto-électroniques

78.

METROLOGY SYSTEM AND METHOD

      
Numéro d'application EP2020073777
Numéro de publication 2021/037867
Statut Délivré - en vigueur
Date de dépôt 2020-08-25
Date de publication 2021-03-04
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Elazhary, Tamer, Mohamed, Tawfik, Ahmed, Mohamed
  • Huisman, Simon, Reinald
  • Kreuzer, Justin, Lloyd
  • Goorden, Sebastianus, Adrianus

Abrégé

Described herein is a method of determining an overlay measurement associated with a substrate and a system to obtain an overlay measurement associated with a patterning process. A method for determining an overlay measurement may be used in a lithography patterning process. The method includes generating a diffraction signal by illuminating a first overlay pattern and a second overlay pattern using a coherent beam. The method also includes obtaining an interference pattern based on the diffraction signal. The method further includes determining an overlay measurement between the first overlay pattern and the second overlay pattern based on the interference pattern.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

79.

LITHOGRAPHIC APPARATUS AND ULTRAVIOLET RADIATION CONTROL SYSTEM

      
Numéro d'application EP2020072062
Numéro de publication 2021/028295
Statut Délivré - en vigueur
Date de dépôt 2020-08-05
Date de publication 2021-02-18
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Kremer, Alexander

Abrégé

The present disclosure provides an ultraviolet radiation control system and a related method for control an ultraviolet radiation in a lithographic apparatus. The ultraviolet radiation control system comprises a housing; a conversion crystal (540), disposed on or in the housing, configured to convert an ultraviolet radiation to a fluorescent radiation; a plurality of photodetectors (550) configured to detect an intensity of a scattered portion of the fluorescent radiation; and at least one diffusive surface (545), disposed on or in the conversion crystal, configured to increase the intensity of the scattered portion of the fluorescent radiation.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G01J 1/42 - Photométrie, p.ex. posemètres photographiques en utilisant des détecteurs électriques de radiations

80.

PHASE MODULATORS IN ALIGNMENT TO DECREASE MARK SIZE

      
Numéro d'application EP2020072054
Numéro de publication 2021/028292
Statut Délivré - en vigueur
Date de dépôt 2020-08-05
Date de publication 2021-02-18
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Bijnen, Franciscus, Godefridus, Casper
  • Eralp, Muhsin
  • Huisman, Simon, Reinald
  • Den Boef, Arie, Jeffrey

Abrégé

An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a self-referencing interferometer configured to generate two diffraction sub-beams, wherein the two diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment apparatus further includes a beam analyzer configured to generate interference between the overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches, and a detection system configured to determine a position of the alignment target based on light intensity measurement of the optical branches, wherein the measured light intensity is temporally modulated by a phase modulator.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique
  • G01B 9/02 - Interféromètres

81.

APPARATUS FOR AND METHOD OF IDENTIFYING RETICLE IN A LITHOGRAPHY APPARATUS

      
Numéro d'application EP2020072064
Numéro de publication 2021/028296
Statut Délivré - en vigueur
Date de dépôt 2020-08-05
Date de publication 2021-02-18
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Vladimirsky, Yuli
  • Arif, Muhammad
  • Walsh, James, Hamilton

Abrégé

A code mark for a reticle such as a reticle in which the individual elements of the mark comprise diffraction gratings so that the apparent brightness of the elements depends on whether light from the element is diffracted into or outside of the numerical aperture of the lens of a reader.

Classes IPC  ?

  • G03F 1/38 - Masques à caractéristiques supplémentaires, p.ex. marquages pour l'alignement ou les tests, ou couches particulières; Leur préparation
  • G03F 7/20 - Exposition; Appareillages à cet effet

82.

LASER MODULE ASSEMBLY FOR ALIGNMENT SYSTEM, METROLOGY SYSTEM, AND LITHOGRAPHIC APPARATUS

      
Numéro d'application EP2020072050
Numéro de publication 2021/023792
Statut Délivré - en vigueur
Date de dépôt 2020-08-05
Date de publication 2021-02-11
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Ajgaonkar, Mahesh, Upendra

Abrégé

A metrology system includes a radiation source configured to generate a plurality of light beams, each centered at different wavelength, a dynamic polarization controller configured to dynamically alternate polarization orientation of each of the plurality of light beams, a polarization multiplexer configured to combine the plurality of light beams with dynamically alternated polarization orientations into a combined light beam, a reflector configured to direct the combined light beam towards a substrate, an interferometer configured to receive light that has been diffracted from a pattern on the substrate and to produce output light from interference between the diffracted light, and a detector configured to detect optical signals based on the output light from the interferometer and output a time-varying intensity signal.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

83.

