Disclosed herein is a manipulator or an array of manipulator. A manipulator manipulates a charged particle beam in a projection system. The manipulator comprising a substrate with major surfaces and a through-passage between associated apertures in the major surfaces. The through passage configured for passage of a path of a charged particle beam. An inner wall of the through- passage between the major surfaces comprises a plurality of electrodes configured to manipulate the charged particle beam. Each electrode comprises doped substrate. The through-passage comprises recesses that extend away from the path of the charged particle beam. Each recess defines a gap between the adjacent electrodes and further comprising an electrically insulating region between the adjacent electrodes. The recesses extend behind at least one of the adjacent electrodes relative to the path of the charged particle beam and comprising at least part of the electrically insulating region.
The present application discloses detector assembly for a charged particle assessment apparatus, the detector assembly comprising a plurality of electrode elements, each electrode element having a major surface configured to be exposed to signal particles emitted from a sample, wherein between adjacent electrode elements is a recess that is recessed relative to the major surfaces of the electrode elements, and wherein at least one of the electrode elements is a detection element configured to detect signal particles and the recess extends laterally behind the detection element. Charged particle assessment devices and apparatus, and corresponding methods are also provided.
There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.
An improved methods and systems for detecting defect(s) on a mask are disclosed. An improved method comprises inspecting an exposed wafer after the wafer was exposed, by a lithography system using a mask, with a selected process condition that is determined based on a mask defect printability under the selected process condition; and identifying, based on the inspection, a wafer defect that is caused by a defect on the mask to enable identification of the defect on the mask.
A detector for use in a charged particle device for an assessment tool to detect signal particles from a sample, the detector comprising a substrate, the substrate comprising: a semiconductor element configured to detect signal particles above a first energy threshold; and a charge based element configured to detect signal particles below a second energy threshold.
6.
PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS AND METHOD
A carbon nanotube membrane comprising carbon nanotubes having a pre-selected bonding configuration or (m, n) chirality, characterised in that the carbon nanotube membrane comprises a substantial amount of carbon nanotubes having zigzag (m, 0) chirality and/or armchair (m, m) chirality. An apparatus for the treatment of a carbon-based membrane, a method for treating carbon based membranes, pellicles comprising carbon based membranes, lithographic apparatuses comprising carbon nanotube membranes, as well as the use of carbon nanotube membranes in lithographic apparatuses and methods are also described.
Disclosed herein is an electron-optical device, a lens assembly and an electron-optical column. The electron-optical device comprises an array substrate and an adjoining substrate and is configured to provide a potential difference between the substrates. An array of apertures is defined in each of the substrates for the path of electron beamlets. The array substrate has a thickness which is stepped so that the array substrate is thinner in the region corresponding to the array of apertures than another region of the array substrate.
A multi-beam electron-optical system for a charged-particle assessment tool, the system comprising: an objective lens array assembly comprising a plurality of objective lenses, each configured to project one of a plurality of charged-particle beams onto a sample; a detector array associated with the objective lens array assembly and configured to detect charged-particles emitted from the sample; and a circuit comprising an amplifier in data communication with the detector array; wherein the amplifier is configured to be tunable in order to tune amplification of signals from the detector array.
Objective lens array assemblies and associated methods are disclosed. In one arrangement, the objective lens array assembly focuses a multi-beam of sub-beams on a sample. Planar elements define a plurality of apertures aligned along sub-beam paths. An objective lens array projects the multi-beam towards a sample. Apertures of one or more of the planar elements compensate for off-axis aberrations in the multi-beam.
Disclosed herein is an aperture array configured to define sub-beams that are scanned in a scanning direction in a charged particle apparatus, the aperture array comprising a plurality of apertures arranged in an aperture pattern that comprises: a plurality of parallel aperture rows, wherein apertures are arranged along the aperture rows and the aperture rows are inclined relative to the scanning direction; an edge aperture row defining an edge of the aperture pattern; and an adjacent aperture row adjacent the edge row; wherein the edge aperture row and the adjacent aperture row each comprise fewer apertures than another aperture row of the aperture pattern.
