Tokyo Electron Limited

Japon


 
Quantité totale PI 11 472
Quantité totale incluant filiales 11 551 (+ 180 pour les filiales)
Rang # Quantité totale PI 70
Note d'activité PI 4,4/5.0    7 590
Rang # Activité PI 67
Activité incl filiales 4,2/5.0    7 593
Symbole boursier
ISIN JP3571400005
Capitalisation 8668609632540.0  (JPY)
Industrie Semiconductor Equipment & Materials
Secteur Technology
Classe Nice dominante Machines et machines-outils

Brevets

Marques

7 175 89
0 2
4 112 87
7
 
Dernier brevet 2024 - Film deposition apparatus and fi...
Premier brevet 1978 - Magnetron sputtering target and ...
Dernière marque 2023 - ONE TEL, DIFFERENT TOGETHER
Première marque 1989 - TEL

Filiales

6 subsidiaries with IP (178 patents, 2 trademarks)

2 subsidiaries without IP

 S'inscrire grtuitement pour accéder à la liste des filiales

Industrie (Classification de Nice)

Derniers inventions, produits et services

2023 P/S Semiconductor manufacturing machines and their component parts and fittings; flat panel display m...
P/S Semiconductor manufacturing machines and their component parts and fittings; flat panel display ...
Invention Plasma processing apparatus and method for detecting end point. A measuring unit is provided in ...
Invention Etching method. An etching method of the present disclosure includes preparing a substrate havin...
Invention Method of cleaning plasma processing apparatus and plasma processing apparatus. A method of clea...
Invention Temperature control medium processing apparatus and temperature control medium processing method....
Invention Substrate processing apparatus and substrate processing method. A substrate processing apparatus...
Invention Plasma processing apparatus. A plasma processing apparatus includes an antenna configured to gen...
Invention System and method for liquid dispense and coverage control. Light can be used to monitor coating...
Invention Substrate stage, substrate processing apparatus, and temperature control method. A substrate sta...
Invention Systems and methods for improving planarity using selective atomic layer etching (ale). Atomic l...
Invention Plasma processing apparatus and substrate processing method. A plasma processing apparatus compr...
P/S Semiconductor manufacturing machines; component parts and fittings for semiconductor manufacturin...
Invention Wafer bonding process with reduced overlay distortion. An embodiment method includes determining ...
Invention Wafer bonding process with reduced overlay distortion. An embodiment method includes determining...
Invention Film forming method and film forming apparatus. A method of forming a SiOC-based film includes: ...
Invention Automatic pressure control device, film forming apparatus and pressure control method. An automa...
Invention Jig and positioning method. Provided are: a positioning jig that is used in positioning a ring me...
Invention Heat treatment apparatus. A heat treatment apparatus includes: a processing container having a r...
Invention Plasma processing apparatus and electrostatic chuck. A plasma processing apparatus includes a pl...
Invention Electrostatic chuck and substrate processing device. Provided are an electrostatic chuck and a su...
Invention Plasma processing device and electrostatic chuck. Provided is a technology relating to plasma pro...
Invention Information processing system, abnormality detection method, and heat treatment apparatus. An in...
Invention Substrate processing apparatus. A substrate processing apparatus includes a vacuum chamber, a ro...
Invention Information processing system, power adjustment method, and heat treatment apparatus. An informa...
Invention Support device, support system, and support method. [Problem] When work is being performed with r...
Invention Patterning a semiconductor substrate. A method of forming a semiconductor device, where the metho...
Invention Cyclic method for reactive development of photoresists. A method of processing a substrate includ...
Invention Plasma processing apparatus. A plasma processing apparatus includes a plasma processing chamber;...
Invention Parameter estimation system, parameter estimation method, computer program, and substrate process...
Invention Film deposition apparatus and film deposition method. A film deposition apparatus includes a vac...
Invention Substrate processing with material modification and removal. An etch and surface modification is ...
Invention Sin film formation method, and plasma treatment apparatus. Provided is an SiN film formation meth...
Invention Selective deposition of liner and barrier films for resistance reduction of semiconductor devices...
Invention Substrate processing with selective etching. Etching is selectively performed and selectively is ...
Invention Method of forming photosensitive organometallic oxides by chemical vapor polymerization. Embodim...
P/S Machines and instruments used for measuring and testing semiconductor manufacturing machines; com...
P/S Machines and instruments used for measuring and testing semiconductor manufacturing machines; co...
Invention Processor for controlling pipeline processing based on jump instruction, and program storage medi...
Invention Substrate transfer system and atmospheric transfer module. A substrate transfer system includes ...
Invention Substrate treatment device and substrate treatment method. This substrate treatment device is for...
2022 P/S Downloadable computer software for controlling semiconductor manufacturing processes; downloadabl...
P/S Downloadable computer software for controlling semiconductor manufacturing processes; downloadab...
P/S Semiconductor manufacturing machines and their component parts and fittings
P/S Semiconductor manufacturing machines and their component parts and fittings.
Invention 3d isolation of a segmentated 3d nanosheet channel region. Semiconductor devices and correspondi...
Invention Patterning a semiconductor substrate. A method of forming a semiconductor device, where the meth...
Invention Cyclic method for reactive development of photoresists. A method of processing a substrate inclu...
Invention Substrate processing with material modification and removal. An etch and surface modification is...
Invention Substrate processing with selective etching. Etching is selectively performed and selectively is...
Invention Double hardmasks for self-aligned multi-patterning processes. A method of processing a substrate...
Invention Metal oxide resists for euv patterning and methods for developing the same. A method for process...
Invention Substrate processing method and substrate processing apparatus. The present disclosure provides ...
Invention Plasma treatment method and plasma treatment device. A plasma treatment method according to the ...
Invention Coating treatment apparatus, coating treatment method, and computer storage medium. A coating tr...
2021 Invention Management system, management method, and management program. A management system for managing a...
Invention Substrate processing method and substrate processing apparatus. A substrate processing method in...
P/S Semiconductor manufacturing machines and their component parts and fittings; machines for mainten...
P/S Semiconductor manufacturing machines and their component parts and fittings; machines for mainte...
2020 Invention Substrate liquid processing apparatus and substrate liquid processing method. A technique advant...
P/S Semiconductor manufacturing machines and their structural parts; flat panel display manufacturing...
P/S Semiconductor manufacturing machines