Nikon Corporation

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[Owner] Nikon Corporation 3,622
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IPC Class
G03F 7/20 - Exposure; Apparatus therefor 801
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or 615
H04N 5/225 - Television cameras 248
H04N 5/232 - Devices for controlling television cameras, e.g. remote control 232
G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration 211
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1.

CHANNEL MEMBER AND FINE OBJECT MANIPULATION DEVICE

      
Application Number JP2023037882
Publication Number 2024/085230
Status In Force
Filing Date 2023-10-19
Publication Date 2024-04-25
Owner NIKON CORPORATION (Japan)
Inventor
  • Moriyama Masaki
  • Kobayashi Ryo
  • Ishizawa Naoya
  • Takubo Makiko
  • Hayashi Seri
  • Tanaka Shuhei
  • Fukutake Naoki
  • Nishimura Kumiko

Abstract

Provided is a channel member equipped with a channel that allows a fluid to pass therethrough and enables manipulation of a fine object, the channel member having an inner peripheral part in contact with the fluid and an outer peripheral part that holds the inner peripheral part and has a lower melting temperature than the inner peripheral part. Also provided is a fine object manipulation device comprising: the channel member; a support part that supports the outer peripheral part of the channel member; and an illumination part that illuminates, at least partially through the channel member, the fine object and is located above the support part.

IPC Classes  ?

  • C12M 1/26 - Inoculator or sampler
  • B05C 5/00 - Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
  • B05C 11/00 - Component parts, details or accessories not specifically provided for in groups
  • B05C 11/10 - Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
  • C12M 1/28 - Inoculator or sampler being part of container

2.

SYSTEMS AND METHODS FOR IMPROVED LASER MANUFACTURING

      
Application Number US2023035559
Publication Number 2024/086313
Status In Force
Filing Date 2023-10-20
Publication Date 2024-04-25
Owner NIKON CORPORATION (Japan)
Inventor Qin, Wan

Abstract

The problem of plasma shielding in pulsed laser manufacturing processes is addressed by systems and methods that break a pulsed laser scan line into subsets of irradiation positions. The subsets are generally offset along the scan line from one another. Within each subset, the irradiation positions are separated from one another by a predetermined separation distance. Thus, the irradiation positions contained in a given subset are interspersed with irradiation positions contained in other subsets. The predetermined separation distance is chosen at least in part to minimize the plasma shielding effect.

IPC Classes  ?

  • B22F 10/28 - Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
  • B22F 10/85 - Data acquisition or data processing for controlling or regulating additive manufacturing processes
  • B22F 12/43 - Radiation means characterised by the type, e.g. laser or electron beam frequency modulated
  • B29C 64/273 - Arrangements for irradiation using electron beams [EB] frequency modulated
  • B22F 10/366 - Scanning parameters, e.g. hatch distance or scanning strategy
  • B22F 12/49 - Scanners
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor

3.

OPTICAL DEVICE, OPTICAL PROCESSING DEVICE, OPTICAL PROCESSING METHOD, AND CORRECTION MEMBER

      
Application Number JP2022039339
Publication Number 2024/084694
Status In Force
Filing Date 2022-10-21
Publication Date 2024-04-25
Owner NIKON CORPORATION (Japan)
Inventor
  • Negishi, Taketoshi
  • Arai, Masanori

Abstract

This optical device is used for an optical processing device and is provided with: a deformable mirror (117) that a plurality of processing beams (ELs) from a processing light source (10) enter and that modifies the wavefront of the beam cross section of each of the plurality of processing beams (ELs); and a galvanomirror (161) that changes the traveling direction of the plurality of processing beams (ELs) from the deformable mirror (117) to change the positions where the processing beams (ELs) passing through an objective optical system (170) hit a workpiece (W).

IPC Classes  ?

  • B23K 26/064 - Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms

4.

LIGHT EXPOSURE DEVICE

      
Application Number JP2023036997
Publication Number 2024/085055
Status In Force
Filing Date 2023-10-12
Publication Date 2024-04-25
Owner NIKON CORPORATION (Japan)
Inventor
  • Akiyama, Takanobu
  • Ohkawa, Tomoyuki

Abstract

The purpose of the present invention is to, when a substrate (or substrates) is (are) disposed on a substrate holder for holding the substrate(s), detect the position(s) of the substrate(s) disposed in various forms, in which, for example, the substrate(s) is disposed with the orientation thereof changed or a plurality of substrates are disposed. This light exposure device is provided with: a holding part (201) which holds a plurality of substrates; a plurality of first sensors (210) which detect the respective positions of the plurality of substrates with respect to the holding part (201); a stage part (121) on which the plurality of substrates are disposed; and a plurality of second sensors (150) which detect the respective positions of the plurality of substrates with respect to the stage part (121). The number of the plurality of second sensors (150) is less than the number of the plurality of first sensors (210).

IPC Classes  ?

  • G03F 9/00 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
  • G03F 7/20 - Exposure; Apparatus therefor
  • H01L 21/68 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for positioning, orientation or alignment

5.

LENS BARREL AND IMAGING DEVICE

      
Application Number JP2023037495
Publication Number 2024/085135
Status In Force
Filing Date 2023-10-17
Publication Date 2024-04-25
Owner NIKON CORPORATION (Japan)
Inventor
  • Hagiwara, Kosuke
  • Hamasaki, Takuji
  • Takahashi, Nobuaki

Abstract

This lens barrel comprises: a moving part which has a first protrusion; a driving part which moves the moving part straight in an optical axis direction; a first tube which has a first cam groove that engages with the first protrusion, and a second cam groove; and a fist lens holding frame which has a second protrusion that engages with the second cam groove, and holds the first lens. The first tube rotates by the movement of the moving part in the optical axis direction, and the first lens holding frame moves in the optical axis direction by the rotation of the first tube.

IPC Classes  ?

  • G02B 7/04 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification

6.