H01J 37/04 - Dispositions des électrodes et organes associés en vue de produire ou de commander la décharge, p.ex. dispositif électronoptique, dispositif ionoptique
H01J 37/317 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour modifier les propriétés des objets ou pour leur appliquer des revêtements en couche mince, p.ex. implantation d'ions
A pellicle membrane for use in a lithographic apparatus, said pellicle membrane characterised by inplane variation in composition is described. Also described is a method of manufacturing a pellicle membrane, said method including the steps of: a) providing a sacrificial layer on a substrate: b) providing a first material layer on the sacrificial layer; c) providing a photoresist layer on the first material layer; d) patterning the photoresist layer; e) etching the first material layer to form a patterned surface; and f) either i) depositing a layer of a second material on the patterned surface and subsequently lifting off the portion of the second material deposited on the patterned photoresist layer, or ii) removing the remaining photoresist layer, depositing a layer of a second material on the patterned surface, and subsequently planarizing the surface.
There is provided a detector substrate (or detector array) for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for the beam paths of respective charged particle beams of a multi-beam. The detector substrate comprises: a sensor unit array. A sensor unit of the sensor unit array is adjacent a corresponding aperture of the aperture array. The sensor unit is configured to capture charged particles from the sample. The detector array comprises an amplification circuit associated with each sensor unit in the sensor unit array and proximate to the corresponding aperture in the aperture array. The amplification circuit comprising a Trans Impedance Amplifier and/or an analogue to digital converter.
H01J 37/153 - Dispositions électronoptiques ou ionoptiques pour la correction de défauts d'images, p.ex. stigmateurs
H01J 37/244 - Détecteurs; Composants ou circuits associés
H01J 37/28 - Microscopes électroniques ou ioniques; Tubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
H01J 37/317 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour modifier les propriétés des objets ou pour leur appliquer des revêtements en couche mince, p.ex. implantation d'ions
H01L 27/144 - Dispositifs commandés par rayonnement
A manipulator for manipulating a charged particle beam in a projection system, the manipulator comprising a substrate having opposing major surfaces in each of which is defined an aperture and a through-passage having an interconnecting surface extending between the apertures; wherein the interconnecting surface comprises one or more electrodes; the manipulator further comprising a potential divider comprising two or more resistive elements connected in series, the potential divider comprising an intermediate node between each pair of adjacent resistive elements, wherein at least one resistive element is formed within the substrate so as to extend between the opposing major surfaces; wherein the intermediate node is electrically connected to at least one of the one or more electrodes.
There is described an optical element for a lithographic apparatus, said optical element comprising an anchor layer selected to support a top layer having self-terminating growth in an operating lithographic apparatus or plasma containing environment. Also described is a method of manufacturing an optical element, said method comprising the steps of: depositing a top layer on anchor layer via exposure to plasma, preferably electromagnetically induced plasma. Lithographic apparatuses comprising such optical elements are also described.
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs
15.
APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CHARGED PARTICLE BEAMS, AND CHARGED PARTICLE PROJECTION APPARATUS
The disclosure relates to apparatus and methods for manipulating charged particle beams. In one arrangement, an aperture assembly is provided that comprises a first aperture body and a second aperture body. Apertures in the first aperture body are aligned with apertures in the second aperture body. The alignment allows charged particle beams to pass through the aperture assembly. The first aperture body comprises a first electrode system for applying an electrical potential to an aperture perimeter surface of each aperture in the first aperture body. The first electrode system comprises a plurality of electrodes. Each electrode is electrically isolated from each other electrode and electrically connected simultaneously to the aperture perimeter surfaces of a different one of a plurality of groups of the apertures in the first aperture body.
H01J 37/04 - Dispositions des électrodes et organes associés en vue de produire ou de commander la décharge, p.ex. dispositif électronoptique, dispositif ionoptique
H01J 37/09 - Diaphragmes; Ecrans associés aux dispositifs électronoptiques ou ionoptiques; Compensation des champs perturbateurs
Disclosed herein is a substrate stack comprising a plurality of substrates, wherein: each substrate in the substrate stack comprises at least one alignment opening set; the at least one alignment opening set in each substrate is aligned for a light beam to pass through corresponding alignment openings in each substrate; and each substrate comprises at least one alignment opening that has a smaller diameter than the corresponding alignment openings in the other substrates.