ALIGNMENT SENSOR BASED ON WAVELENGTH-SCANNING

      
Numéro d'application EP2020070612
Numéro de publication 2021/018676
Statut Délivré - en vigueur
Date de dépôt 2020-07-22
Date de publication 2021-02-04
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Eralp, Muhsin

Abrégé

An alignment method includes directing an illumination beam with a varying wavelength or frequency towards an alignment target, collecting diffraction beams from the alignment target and directing towards an interferometer. The alignment method also includes producing, by the interferometer, two diffraction sub-beams from the diffraction beams, wherein the diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment method further includes measuring interference intensity of the diffraction beams based on a temporal phase shift, wherein the temporal phase shift is a function of the varying wavelength or frequency of the illumination beam and a fixed optical path difference between the diffraction beams. The alignment method also includes determining a position of the alignment target from the measured interference intensity.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

84.

ON CHIP WAFER ALIGNMENT SENSOR

      
Numéro d'application EP2020068369
Numéro de publication 2021/013483
Statut Délivré - en vigueur
Date de dépôt 2020-06-30
Date de publication 2021-01-28
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Elazhary, Tamer, Mohamed, Tawfik, Ahmed, Mohamed
  • Swillam, Mohamed

Abrégé

A sensor apparatus includes an illumination system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path and includes an adjustable optic. The adjustable optic is configured to transmit the illumination beam toward a diffraction target on a substrate that is disposed adjacent to the illumination system. The transmitting generates a fringe pattern on the diffraction target. A signal beam includes diffraction order sub-beams that are diffracted by the diffraction target. The detector system is configured to collect the signal beam. The processor is configured to measure a characteristic of the diffraction target based on the signal beam. The adjustable optic is configured to adjust an angle of incidence of the illumination beam on the diffraction target to adjust a periodicity of the fringe pattern to match a periodicity of the diffraction target.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

85.

IMPROVEMENTS IN METROLOGY TARGETS

      
Numéro d'application EP2020069001
Numéro de publication 2021/013519
Statut Délivré - en vigueur
Date de dépôt 2020-07-06
Date de publication 2021-01-28
Propriétaire
  • ASML NETHERLANDS B.V. (Pays‑Bas)
  • ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Mehta, Nikhil
  • Cottaar, Jeroen
  • Warnaar, Patrick
  • Van Der Schaar, Maurits
  • Van Kraaij, Markus, Gerardus, Martinus, Maria
  • Cramer, Hugo, Augustinus, Joseph
  • Zwier, Olger, Victor

Abrégé

Disclosed is a patterning device for patterning product structures onto a substrate and an associated substrate patterned using such a patterning device. The patterning device comprises target patterning elements for patterning at least one target from which a parameter of interest can be inferred. The target patterning elements and product patterning elements for patterning the product structures. The target patterning elements and product patterning elements are configured such that said at least one target has at least one boundary which is neither parallel nor perpendicular with respect to said product structures on said substrate.

Classes IPC  ?

  • G03F 7/00 - Production par voie photomécanique, p.ex. photolithographique, de surfaces texturées, p.ex. surfaces imprimées; Matériaux à cet effet, p.ex. comportant des photoréserves; Appareillages spécialement adaptés à cet effet
  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G03F 1/42 - Aspects liés à l'alignement ou au cadrage, p.ex. marquages d'alignement sur le substrat du masque

86.

LITHOGRAPHIC PATTERNING DEVICE MULTICHANNEL POSITION AND LEVEL GAUGE

      
Numéro d'application EP2020064609
Numéro de publication 2020/249394
Statut Délivré - en vigueur
Date de dépôt 2020-05-26
Date de publication 2020-12-17
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Vladimirsky, Yuli
  • Ryzhikov, Lev

Abrégé

A patterning device alignment system including a multipath sensory array including a first collimating light path and one or more other light paths, a first detector positioned at a first end of the first collimating light path, and a second detector positioned at a first end of the one or more other light paths, the first detector receiving a reflected illumination beam from an illuminated patterning device and calculating a tilt parameter of the patterning device, and the second detector receiving a second reflected illumination beam from a beam splitter and calculating an X-Y planar location position and a rotation position of the patterning device.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

87.

SELF-REFERENCING INTERFEROMETER AND DUAL SELF-REFERENCING INTERFEROMETER DEVICES

      
Numéro d'application EP2020063882
Numéro de publication 2020/239516
Statut Délivré - en vigueur
Date de dépôt 2020-05-19
Date de publication 2020-12-03
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Cappelli, Douglas, C.