INFORMATION PROCESSING METHOD, MACHINING METHOD, DISPLAY METHOD, DISPLAY DEVICE, INFORMATION PROCESSING DEVICE, COMPUTER PROGRAM, AND RECORDING MEDIUM

      
Application Number JP2022039045
Publication Number 2024/084642
Status In Force
Filing Date 2022-10-20
Publication Date 2024-04-25
Owner NIKON CORPORATION (Japan)
Inventor Nakagawa, Tomoya

Abstract

Provided is an information processing method for generating a difference model that shows the difference between an object model showing the three-dimensional shape of an object and a target model showing the target shape of the object. This method comprises: acquiring a plurality of unit areas, which each corresponding to a part of the target model and for which the distance from the object model is equal to or greater than a first threshold set by a user's first input; acquiring, as a cluster area, a group of unit areas for which the distance between two unit areas is equal to or less than a second threshold set by the user's second input; and outputting, as a difference model, at least one cluster area acquired after the first and second inputs have been received.

IPC Classes  ?

  • G06T 19/00 - Manipulating 3D models or images for computer graphics
  • B33Y 50/00 - Data acquisition or data processing for additive manufacturing
  • B29C 64/386 - Data acquisition or data processing for additive manufacturing
  • G05B 19/4097 - Numerical control (NC), i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by using design data to control NC machines, e.g. CAD/CAM
  • B22F 10/85 - Data acquisition or data processing for controlling or regulating additive manufacturing processes

7.

EXPOSURE METHOD AND EXPOSURE DEVICE

      
Application Number JP2023029125
Publication Number 2024/075396
Status In Force
Filing Date 2023-08-09
Publication Date 2024-04-11
Owner NIKON CORPORATION (Japan)
Inventor Murakami, Koichi

Abstract

This exposure method uses an exposure device comprising a spatial light modulator having two-dimensionally arranged multiple light modulation elements and an illumination unit for illuminating the spatial light modulator with illumination light, said method including: driving a substrate stage, which moves with a substrate being held thereon, in a scanning direction; and, when multiple first light modulation elements continuously disposed in the scanning direction among the multiple light modulation elements illuminate a predetermined region on the substrate with the illumination light as the substrate stage moves, adjusting a spot position indicating the center of the illumination light emitted from the multiple first light modulation elements to one of multiple predetermined positions within the predetermined region.

IPC Classes  ?

8.

DEVICE FOR PRODUCING GLASS, GLASS, OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR PRODUCING GLASS

      
Application Number JP2023034928
Publication Number 2024/075593
Status In Force
Filing Date 2023-09-26
Publication Date 2024-04-11
Owner NIKON CORPORATION (Japan)
Inventor
  • Yoshimoto Kohei
  • Shibata Norio
  • Takasu Shuhei
  • Kawashima Tatsunori
  • Ozeki Ayumi

Abstract

A device for producing a glass through a step in which the temperature of a melt of a raw glass material is lowered, the device comprising a heating part for heating the raw glass material supported in a non-contact manner, a heating control unit which controls the heating amount in which the raw glass material is heated by the heating part, and a forming part in which the raw glass material in a molten state that has changed in temperature on the basis of the control of the heating amount by the heating control unit is formed.

IPC Classes  ?

9.

CALCULATION DEVICE, CALCULATION SYSTEM, ROBOT SYSTEM, CALCULATION METHOD AND COMPUTER PROGRAM

      
Application Number JP2022036535
Publication Number 2024/069886
Status In Force
Filing Date 2022-09-29
Publication Date 2024-04-04
Owner NIKON CORPORATION (Japan)
Inventor
  • Koyanagi, Daisuke
  • Kinoshita, Shinichiro

Abstract

This calculation device is equipped with: a control unit for outputting a control signal for controlling an imaging unit and a robot to which the imaging unit is provided; and a learning unit for generating a model for determining a parameter for calculation processing in the control unit by learning using imaging results of a learning target object from the imaging unit. The control unit drives the robot in a manner such that the imaging unit has a prescribed positional relationship relative to the learning target object, and outputs a first control signal for causing the imaging unit to image the learning target object while in the prescribed positional relationship. The learning unit generates a model by learning using learning image data generated by imaging the learning target object using the imaging unit while in the prescribed positional relationship according to a control based on the first control signal. The control unit calculates the position and/or orientation of a processing target object by performing calculation processing by using the parameter determined using the model, and the processing target image data generated as a result of the imaging unit imaging a processing target object, the shape of which is substantially identical to that of the learning target object.

IPC Classes  ?

  • B25J 19/04 - Viewing devices
  • B25J 13/00 - Controls for manipulators
  • B25J 13/08 - Controls for manipulators by means of sensing devices, e.g. viewing or touching devices
  • G06T 1/00 - General purpose image data processing
  • G06T 7/00 - Image analysis

10.

OPTICAL GLASS, OPTICAL ELEMENT, OPTICAL SYSTEM, CEMENTED LENS, OBJECTIVE LENS FOR MICROSCOPE, INTERCHANGEABLE LENS FOR CAMERA, AND OPTICAL DEVICE

      
Application Number JP2023032958
Publication Number 2024/070613
Status In Force
Filing Date 2023-09-11
Publication Date 2024-04-04
Owner NIKON CORPORATION (Japan)
Inventor
  • Takasu Shuhei
  • Yoshimoto Kohei

Abstract

An optical glass in which La3+content: 5 to 35%, Si4+content: 5 to 25%, Nb5+content: 5 to 35%, Al3+content: 5 to 35%, and total content of Ti4+, Zr4+, Nb5+, Ta5+, and Al3+(Ti4++Zr4++Nb5++Ta5++al3+): 45 to 80%, expressed in mol% of cation.

IPC Classes  ?

  • C03C 3/097 - Glass compositions containing silica with 40% to 90% silica by weight containing phosphorus, niobium or tantalum
  • G02B 1/00 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements

11.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023035060
Publication Number 2024/071161
Status In Force
Filing Date 2023-09-27
Publication Date 2024-04-04
Owner NIKON CORPORATION (Japan)
Inventor
  • Ono, Takuro
  • Machida, Kosuke

Abstract

This optical system (OL) comprises, sequentially along the optical axis from the object side: a first lens group having a positive refractive power; a second lens group having a negative refractive power; a third lens group having a positive refractive power; a fourth lens group having a positive refractive power; and a fifth lens group having a negative refractive power. When focusing is performed, the second lens group and the fourth lens group move along the optical axis and the following conditional expression is satisfied. Conditional expression:0.50 < f1/f3 < 2.00 (Therein, f1 is the focal distance of the first lens group, and f3 is the focal distance of the third lens group.).