H01J 37/09 - Diaphragmes; Ecrans associés aux dispositifs électronoptiques ou ionoptiques; Compensation des champs perturbateurs
G01N 23/2251 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p.ex. la microscopie électronique à balayage [SEM]
H01J 9/02 - Fabrication des électrodes ou des systèmes d'électrodes
H01J 29/80 - Dispositifs de commande du rayon ou du faisceau après son passage par le système de déviation principal, p.ex. aux fins de post-accélération ou de post-concentration, applicables à la commutation de la couleur
H01J 37/317 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour modifier les propriétés des objets ou pour leur appliquer des revêtements en couche mince, p.ex. implantation d'ions
Disclosed herein is a manipulator lensing device for focusing a beam of charged particles, wherein the manipulator lensing device comprises a first structure (401) through which is formed an opening, wherein the path of the beam is substantially along a longitudinal axis of the opening, a second structure (402) with a surface (406) surrounding the opening, a support (403) that connects the second structure to the first structure and surrounds the second structure, and an electrode arrangement (407) provided on the surface (406) of the second structure, wherein a first surface (404) of the first structure (401) surrounds the opening, a second surface (405) of the first structure (401) surrounds the opening, the surface (406) of the second structure (402) being arranged along the longitudinal axis between the first and second surfaces of the first structure, the electrode arrangement (407) and each of the first (404) and second (405) surfaces of the first structure (401) are separated from each other by a respective gap in a direction parallel to the longitudinal axis, wherein, along the longitudinal axis, the extent of the support (403) is less than the extent of the surface (406) of the second structure and/or electrode arrangement (407). Further disclosed is a multi-array lens configured focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises said manipulator lensing device.
Disclosed herein is an electron-optical assembly testing system for testing an electron-optical assembly, the system comprising: a source of charged particles (601) configured to emit a beam of charged particles; an electron-optical assembly holder (604) configured to hold an electron-optical assembly (401) to be tested such that, when the system is in use with an electron-optical assembly held by the electron-optical assembly holder, the electron-optical assembly is illuminated by the beam; and a sub-beam detector (607) for detecting sub-beams of charged particles that have been transmitted through the electron-optical assembly.
A multi-beam manipulator device operates on sub-beams of a multi-beam to deflect the subbeam paths. The device comprises: an electrode as pairs of parallel surfaces. Each pair of parallel surfaces comprises a first surface that is arranged along a side of a corresponding line of sub-beams and a second surface that is arranged parallel to the first surface and along an opposite side of the corresponding line of sub-beam paths. A first pair of parallel surfaces is configured to electrostatically interact with an entire line of sub-beams in the multi-beam so that it is capable of applying a deflection amount to the paths of sub-beams in a first direction. A second pair of parallel surfaces is configured to electro-statically interact with an entire line of sub-beams in the multi-beam so that it is capable of applying another deflection amount to the paths of sub-beams in a second direction.
A pellicle membrane for a lithographic apparatus, said membrane comprising a matrix including a plurality of inclusions distributed therein is provided. Also provided is a method of manufacturing said pellicle membrane, a lithographic apparatus comprising said pellicle membrane, a pellicle assembly for use in a lithographic apparatus comprising said membrane, as well as the use of the pellicle membrane in a lithographic apparatus or method.
A charged particle assessment tool comprising: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having an sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes adjacent respective ones of the beam apertures and configured to capture charged particles emitted from the sample.
H01J 37/04 - Dispositions des électrodes et organes associés en vue de produire ou de commander la décharge, p.ex. dispositif électronoptique, dispositif ionoptique
H01J 37/09 - Diaphragmes; Ecrans associés aux dispositifs électronoptiques ou ionoptiques; Compensation des champs perturbateurs
H01J 37/153 - Dispositions électronoptiques ou ionoptiques pour la correction de défauts d'images, p.ex. stigmateurs
H01J 37/244 - Détecteurs; Composants ou circuits associés
H01J 37/28 - Microscopes électroniques ou ioniques; Tubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
H01J 37/317 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour modifier les propriétés des objets ou pour leur appliquer des revêtements en couche mince, p.ex. implantation d'ions
A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.