Abrégé

A self-referencing interferometer (SRI) system for an alignment sensor apparatus includes a first prism and a second prism. The first prism has an input surface for an incident beam. The second prism is coupled to the first prism and has an output surface for a recombined beam. The recombined beam includes a first image and a second image rotated by 180 degrees with respect to the first image. The first and second prisms are identical in shape. A dual self-referencing interferometer (DSRI) system for an alignment sensor apparatus includes a first prism assembly having an input surface for a first incident beam and a second incident beam, and a second prism assembly coupled to the first prism assembly and having an output surface for a first recombined beam and a second recombined beam. The first and second prism assemblies are identical in shape.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

88.

LITHOGRAPHIC APPARATUS, SUBSTRATE TABLE, AND METHOD

      
Numéro d'application EP2020062463
Numéro de publication 2020/239373
Statut Délivré - en vigueur
Date de dépôt 2020-05-05
Date de publication 2020-12-03
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Lipson, Matthew
  • Achanta, Satish
  • Dawson, Benjamin, David
  • Sorna, Matthew, Anthony
  • Sigal, Iliya
  • Uitterdijk, Tammo

Abrégé

A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces

89.

SPLIT DOUBLE SIDED WAFER AND RETICLE CLAMPS

      
Numéro d'application EP2020062964
Numéro de publication 2020/239400
Statut Délivré - en vigueur
Date de dépôt 2020-05-11
Date de publication 2020-12-03
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Lipson, Matthew
  • Monkman, Eric, Justin
  • Perez-Falcon, Victor, Antonio

Abrégé

An electrostatic clamp and a method for fabricating the same is disclosed. The electrostatic clamp includes a first stack and a second stack, wherein the first stack is joined with the second stack. Each of the first and second stacks includes a clamp body, one or more electrodes disposed on the clamp body, a dielectric plate disposed on the electrodes, and a plurality of channels inside the clamp body.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension

90.

RETICLE CAGE ACTUATOR WITH SHAPE MEMORY ALLOY AND MAGNETIC COUPLING MECHANISMS

      
Numéro d'application EP2020061679
Numéro de publication 2020/225017
Statut Délivré - en vigueur
Date de dépôt 2020-04-28
Date de publication 2020-11-12
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Krishnan, Hari
  • Doshi, Kushal, Sandeep

Abrégé

Embodiments herein describe methods and safety devices used to provide support for an object. A safety device includes a driving side comprising a driving motor and a driven side. The driven side of the safety device includes a housing having a rotating shaft extending along a length of the housing and a safety latch. The driven side is coupled to the driving motor via a non-contact, magnetic coupling device at a first end of the rotating shaft, and the safety latch is coupled to a second end of the rotating shaft opposite from the first end of the rotating shaft. The driving motor is configured to cause rotation in a radial direction of the safety latch on the driving side via the non-contact, magnetic coupling device.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

91.

BUMPER APPARATUS

      
Numéro d'application EP2020062200
Numéro de publication 2020/225151
Statut Délivré - en vigueur
Date de dépôt 2020-05-01
Date de publication 2020-11-12
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Doshi, Kushal, Sandeep
  • Krishnan, Hari

Abrégé

A bumper apparatus for protecting a reticle includes a base structure, first and second elongate elements, a contact piece, and a restoring element. The first and second elongate elements each include a distal end and a proximal end. The proximal ends of the first and second elements are attached to the base structure. The contact piece is disposed at the end of the distal ends of the first and second elongate elements. The first and second elongate elements deform in response to a contact force caused by the reticle. The restoring element is attached to the first and second elongate elements. The restoring element generates a restoring force that opposes the deforming of the first and second elongate elements.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

92.

LITHOGRAPHIC APPARATUS, SUBSTRATE TABLE, AND NON-UNIFORM COATING METHOD

      
Numéro d'application EP2020061098
Numéro de publication 2020/224953
Statut Délivré - en vigueur
Date de dépôt 2020-04-21
Date de publication 2020-11-12
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Tirri, Bruce
  • Zhou, Ping
  • Stone, Elizabeth, Mary
  • Peterson, David, Hart
  • Akbas, Mehmet, Ali
  • Mayer, Ryan
  • Lewis, Richard, Bryan

Abrégé

A method of fabricating a substrate table includes supporting a table base to receive a coating and disposing the coating on a surface of the table base. The surface of the table base is substantially flat. The coating has a non-uniform thickness. The coating exerts a stress on the table so as to bend the table base. The non-uniform thickness causes a surface of the coating to become substantially flat after the bending.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension
  • H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces

93.