IPC Classes  ?

  • G02B 13/00 - Optical objectives specially designed for the purposes specified below
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

12.

ZOOM LENS AND IMAGING DEVICE

      
Application Number JP2023032963
Publication Number 2024/062958
Status In Force
Filing Date 2023-09-11
Publication Date 2024-03-28
Owner
  • TAMRON CO., LTD. (Japan)
  • NIKON CORPORATION (Japan)
Inventor
  • Yamanaka, Hisayuki
  • Takahashi, Jun
  • Take, Toshinori
  • Koida, Keigo

Abstract

Provided are a zooming lens and an imaging device that are small and light-weight, and have high optical performance. The zooming lens (30) comprises, in order from the object side, a negative front group and a positive rear group. The front group includes, in order from the object side, a positive lens group G1 (G1) and a negative composite lens group Gn (G2). The rear group includes a positive composite lens group Gp (G3), a negative lens group Gf (G4), and a negative lens group Gr (G5). The zooming lens (30) have specific optical characteristics expressed by two specific expressions.

IPC Classes  ?

  • G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

13.

CONVERSION METHOD, OPTICAL DEVICE, AND OPTICAL MICROSCOPE

      
Application Number JP2022035205
Publication Number 2024/062564
Status In Force
Filing Date 2022-09-21
Publication Date 2024-03-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Dake, Fumihiro
  • Kawai, Hitoshi

Abstract

[Problem] To improve practicality. [Solution] This conversion method includes the feature of converting, by means of a conversion unit, the repetition frequency of pulsed light emitted from a light source, and the feature wherein the repetition frequency converted by the conversion unit is variable.

IPC Classes  ?

14.

PROCESSING SYSTEM, DATA STRUCTURE, AND PROCESSING METHOD

      
Application Number JP2022034586
Publication Number 2024/057496
Status In Force
Filing Date 2022-09-15
Publication Date 2024-03-21
Owner NIKON CORPORATION (Japan)
Inventor
  • Funatsu Takayuki
  • Kitsuda Shin
  • Ichijo Tsukasa

Abstract

Provided is a processing system comprising a processing device which includes an emission optical system and a material supply unit and shapes a shaped object, a measurement device which acquires information relating to the size of a melt pool formed by emission of a processing beam, a recording device which records the information relating to the size of the melt pool in association with information relating to the position of the melt pool, and a control device. The control device controls the processing device such that the size of the melt pool formed by the emission of the processing beam matches the size of the melt pool read from the recording device.

IPC Classes  ?

  • B23K 26/34 - Laser welding for purposes other than joining

15.

LENS BARREL AND IMAGING DEVICE

      
Application Number JP2023033206
Publication Number 2024/058175
Status In Force
Filing Date 2023-09-12
Publication Date 2024-03-21
Owner NIKON CORPORATION (Japan)
Inventor
  • Imaei, Ichiro
  • Shimizu, Kunihiko

Abstract

To improve usability of a lens barrel, this lens barrel comprises a lens, a rotatable ring that is rotatable around the optical axis of the lens and has an uneven surface and flat surface on the inner periphery thereof, an operation part to be operated by a user, and a movable member that has a first protrusion that comes into contact with the uneven surface or the flat surface and is capable of moving between a first position, at which the first protrusion comes into contact with the uneven surface, and a second position, at which the first protrusion comes into contact with the flat surface, according to an operation of the operation part. When the movable member is at the first position, rotation of the rotatable ring causes the first protrusion to slide against the uneven surface to generate click sensation.

IPC Classes  ?

  • G02B 7/02 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses
  • G03B 17/02 - Bodies
  • G05G 1/10 - Controlling members for hand-actuation by rotary movement, e.g. hand wheels - Details, e.g. of discs, knobs, wheels or handles
  • G05G 5/03 - Means for enhancing the operator's awareness of the arrival of the controlling member at a command or datum position; Providing feel, e.g. means for creating a counterforce

16.

OPTICAL DEVICE, OPTICAL MACHINING DEVICE, MICROSCOPE DEVICE, AND SCANNING METHOD

      
Application Number JP2023033478
Publication Number 2024/058237
Status In Force
Filing Date 2023-09-14
Publication Date 2024-03-21
Owner NIKON CORPORATION (Japan)
Inventor Tokuhisa, Akira

Abstract

An optical device (10) of an optical machining device (1) includes: an optical fiber amplifier that amplifies pulsed light; a diffraction grating (12) that disperses, by a diffraction phenomenon, pulsed light (PL) output from the optical fiber amplifier; a collimator lens (13) that collimates the pulsed light (PL) scattered at the diffraction grating (12); and an objective lens (17) that condenses the pulsed light (PL) transmitted through the collimator lens (13). By changing the amplification rate of the optical fiber amplifier, the position at which time focus occurs is changed in the optical axis direction of the objective lens (17).

IPC Classes  ?

  • G02B 21/06 - Means for illuminating specimen
  • B23K 26/082 - Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
  • G02B 26/10 - Scanning systems
  • G02F 1/365 - Non-linear optics in an optical waveguide structure
  • H01S 3/067 - Fibre lasers
  • H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating

17.

GLASS COMPOSITION AND REFERENCE GLASS SAMPLE

      
Application Number JP2022034568
Publication Number 2024/057484
Status In Force
Filing Date 2022-09-15
Publication Date 2024-03-21
Owner NIKON CORPORATION (Japan)
Inventor
  • Yoshimoto Kohei
  • Fujiwara Miki
  • Shinohara Kiyoaki

Abstract

This glass composition includes: a main component; and at least any one of the following additional components introduced into the glass composition at a ratio of more than 0 to 1500 mg/kg per each additional component: Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Zr, Nb, Mo, Hf, Ta, W, Sc, Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Rb, Cs, Ba, Ga, Ge, In, Sn, Sb, Pb, Bi, Au, Pt, Ag, Ir, Pd, Rh, Ru, Re, F, Cl, Br, I, and S.