D01F 9/12 - Filaments de carbone; Appareils spécialement adaptés à leur fabrication
D01F 11/12 - Post-traitement chimique de filaments, ou similaires, faits par l’homme, pendant leur fabrication de carbone avec des substances inorganiques
A method of manufacturing a pellicle membrane, the method comprising: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly comprising a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus comprising such pellicles.
There is provided a method of manufacturing a membrane assembly for EUV lithography, wherein a layer which forms at least part of a pellicle membrane is provided after one or more etching steps which define a pellicle border holding the pellicle membrane. Also provided is a pellicle substrate, the substrate comprising: a stack having a front face and back face, wherein one or more layers on the back face of the stack have been selectively removed to define a pellicle border region for holding the pellicle membrane before the layer which forms at least part of a pellicle membrane has been provided.
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G03F 1/24 - Masques en réflexion; Leur préparation
G03F 1/64 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation caractérisés par les cadres, p.ex. du point de vue de leur structure ou de leur matériau
Inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus comprising: - a vacuum chamber; - a load lock forming an interface between the vacuum chamber and an ambient environment; - a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber; wherein the vacuum chamber comprises a first parking position and a second parking position for temporarily storing the object.
Van Den Einden, Wilhelmus Theodorus Anthonius Johannes
Van Der Woord, Ties Wouter
Wondergem, Hendrikus Jan
Zdravkov, Aleksandar Nikolov
Abrégé
A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G03F 1/64 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation caractérisés par les cadres, p.ex. du point de vue de leur structure ou de leur matériau
A combined enrichment and radioisotope production apparatus comprising an electron source arranged to provide an electron beam, the electron source comprising an electron injector and an accelerator, an undulator configured to generate a radiation beam using the electron beam, a molecular stream generator configured to provide a stream of molecules which is intersected by the radiation beam, a receptacle configured to receive molecules or ions selectively received from the stream of molecules, and a target support structure configured to hold a target upon which the electron beam is incident in use.
G21G 1/12 - Dispositions pour la conversion des éléments chimiques par rayonnement électromagnétique, radiations corpusculaires ou bombardement par des particules, p.ex. production d'isotopes radioactifs à l'extérieur des réacteurs nucléaires ou des accélérateurs de particules par irradiation électromagnétique, p.ex. de rayons gamma ou de rayons X
B01D 59/48 - Séparation par spectrographie de masse utilisant des champs électrostatiques et des champs magnétiques
An apparatus (200) comprising: a first gripping member (202) comprising a first magnetic element (204) and moveable between a first position and a second position; a first biasing member (210) configured to bias the first gripping member toward the first position; and a second magnetic element (214) selectively operable in a first mode, in which the second magnetic element interacts with the first magnetic element to overcome the first biasing member and move the first gripping member to the second position, and a second mode, in which the second magnetic element does not overcome the first biasing member, such that the first gripping member rests in the first position.
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G03F 1/64 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation caractérisés par les cadres, p.ex. du point de vue de leur structure ou de leur matériau
G03F 1/68 - Procédés de préparation non couverts par les groupes
B65G 47/86 - Roues en forme d'étoiles ou dispositifs à courroies ou chaînes sans fin, les roues ou dispositifs étant dotés d'éléments venant en prise avec les objets les éléments venant en prise avec les objets étant des pinces
A pellicle comprising a core comprising a material other than silicon carbide, a silicon carbide adhesion layer, and a ruthenium capping layer, the ruthenium capping layer being in contact with the silicon carbide adhesion layer. Also described is a method of preparing a pellicle comprising the steps of: (i) providing a pellicle core; (ii) providing a silicon carbide adhesion layer on the pellicle core; and (iii) providing a ruthenium capping layer in contact with the silicon carbide adhesion layer. Also provided is the use of silicon carbide as an adhesion layer in an EUV pellicle as well as an assembly.