LITHOGRAPHIC APPARATUS AND ILLUMINATION UNIFORMITY CORRECTION SYSTEM

      
Numéro d'application EP2020060376
Numéro de publication 2020/216643
Statut Délivré - en vigueur
Date de dépôt 2020-04-14
Date de publication 2020-10-29
Propriétaire
  • ASML HOLDING N.V. (Pays‑Bas)
  • ASML NETHERLANDS B.V. (Pays‑Bas)
Inventeur(s)
  • Nath, Janardan
  • Mankala, Kalyan, Kumar
  • Downey, Todd R.
  • Lyons, Joseph, Harry
  • Unluhisarcikli, Ozer
  • Ledbetter, Alexander, Harris
  • Apone, Nicholas, Stephen
  • Gang, Tian

Abrégé

An illumination adjustment apparatus to adjust a cross slot illumination of a beam in a lithographic apparatus includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet

94.

SENSOR APPARATUS AND METHOD FOR LITHOGRAPHIC MEASUREMENTS

      
Numéro d'application EP2020058250
Numéro de publication 2020/207794
Statut Délivré - en vigueur
Date de dépôt 2020-03-25
Date de publication 2020-10-15
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Elazhary, Tamer, Mohamed, Tawfik, Ahmed, Mohamed
  • Kreuzer, Justin, Lloyd
  • Lin, Yuxiang
  • Sobolev, Kirill, Urievich

Abrégé

Apparatus for and method of measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil, wafer conjugate planes of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

95.

LITHOGRAPHIC APPARATUS AND METHOD FOR MOTOR TEMPERATURE CONTROL

      
Numéro d'application EP2020056578
Numéro de publication 2020/187671
Statut Délivré - en vigueur
Date de dépôt 2020-03-12
Date de publication 2020-09-24
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Chavez, Isaac
  • Chieda, Michael, Andrew
  • Mackenzie, Ross, Ian

Abrégé

A lithographic apparatus includes an illumination system, a projection system, a stage, a motor, a thermal control system, and a controller. The illumination system illuminates a pattern of a patterning device. The projection system projects an image of the pattern onto a substrate. The stage supports the patterning device or the substrate. The motor moves the stage. The thermal control system regulates a temperature of the motor. The controller controls the temperature of the motor during idling of the motor such that a difference between a maximum temperature and a minimum temperature of the motor during the idling is reduced.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H02K 9/00 - Dispositions de refroidissement ou de ventilation
  • H02K 41/00 - Systèmes de propulsion dans lesquels un élément rigide se déplace le long d'une piste sous l'effet de l'action dynamo-électrique s'exerçant entre cet élément et un flux magnétique se propageant le long de la piste
  • H02K 15/12 - Imprégnation, chauffage ou séchage des bobinages, des stators, des rotors ou des machines
  • H02K 41/03 - Moteurs synchrones; Moteurs pas à pas; Moteurs à réluctance

96.

MICROMANIPULATOR DEVICES AND METROLOGY SYSTEM

      
Numéro d'application EP2020056745
Numéro de publication 2020/187713
Statut Délivré - en vigueur
Date de dépôt 2020-03-13
Date de publication 2020-09-24
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Sohrabibabaheidary, Damoon
  • Uitterdijk, Tammo
  • Mason, Christopher, John
  • Dawson, Benjamin, David
  • Akbas, Mehmet, Ali
  • Levy, Keane, Michael

Abrégé

A device for removing a portion of an object includes a stage, a metrology apparatus, a material removal device, and an actuator. The metrology apparatus includes a radiation source, an optical system, and a detector. The material removal device includes an elongate element and a sharp element at an end of the elongate element. The stage supports the object. The radiation source generates radiation. The optical system directs the radiation toward the portion of the object. The detector receives radiation scattered by the portion of the object and outputs data based on the received radiation. The data comprises a position of the portion of the object. The actuator moves the material removal device such that the sharp element is disposed on the position of the portion of the object. The device exerts a force on the portion of the object such that the portion of the object can be dislodged.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • B82Y 35/00 - Procédés ou appareils pour la mesure ou l’analyse des nanostructures
  • G01B 7/34 - Dispositions pour la mesure caractérisées par l'utilisation de techniques électriques ou magnétiques pour mesurer la rugosité ou l'irrégularité des surfaces
  • G01Q 20/02 - Contrôle du mouvement ou de la position de la sonde par des moyens optiques
  • G01Q 60/04 - Microscopie à effet tunnel à balayage STM [Scanning Tunnelling Microscopy] combinée avec la microscopie à forces atomiques AFM [Atomic Force Microscopy]
  • B23K 26/04 - Alignement, pointage ou focalisation automatique du faisceau laser, p.ex. en utilisant la lumière rétrodiffusée
  • G01B 9/02 - Interféromètres
  • G01B 11/22 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la profondeur
  • G01Q 60/22 - Sondes, leur fabrication ou leur instrumentation correspondante, p.ex. supports
  • H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces

97.