IPC Classes  ?

  • C03C 3/12 - Silica-free oxide glass compositions

18.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023021326
Publication Number 2024/057640
Status In Force
Filing Date 2023-06-08
Publication Date 2024-03-21
Owner NIKON CORPORATION (Japan)
Inventor Komatsubara Yoko

Abstract

Provided are an optical system capable of obtaining bright and good optical performance while achieving size reduction, an optical device, and a method for manufacturing an optical system. An optical system OL used in an optical device such as a camera 1 comprises, in order from the object side, a front group Gf having positive refractive power, an intermediate group Gi, and a rear group Gr having negative refractive power. The intermediate group Gi comprises a first focusing group GF1 and a second focusing group GF2 that move along different trajectories at the time of focusing. The front group Gf has, in order from the side closest to the object, a negative lens component Ln1, a negative lens component Ln2, and a positive lens component Lp, and the rear group G4 has a negative lens component LnL on the side closest to an image surface. The optical system satisfies conditions expressed by predetermined conditional expressions.

IPC Classes  ?

  • G02B 13/00 - Optical objectives specially designed for the purposes specified below
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

19.

ZOOM OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING ZOOM OPTICAL SYSTEM

      
Application Number JP2023026980
Publication Number 2024/053269
Status In Force
Filing Date 2023-07-24
Publication Date 2024-03-14
Owner NIKON CORPORATION (Japan)
Inventor Uehara, Takeru

Abstract

A zoom optical system (ZL) includes, sequentially along an optical axis from an object side, a first lens group (G1) having negative refractive power, a second lens group (G2) having positive refractive power, a third lens group (G3) having negative refractive power, and a fourth lens group (G4) having positive refractive power, wherein, upon zooming, the first lens group (G1) is fixed with respect to the image surface and the intervals each between the neighboring lens groups change to satisfy the following conditional expressions. 0.70 < (-f1) / f2 < 1.30 0.55 < f2 / (-f3) < 1.20 where f1: focal length of the first lens group f2: focal length of the second lens group f3: focal length of the third lens group

IPC Classes  ?

  • G02B 15/167 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group having an additional fixed front lens or group of lenses
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

20.

PROCESSING SYSTEM

      
Application Number JP2022032592
Publication Number 2024/047750
Status In Force
Filing Date 2022-08-30
Publication Date 2024-03-07
Owner NIKON CORPORATION (Japan)
Inventor Matsuda, Takeshi

Abstract

A processing system equipped with a partition device for demarcating a processing space, a first device for performing a first operation for changing the shape of an object by processing the object, which is housed in the processing space, and a second device for performing a second operation inside the processing space, wherein: the partition device is equipped with a movable opening member in which an opening is formed; the first device is inserted through the opening and positioned inside the processing space while the second device is positioned in an external space during a first interval during which the first device performs the first operation; and the second device is inserted through the opening and positioned inside the processing space while the first device is positioned in the external space during a second interval during which the second device performs a second operation.

IPC Classes  ?

  • B23K 26/12 - Working by laser beam, e.g. welding, cutting or boring in a special environment or atmosphere, e.g. in an enclosure
  • B23K 26/08 - Devices involving relative movement between laser beam and workpiece

21.

MACHINING SYSTEM

      
Application Number JP2022032062
Publication Number 2024/042681
Status In Force
Filing Date 2022-08-25
Publication Date 2024-02-29
Owner NIKON CORPORATION (Japan)
Inventor Matsuda, Takeshi

Abstract

A machining system SYS is capable of machining an object W by irradiating the object with an energy beam EL, and comprises: an emission optical system 130 that can emit the energy beam; a plurality of irradiation optical systems 135 that can irradiate the object with the energy beam emitted from the emission optical system, and that can be attached to the emission optical system; a plurality of hoods 136 that can be attached to the irradiation optical systems; and an attachment apparatus 17 that can attach one irradiation optical system from among the plurality of irradiation optical systems to the emission optical system, and that can attach one hood from among the plurality of hoods to said irradiation optical system.

IPC Classes  ?

  • B23K 26/00 - Working by laser beam, e.g. welding, cutting or boring

22.

PHOTOSENSITIVE SURFACE TREATMENT AGENT, LAMINATE, SUBSTRATE FOR PATTERN FORMATION, TRANSISTOR, PATTERN FORMATION METHOD, AND TRANSISTOR MANUFACTURING METHOD

      
Application Number JP2023030088
Publication Number 2024/043222
Status In Force
Filing Date 2023-08-22
Publication Date 2024-02-29
Owner NIKON CORPORATION (Japan)
Inventor
  • Kawakami Yusuke
  • Yamaguchi Kazuo
  • Itou Michiko

Abstract

This photosensitive surface treatment agent contains a compound represented by formula (M1). In formula (M1), R1represents a linear, branched, or cyclic alkyl group having 1-6 carbon atoms, and Y1represents a single bond or a linear or branched alkylene group having 1-4 carbon atoms. A carbon atom at the end of the alkyl group represented by R1may be bound to a carbon atom forming the alkylene group represented by Y1, to cause formation of a ring by R1and Y1. R2represents a hydrogen atom or an alkyl group having 1-6 carbon atoms, R3and R4 each independently represent an alkyl group having 1-3 carbon atoms, n0 represents an integer of 0 or more, and X represents a halogen atom or an alkoxy group.

IPC Classes  ?

  • G03C 1/72 - Photosensitive compositions not covered by groups
  • C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
  • H05K 1/03 - Use of materials for the substrate

23.

MEASUREMENT SYSTEM

      
Application Number JP2022032236
Publication Number 2024/042712
Status In Force
Filing Date 2022-08-26
Publication Date 2024-02-29
Owner NIKON CORPORATION (Japan)
Inventor
  • Miyakawa, Tomoki
  • Iwata, Hiroshi

Abstract

Provided is a measurement system comprising: an irradiation optical system capable of outputting measurement light; a mirror that reflects the measurement light; a first support mechanism that supports the mirror so that the mirror is rotatable around a first rotation axis; and a second support mechanism that supports the first support mechanism so that the first support mechanism is rotatable around a second rotation axis. The second support mechanism has: a movable portion that supports the first support mechanism at opposite ends in a direction along the first rotation axis and allows the first support mechanism to rotate around the second rotation axis; and a fixed portion that supports the movable portion at one side and an opposite side of the first support mechanism in a direction along the second rotation axis so that the movable portion is rotatable around the second rotation axis. The optical path of the measurement light is disposed at one side of the mirror in the direction along the second rotation axis. Wiring connected to an electrical component of the first support mechanism is disposed at an opposite side of the mirror in the direction along the second rotation axis. The measurement system changes the attitude of the mirror using the first support mechanism and the second support mechanism, so that the mirror reflects the measurement light toward an object being measured.