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G03F 1/22 - Masques ou masques vierges d'imagerie par rayonnement d'une longueur d'onde de 100 nm ou moins, p.ex. masques pour rayons X, masques en extrême ultra violet [EUV]; Leur préparation
A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle comprising the steps of: providing a wafer comprising a mask on one face and at least one layer on the opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle comprising the steps of: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may comprise a metal nitride layer.
A pellicle comprising a metal oxysilicide layer. Also disclosed in a pellicle comprising a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. Also disclosed is a method of manufacturing a pellicle for a lithographic apparatus, said method comprising: providing a metal oxysilicide layer, a lithographic assembly (LA) comprising a pellicle (15) comprising a metal oxysilicide layer, and the use of a pellicle comprising a metal oxysilicide layer in a lithographic apparatus.
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G03F 1/64 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation caractérisés par les cadres, p.ex. du point de vue de leur structure ou de leur matériau
A pellicle for a lithographic apparatus, wherein the pellicle comprises nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus comprising at least one compensating layer selected and configured to counteract changes in the transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.
Van Den Einden, Wilhelmus Theodorus Anthonius Johannes
Van Der Zande, Willem Joan
Van Zwol, Pieter-Jan
Vermeulen, Johannes Petrus Martinus Bernardus
Voorthuijzen, Willem-Pieter
Wondergem, Hendrikus Jan
Zdravkov, Alexandar Nikolov
Abrégé
The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G03F 1/64 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation caractérisés par les cadres, p.ex. du point de vue de leur structure ou de leur matériau
Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patterning device (MA) for EUV lithography; wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
G03F 1/64 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation caractérisés par les cadres, p.ex. du point de vue de leur structure ou de leur matériau
G03F 1/66 - Réceptacles spécialement adaptés aux masques, aux masques vierges ou aux pellicules; Leur préparation
A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine
A membrane assembly for EUV lithography comprises: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to releasably attach to a patterning device for EUV lithography. The frame assembly comprises a resilient member and is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G03F 1/22 - Masques ou masques vierges d'imagerie par rayonnement d'une longueur d'onde de 100 nm ou moins, p.ex. masques pour rayons X, masques en extrême ultra violet [EUV]; Leur préparation
Van Den Einden, Wilhelmus Theodorus Anthonius Johannes
Zdravkov, Aleksandar Nikolov
Abrégé
Methods of manufacturing a membrane assembly are disclosed. In one arrangement, a stack comprises a planar substrate and at least one membrane layer. The planar substrate comprises an inner region, a border region around the inner region, a bridge region around the border region and an edge region around the bridge region. The inner region and a first portion of the bridge region are selectively removed. The membrane assembly after removal comprises: a membrane formed from the at least one membrane layer, a border holding the membrane, the border formed from the border region of the planar substrate, an edge section around the border, the edge section formed from the edge region of the planar substrate, a bridge between the border and the edge section, the bridge formed from the at least one membrane layer and a second portion of the bridge region of the planar substrate. The method further comprises separating the edge section from the border by cutting or breaking the bridge.
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G03F 1/64 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation caractérisés par les cadres, p.ex. du point de vue de leur structure ou de leur matériau
40.
RADIOISOTOPE PRODUCTION SYSTEM USING AN ELECTRON BEAM SPLITTER
A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).
G21G 1/12 - Dispositions pour la conversion des éléments chimiques par rayonnement électromagnétique, radiations corpusculaires ou bombardement par des particules, p.ex. production d'isotopes radioactifs à l'extérieur des réacteurs nucléaires ou des accélérateurs de particules par irradiation électromagnétique, p.ex. de rayons gamma ou de rayons X
G21K 5/04 - Dispositifs d'irradiation avec des moyens de formation du faisceau
G21K 5/08 - Supports pour cibles ou pour objets à irradier
G21K 5/10 - Dispositifs d'irradiation pourvus de dispositions permettant un mouvement relatif entre la source du rayonnement et l'objet à irradier
A method for manufacturing a membrane assembly (80) for EUV lithography, the method comprising: providing a stack (40) comprising a membrane layer (45) between a supporting substrate (41) and an attachment substrate (51), wherein the supporting substrate comprises an inner region and a first border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane (45) formed from at least the membrane layer; and a support (81) holding the membrane, the support formed at least partially from the first border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.