LITHOGRAPHIC APPARATUS, METROLOGY APPARATUS, OPTICAL SYSTEM AND METHOD

      
Numéro d'application EP2020055227
Numéro de publication 2020/182488
Statut Délivré - en vigueur
Date de dépôt 2020-02-28
Date de publication 2020-09-17
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s) Smirnov, Stanislav

Abrégé

A method to reduce sensitivity of a level sensor, arranged to measure a height of a substrate, to variations of a property of an optical component in the level sensor includes directing a beam of radiation toward a diffractive element and directing the beam, via an optical system, to a first reflective element at a first angle of incidence. The beam has a first polarization and a second polarization that is perpendicular to the first polarization. The first reflective element reflects the beam toward a second reflective element at a second angle of incidence causing the beam to impinge on the substrate. The first and second angles of incidence are selected to reduce variations of a ratio of intensities of the first polarization to the second polarization of the beam imparted by a property of a layer of at least one of the first and second reflective elements.

Classes IPC  ?

  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

98.

ELECTROSTATIC CLAMP FOR A LITHOGRAPHIC APPARATUS

      
Numéro d'application EP2020055957
Numéro de publication 2020/182637
Statut Délivré - en vigueur
Date de dépôt 2020-03-06
Date de publication 2020-09-17
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Krishnan, Hari
  • Lyons, Joseph, Harry
  • Monkman, Eric, Justin
  • Perez-Falcon, Victor, Antonio

Abrégé

An electrostatic clamp for supporting a substrate includes a substrate region, an electrode region at an edge of the substrate region, a support layer, an electrically conductive layer, a contact layer, and an electrode. The support layer has a body having first and second surfaces that are substantially parallel to each other and disposed on opposite sides of the body. A through-hole is disposed in the electrode region and provides access between the first and second surfaces. The electrically conductive layer is disposed on the second surface of the support layer. The contact layer disposed on the electrically conductive layer. The contact layer is uninterrupted in the electrode region and comprises burls in the substrate region. The burls contact the substrate when the electrostatic clamp is supporting the substrate. The electrode is disposed in the through-hole and is electrically coupled to the electrically conductive layer.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension
  • H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p.ex. mandrins, pièces de serrage, pinces
  • H02N 13/00 - Embrayages ou dispositifs de maintien utilisant l'attraction électrostatique, p.ex. utilisant l'effet Johnson-Rahbek

99.

METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD

      
Numéro d'application EP2020053480
Numéro de publication 2020/169419
Statut Délivré - en vigueur
Date de dépôt 2020-02-11
Date de publication 2020-08-27
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Lin, Yuxiang
  • Adams, Joshua

Abrégé

A metrology system (400) includes a radiation source (412) configured to generate radiation (413), an optical element (414) configured to direct the radiation (415) toward a grating structure (418) comprising a non-constant pitch, and a detector (428) configured to receive radiation (429) scattered by the grating structure and generate a measurement based on the received radiation. The metrology system is configured to generate a set of measurements corresponding to a set of locations on the grating structure along a direction of the non-constant pitch and determine a parameter of a lithographic process or a correction for the metrology system based on the set of measurements.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • G01N 21/956 - Inspection de motifs sur la surface d'objets
  • G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique

100.

LASER ROUGHENING: ENGINEERING THE ROUGHNESS OF THE BURL TOP

      
Numéro d'application EP2020052551
Numéro de publication 2020/169326
Statut Délivré - en vigueur
Date de dépôt 2020-02-03
Date de publication 2020-08-27
Propriétaire ASML HOLDING N.V. (Pays‑Bas)
Inventeur(s)
  • Sohrabibabaheidary, Damoon
  • Mason, Christopher, John
  • Helmus, Peter
  • Akbas, Mehmet, Ali
  • Albert, Bensely
  • Dawson, Benjamin, David

Abrégé

Methods, computer program products, and apparatuses for reducing sticking during a lithography process are disclosed. An exemplary method of reducing sticking of an object to a modified surface that is used to support the object in a lithography process can include controlling a light source to deliver light to a native surface thereby causing ablation of at least a portion of the native surface to increase the roughness of the native surface thereby forming the modified surface. The increased roughness reduces the ability of the object to stick to the modified surface.

Classes IPC  ?

  • G03F 7/20 - Exposition; Appareillages à cet effet
  • H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitement; Appareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension
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