IPC Classes  ?

  • G01C 3/06 - Use of electric means to obtain final indication
  • G01C 15/00 - Surveying instruments or accessories not provided for in groups
  • G01S 7/481 - Constructional features, e.g. arrangements of optical elements
  • G01S 17/42 - Simultaneous measurement of distance and other coordinates

24.

PHOTOSENSITIVE SURFACE TREATMENT AGENT, PATTERN FORMATION SUBSTRATE, LAMINATE, TRANSISTOR, PATTERN FORMATION METHOD, AND TRANSISTOR MANUFACTURING METHOD

      
Application Number JP2023030083
Publication Number 2024/043221
Status In Force
Filing Date 2023-08-22
Publication Date 2024-02-29
Owner NIKON CORPORATION (Japan)
Inventor
  • Kawakami Yusuke
  • Yamaguchi Kazuo
  • Itou Michiko

Abstract

This photosensitive surface treatment agent contains a compound represented by formula (M1). (In formula (M1), R1represents a hydrogen atom, a tert-butoxycarbonyl group, or an ester-based protecting group, R2 represents a hydrogen atom or an alkyl group having 1-6 carbon atoms, m represents an integer equal to or greater than 1, and X represents a halogen atom or an alkoxy group.

IPC Classes  ?

  • G03C 1/72 - Photosensitive compositions not covered by groups
  • C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
  • H01L 21/288 - Deposition of conductive or insulating materials for electrodes from a liquid, e.g. electrolytic deposition
  • H01L 21/336 - Field-effect transistors with an insulated gate
  • H01L 29/786 - Thin-film transistors

25.

LIGHT SOURCE UNIT, ILLUMINATION UNIT, EXPOSURE DEVICE, AND EXPOSURE METHOD

      
Application Number JP2022031191
Publication Number 2024/038533
Status In Force
Filing Date 2022-08-18
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor
  • Iwanaga, Masaya
  • Kawado, Satoshi

Abstract

This light source unit comprises: a light source array in which a plurality of light source elements each having a light emitting unit that emits light are arrayed on a two-dimensional plane; and a magnification optical system that forms a magnified image of the light emitting units of each of the light source elements, wherein: the magnification optical system is a double telecentric optical system that magnifies and projects at magnification M; and when the array pitch of the light source elements is defined as p, the length of one side of a light emitting surface of the light source unit as a, the maximum emission angle of light having a radiation intensity greater than Lambertian radiation among the light emitted from the light emitting unit as α, and the maximum emission angle of light emitted from the magnification optical system as θ, the magnification M satisfies the condition of p/a

IPC Classes  ?

26.

LIGHTING UNIT, EXPOSURE DEVICE, AND EXPOSURE METHOD

      
Application Number JP2022031205
Publication Number 2024/038535
Status In Force
Filing Date 2022-08-18
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor
  • Iwanaga, Masaya
  • Kawado, Satoshi
  • Ohkawa, Tomoyuki
  • Nakatomi, Satoshi

Abstract

This lighting unit comprises: a first light source array (20A) in which a plurality of first light source elements each having a first light emitting section that emits light having a first wavelength characteristic is arranged; a first enlarging optical system (30A) that forms an enlarged image of the first light emitting section of each of the first light source elements; a first optical system (81A) into which light from the first enlarging optical system enters; a second light source array (20B) in which a plurality of second light source elements each having a second light emitting section that emits light having a second wavelength characteristic, which is different from the first wavelength characteristic, is arranged; a second enlarging optical system (30B) that forms an enlarged image of the second light emitting section of each of the second light source elements; a second optical system (81B) into which light from the second enlarging optical system enters; and a combining optical element (DM2) that combines the light from the first optical system with the light from the second optical system, wherein the combining optical element is located at the back focal position of the first optical system or a position close thereto and at the back focal position of the second optical system or a position close thereto.

IPC Classes  ?

27.

LIGHT SOURCE UNIT, ILLUMINATION UNIT, EXPOSURE DEVICE, AND EXPOSURE METHOD

      
Application Number JP2022031212
Publication Number 2024/038537
Status In Force
Filing Date 2022-08-18
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor
  • Yoshida, Ryohei
  • Suzuki, Tomonari
  • Sakurai, Yukiya
  • Indo, Masanari

Abstract

The purpose of the present invention is to, by inhibiting warpage or bending of a substrate on which light source elements are arranged, improve adhesion between the substrate and a heat sink and increase cooling efficiency. This light source unit comprises: a substrate (21A) that has a first surface and a second surface that are opposite each other; a plurality of light source elements (20A) that are two-dimensionally arranged on the first surface of the substrate (21A); and a heat sink (40). The substrate (21A) has at least one recess formed in a portion of the second surface opposing a range in which the plurality of light source elements (20A) are arranged in a plan view. The heat sink (40) has a through hole (401). The substrate (21A) and the heat sink (40) are fixed together by a fixing member (61) that is inserted through the through hole (401) and is fitted into the recess.

IPC Classes  ?

28.

LIGHT SOURCE UNIT, ILLUMINATION UNIT, EXPOSURE DEVICE, AND EXPOSURE METHOD

      
Application Number JP2022031214
Publication Number 2024/038538
Status In Force
Filing Date 2022-08-18
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor
  • Yoshida, Ryohei
  • Suzuki, Tomonari
  • Sakurai, Yukiya
  • Indo, Masanari
  • Iwanaga, Masaya

Abstract

This light source unit comprises: a plurality of light source elements that are two-dimensionally arranged on a surface of a fixation target; and protruding portions that protrude from the fixation target and that are each provided between one of the plurality of light source elements and at least one of the other light source elements adjacent to said one light source element. The ends of the protruding portions are located at a position higher than the lower surfaces of the light source elements. 