B82Y 40/00 - Fabrication ou traitement des nanostructures
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs
42.
A METHOD OF MANUFACTURING A PELLICLE FOR A LITHOGRAPHIC APPARATUS, A PELLICLE FOR A LITHOGRAPHIC APPARATUS, A LITHOGRAPHIC APPARATUS, A DEVICE MANUFACTURING METHOD, AN APPARATUS FOR PROCESSING A PELLICLE, AND A METHOD FOR PROCESSING A PELLICLE
Van Den Einden, Wilhelmus Theodorus Anthonius Johannes
Van Der Zande, Willem Joan
Van Zwol, Pieter-Jan
Vermeulen, Johannes Petrus Martinus Bernardus
Vles, David Ferdinand
Voorthuijzen, Willem-Pieter
Abrégé
Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
B01D 67/00 - Procédés spécialement adaptés à la fabrication de membranes semi-perméables destinées aux procédés ou aux appareils de séparation
G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p.ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p.ex. monochromateurs
A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
Van Den Einden, Wilhelmus Theodorus Anthonius Johannes
Abrégé
A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the step of selectively removing the inner region of the planar substrate.
Van Den Einden, Wilhelmus Theodorus Anthonius Johannes
Abrégé
A method for manufacturing a membrane assembly for extreme ultraviolet (EUV) lithography, the method comprises: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region and the stack has a top, a bottom and a side between the top and the bottom; and selectively removing the inner region of the planar substrate, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substmte, wherein the stack is provided with a mechanical protection material configured to mechanically protect the border region during the step of selectively removing the inner region of the planar substmte and extending at least partly along the side of the stack.
A mask is provided with a protrusion configured to receive a pellicle frame attachment mechanism. The protrusion has a lip which defines a recess and/or groove in a base surface of the protrusion arranged for receiving an adhesive. The adhesive removably attaches the protrusion to the mask.
A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
G03F 1/00 - Originaux pour la production par voie photomécanique de surfaces texturées, p.ex. masques, photomasques ou réticules; Masques vierges ou pellicules à cet effet; Réceptacles spécialement adaptés à ces originaux; Leur préparation
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G03F 1/66 - Réceptacles spécialement adaptés aux masques, aux masques vierges ou aux pellicules; Leur préparation
A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G03F 1/00 - Originaux pour la production par voie photomécanique de surfaces texturées, p.ex. masques, photomasques ou réticules; Masques vierges ou pellicules à cet effet; Réceptacles spécialement adaptés à ces originaux; Leur préparation
Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
G03F 1/62 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation
G03F 1/00 - Originaux pour la production par voie photomécanique de surfaces texturées, p.ex. masques, photomasques ou réticules; Masques vierges ou pellicules à cet effet; Réceptacles spécialement adaptés à ces originaux; Leur préparation
Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
G03F 1/64 - Pellicules, p.ex. assemblage de pellicules ayant une membrane sur un cadre de support; Leur préparation caractérisés par les cadres, p.ex. du point de vue de leur structure ou de leur matériau
G03F 9/00 - Mise en registre ou positionnement d'originaux, de masques, de trames, de feuilles photographiques, de surfaces texturées, p.ex. automatique
52.
MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS COMPRISING SUCH A MEMBRANE
Disclosed is a membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane comprises one or more high doped regions wherein said membrane is doped with a dopant concentration greater than 1017 cm-3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein said high doped regions are comprised within some or all of said additional layers.
Disclosed is a membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane comprises one or more high doped regions wherein said membrane is doped with a dopant concentration greater than 1017 cm-3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein said high doped regions are comprised within some or all of said additional layers.
54.
MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS COMPRISING SUCH A MEMBRANE
Disclosed is a membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane comprises one or more high doped regions wherein said membrane is doped with a dopant concentration greater than 1017 cm-3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein said high doped regions are comprised within some or all of said additional layers.
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