IPC Classes  ?

29.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023025978
Publication Number 2024/038719
Status In Force
Filing Date 2023-07-14
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor Ito Tomoki

Abstract

Provided are an optical system whereby good optical performance can be obtained, an optical device that comprises the optical system, and a method for manufacturing the optical system.  An optical system OL1 used in an optical device such as a camera 1 comprises an objective optical system GO and an image-forming optical system GI that forms an image from an intermediate image IM formed by the objective optical system GO, and is configured so as to satisfy the condition in the following expression: 0.40 < fo/f < 0.80 (where fo is the focal length of the objective optical system GO, and f is the whole-system focal length of the optical system OL).

IPC Classes  ?

  • G02B 13/00 - Optical objectives specially designed for the purposes specified below
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
  • G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length

30.

LENS BARREL AND IMAGING DEVICE

      
Application Number JP2023029413
Publication Number 2024/038840
Status In Force
Filing Date 2023-08-14
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor
  • Fukushima, Takehisa
  • Kinouchi, Yuki
  • Goda, Yokichi

Abstract

To increase the optical performance of this lens barrel, the lens barrel is made to comprise a diaphragm unit (30) that adjusts the light amount of a light flux passing through the lens barrel, and a first frame (F4) having at least one lens and provided with a first engagement portion (51) which engages with a first guide bar (25) extending in the optical axis direction. The diaphragm unit (30), the lens (L3), and the first frame (F4) integrally move in the optical axis direction.

IPC Classes  ?

  • G02B 7/04 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
  • G02B 7/02 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses
  • G02B 7/08 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification adapted to co-operate with a remote control mechanism
  • G03B 5/00 - Adjustment of optical system relative to image or object surface other than for focusing of general interest for cameras, projectors or printers
  • G03B 9/02 - Diaphragms
  • H04N 23/55 - Optical parts specially adapted for electronic image sensors; Mounting thereof

31.

DETECTION DEVICE

      
Application Number JP2023029501
Publication Number 2024/038856
Status In Force
Filing Date 2023-08-15
Publication Date 2024-02-22
Owner NIKON CORPORATION (Japan)
Inventor Tsunai Shiro

Abstract

In order to detect a subject without having a lens, this detection device comprises: a light guide part that has a light incidence port and an emission port having an opening smaller than that of the incidence port, and emits light incident from the incidence port from the emission port; and a detection part that detects the light emitted from the emission port.

IPC Classes  ?

  • G02B 6/42 - Coupling light guides with opto-electronic elements
  • H04N 23/55 - Optical parts specially adapted for electronic image sensors; Mounting thereof

32.

VARIABLE MAGNIFICATION OPTICAL SYSTEM, OPTICAL APPARATUS, AND VARIABLE MAGNIFICATION OPTICAL SYSTEM MANUFACTURING METHOD

      
Application Number JP2023025401
Publication Number 2024/034309
Status In Force
Filing Date 2023-07-10
Publication Date 2024-02-15
Owner NIKON CORPORATION (Japan)
Inventor
  • Ono, Takuro
  • Tachi, Hideyuki

Abstract

A variable magnification optical system (ZL) comprises, arranged in order from the object side and along the optical axis: an object-side lens group (GA) having a positive refractive power; an intermediate group (GM) having a positive refractive power; and a rear group (GR). The intermediate group (GM) includes at least one lens group. The rear group (GR) includes, arranged in order from the object side and along the optical axis: a first succeeding lens group (GR1) having a negative refractive power; a second succeeding lens group (GR2) having a positive refractive power; and a third succeeding lens group (GR3) having a negative refractive power. When varying magnification, the interval between the adjacent lens groups changes, and the second succeeding lens group (GR2) moves along the optical axis when focusing, and as a result thereof, the following formula is satisfied. Formula: 1.05<f1/TLw<2.0, wherein f1 is the focal distance of the object-side lens group (GA), and TLw is the total length of the variable magnification optical system (ZL) when the same is in the wide-angle state.

IPC Classes  ?

  • G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

33.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023027689
Publication Number 2024/034428
Status In Force
Filing Date 2023-07-28
Publication Date 2024-02-15
Owner NIKON CORPORATION (Japan)
Inventor Miwa Satoshi

Abstract

Provided are an optical system that achieves reductions in size and weight and can obtain satisfactory optical performance, an optical device, and a method for manufacturing the optical system. An optical system OL used in an optical device such as a camera 1 comprises, in order from the object side, a first lens group G1 having positive refractive power, a second lens group G2 having negative refractive power, a third lens group G3 having positive refractive power, a fourth lens group G4 having negative refractive power, and a fifth lens group G5 having positive refractive power, the distance between the lens groups adjacent to each other changing when the magnification is changed, and the second lens group G2 being fixed with respect to an image surface when the magnification is changed, and the optical system satisfies a condition based on a predetermined conditional expression.

IPC Classes  ?

  • G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

34.

SYSTEMS AND METHODS FOR POWDER MIXING IN ADDITIVE MANUFACTURING PROCESSES

      
Application Number US2023029436
Publication Number 2024/030579
Status In Force
Filing Date 2023-08-03
Publication Date 2024-02-08
Owner NIKON CORPORATION (Japan)
Inventor
  • Lin, Zhi-Wei
  • Jeong, Yoon Jung
  • Goodwin, Eric Peter
  • Goldstein, Goldie Lynne

Abstract

The problem of determining the composition or homogeneity of powder mixtures, or of determining the response time required to alter the powder mixtures, is addressed by systems and methods for monitoring or altering the composition of powder mixtures in 3D printing processes. The systems and methods generally utilize a sensing module to detect a signal indicative of a composition of a powder mixture that is prepared and dispensed by a powder dispensing module. A controller then receives the signal from the sensing module and monitors the composition of the powder mixture based upon the signal. In some cases, the controller alters the composition of the powder mixture based upon the signal.

IPC Classes  ?

  • B22F 10/28 - Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
  • B22F 10/34 - Process control of powder characteristics, e.g. density, oxidation or flowability
  • B22F 10/85 - Data acquisition or data processing for controlling or regulating additive manufacturing processes
  • B22F 12/58 - Means for feeding of material, e.g. heads for changing the material composition, e.g. by mixing
  • B22F 12/90 - Means for process control, e.g. cameras or sensors
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B22F 10/37 - Process control of powder bed aspects, e.g. density

35.

PATTERN EXPOSURE APPARATUS AND DEVICE PRODUCTION METHOD

      
Application Number JP2022028619
Publication Number 2024/023885
Status In Force
Filing Date 2022-07-25
Publication Date 2024-02-01
Owner NIKON CORPORATION (Japan)
Inventor Kato Masaki

Abstract

An exposure apparatus according to the present invention causes reflection light from a selected on-state micromirror in a spatial light modulation element to enter a projection unit and projects and exposes a pattern corresponding to drawing data onto a substrate. The apparatus comprises an illumination unit that emits first illumination light having a wavelength λ1 and second illumination light having a wavelength λ2 (λ2≠λ1), which are allowable in terms of chromatic aberration characteristics of the projection unit, to the spatial light modulation element at an entry angle corresponding to a multiple of the inclination angle of the on-state micromirror. When the diffraction angle of j1-th order main diffraction light that is based on the the wavelength λ1, that is generated from the on-state micromirror, and that enters the projection unit is denoted by θj1, and the diffraction angle of j2-th order main diffraction light that is based on the wavelength λ2, that is generated from the on-state micromirror, and that enters the projection unit is denoted by θj2, the difference between the wavelength λ1 and the wavelength λ2 or the entry angles are set such that the diffraction angle θj1 and the diffraction angle θj2 distribute with the optical axis of the projection unit therebetween.

IPC Classes  ?

36.

VIBRATION CONTROL OF STRUCTURAL ELEMENTS OF EXPOSURE APPARATUS

      
Application Number US2023070966
Publication Number 2024/026320
Status In Force
Filing Date 2023-07-25
Publication Date 2024-02-01
Owner NIKON CORPORATION (Japan)
Inventor
  • Yang, Pai-Hsueh
  • Asaumi, Hiroyoshi
  • Sakata, Koichi
  • Tokumi, Kensuke
  • Kitabatake, Shigeki
  • Margeson, Christopher Sean
  • Lee, Hwan
  • Yuan, Bausan

Abstract

A method of controlling vibration of a structural element of an exposure apparatus includes receiving data of a position of the structural element, determining a position error signal based at least in part on the position data and a specified position of the structural element, determining a force command to damp a specified vibration mode frequency of the structural element based at least in part on the position error signal and the specified vibration mode frequency, and transmitting the force command to an actuator such that the actuator applies force to the structural element and damps vibration of the structural element at least at the specified vibration mode frequency of the structural element.

IPC Classes  ?

  • F16F 15/00 - Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
  • F16F 15/02 - Suppression of vibrations of non-rotating, e.g. reciprocating, systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating system
  • B25J 9/12 - Programme-controlled manipulators characterised by positioning means for manipulator elements electric
  • B25J 9/14 - Programme-controlled manipulators characterised by positioning means for manipulator elements fluid

37.

ANTIBODY SELECTION SYSTEM AND OPERATION METHOD THEREFOR

      
Application Number JP2022029403
Publication Number 2024/024118
Status In Force
Filing Date 2022-07-29
Publication Date 2024-02-01
Owner NIKON CORPORATION (Japan)
Inventor
  • Takatsuka, Kenji
  • Morozumi, Akihiko

Abstract

One form of the present invention is an operation method for an antibody selection system connected so as to be able to communicate with an antibody information server. The system has a control device and a display device. The operation method includes: a first step in which the control device causes the display device to display a microscopy image of biological tissue or cells, the base sequence of a nucleic acid of the biological tissue or cells, data indicating nucleic acid features or base sequence features, and the name of one or two or more genes obtained on the basis of the data; a second step in which the control device transmits the ID of a gene selected from among the one or two or more genes to the antibody information server; a third step in which the control device receives, from the antibody information server, antibody information for a protein encoded by the selected gene; and a fourth step in which the control device causes the display device to display the antibody information.

IPC Classes  ?

  • G16B 50/00 - ICT programming tools or database systems specially adapted for bioinformatics

38.

MICROFLUIDIC DEVICE, OBSERVATION APPARATUS FOR MICROFLUIDIC DEVICE, AND OBSERVATION METHOD FOR MICROFLUIDIC DEVICE

      
Application Number JP2023026894
Publication Number 2024/024697
Status In Force
Filing Date 2023-07-21
Publication Date 2024-02-01
Owner NIKON CORPORATION (Japan)
Inventor Matsui Kumiko

Abstract

Provided is a microfluidic device having a top surface, a bottom surface, and a plurality of side surfaces, at least one side surface of the plurality of side surfaces having an optically transparent portion that transmits illumination light from the outside. Provided is an observation apparatus for a microfluidic device, the observation apparatus having an illumination optical system that illuminates a microfluidic device having a top surface, a bottom surface, and a plurality of side surfaces, at least one side surface of the plurality of side surfaces having an optically transparent portion that transmits illumination light from the outside, with the illumination light through the optically transparent portion, and an observation optical system that receives output light from the top surface and/or bottom surface.

IPC Classes  ?

39.

MODELING SYSTEM

      
Application Number JP2022027701
Publication Number 2024/013931
Status In Force
Filing Date 2022-07-14
Publication Date 2024-01-18
Owner NIKON CORPORATION (Japan)
Inventor
  • Funatsu, Takayuki
  • Momose, Atsumi
  • Murata, Hiromichi
  • Nakata, Kei

Abstract

A modeling system according to the present invention comprises: a modeling apparatus which is capable of modeling a model by supplying a modeling material to a weld pool that is formed by irradiating the surface of an object with a modeling beam; and a control device which is capable of controlling the modeling apparatus. The control device controls the modeling apparatus such that: the irradiation position of the modeling beam periodically moves within a modeling unit region that is set on the surface of the object; and the modeling unit region moves on the surface of the object on the basis of path information that shows the movement locus of the modeling unit region. The control device changes, on the basis of the path information, the amount of rotation of the modeling unit region around the rotation axis that intersects with the surface of the object.

IPC Classes  ?

  • B23K 26/342 - Build-up welding
  • B23K 26/082 - Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
  • B23K 26/34 - Laser welding for purposes other than joining

40.

MODELING SYSTEM, PROCESSING SYSTEM, MODELING METHOD, AND PROCESSING METHOD

      
Application Number JP2022027700
Publication Number 2024/013930
Status In Force
Filing Date 2022-07-14
Publication Date 2024-01-18
Owner NIKON CORPORATION (Japan)
Inventor
  • Funatsu, Takayuki
  • Doi, Ryosuke
  • Murata, Hiromichi

Abstract

This modeling system comprises a modeling device that is capable of modeling a modeled article using an irradiation optical system with which the surface of an object can be irradiated with a modeling beam, a measurement device that is capable of measuring an emitted beam including at least one of the modeling beam and a guide beam, a movement device that causes the irradiation optical system and the measurement device to move relatively along a direction intersecting the optical axis of the irradiation optical system within a modeling period, and a control device that is capable of controlling the modeling device on the basis of the result of measurement of the emitted beam by the measurement device. The irradiation optical system includes a movement member that causes the emitted beam to move along a direction intersecting the optical axis of the irradiation optical system within the modeling period. The measurement device measures the emitted beam within a measurement period. The control device controls the movement member within the modeling period on the basis of the result of measuring the emitted beam within the measurement period.

IPC Classes  ?

  • B23K 26/082 - Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
  • B23K 26/00 - Working by laser beam, e.g. welding, cutting or boring
  • B23K 26/08 - Devices involving relative movement between laser beam and workpiece
  • B23K 26/34 - Laser welding for purposes other than joining

41.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023025109
Publication Number 2024/010062
Status In Force
Filing Date 2023-07-06
Publication Date 2024-01-11
Owner NIKON CORPORATION (Japan)
Inventor Kurashige, Takamichi

Abstract

This optical system is configured so as to satisfy the conditional expression below, and comprises: a first optical system that has a front-side lens group, an optical path branching member having a branching surface for branching incident light, and a first rear-side lens group on which one branched light is incident; and a second optical system that has a front-side lens group, an optical path branching member, and a second rear-side lens group on which the other branched light is incident. The total optical length of the first optical system is equal to the total optical length of the second optical system, or greater than the total optical length of the second optical system. 0.50 < T(gr1)/(-f(gr1)) < 4.50, where T(gr1) is the distance on the optical axis from a lens surface closest to an object side of the front-side lens group to a lens surface closest to an image side of the front-side lens group, and f(gr1) is the composite focal length of the front-side lens group.

IPC Classes  ?

42.

MEASURING METHOD, AND METHOD FOR CONSTRUCTING STRUCTURE

      
Application Number JP2023024880
Publication Number 2024/010024
Status In Force
Filing Date 2023-07-05
Publication Date 2024-01-11
Owner NIKON CORPORATION (Japan)
Inventor Miyawaki Takashi

Abstract

This measuring method, with which it is possible to reduce the time and effort involved in installing three-dimensional surveying equipment, includes (step S104 and step S106): using a sensor device and the three-dimensional surveying equipment to measure position information at a predetermined measuring point of a built-in pillar (construction material); and acquiring calibration information of position information to be measured using the sensor device on the basis of measurement results from both the sensor device and the three-dimensional surveying equipment.

IPC Classes  ?

  • G01C 15/00 - Surveying instruments or accessories not provided for in groups
  • E04G 21/18 - Adjusting tools; Templates
  • G01B 21/22 - Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for testing the alignment of axes
  • G01C 9/06 - Electric or photoelectric indication or reading means

43.

OPTICAL MODULE, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL MODULE

      
Application Number JP2023025318
Publication Number 2024/010089
Status In Force
Filing Date 2023-07-07
Publication Date 2024-01-11
Owner NIKON CORPORATION (Japan)
Inventor
  • Masada, Takahiro
  • Kurashige, Takamichi
  • Fukumoto, Satoshi
  • Hirayama, Toru

Abstract

This optical module includes a splitting surface that transmits part of incident light and reflects at least part of the incident light different from the part of the incident light that is transmitted, the optical module imaging each of the light transmitted through the splitting surface and the light reflected by the splitting surface. The optical module comprises a first optical system and a second optical system. The first optical system comprises, in order from the object side, a forward lens group, an optical path-splitting member having a splitting surface, and a first backward lens group that has a positive refracting power and on which the light transmitted through the splitting surface is incident. The second optical system comprises, in order from the object side, a forward lens group, an optical path-splitting member, and a second backward lens group that has a positive refracting power and on which the light reflected by the splitting surface is incident. One of the first optical system and the second optical system is configured to have an aperture stop on the splitting surface or on the image side of the splitting surface.

IPC Classes  ?

  • G02B 13/00 - Optical objectives specially designed for the purposes specified below
  • G02B 5/00 - Optical elements other than lenses
  • G03B 13/14 - Viewfinders adjusting viewfinder field to compensate for parallax due to short range

44.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023025321
Publication Number 2024/010090
Status In Force
Filing Date 2023-07-07
Publication Date 2024-01-11
Owner NIKON CORPORATION (Japan)
Inventor Kurashige, Takamichi

Abstract

This optical system comprises: a first optical system having a front lens group, a prism having a branching surface that branches incident light, and a first rear lens group on which the light having a longer optical path length when passing through the prism from among the branched lights is incident; and a second optical system having a front lens group, a prism, and a second rear lens group on which the light having a shorter optical path length when passing through the prism from among the branched lights is incident. The optical system is configured so as to satisfy the following conditional expression. 0.80 < -f(gr1n)/f(L) < 4.30 Here, f(gr1n) is the combined focal length of the negative lenses, from among the negative lenses included in the front lens group, that are disposed continuously to an image surface side from the negative lens disposed closest to the object side, and f(L) is the focal length of the first optical system.

IPC Classes  ?

  • G02B 13/04 - Reversed telephoto objectives
  • G02B 13/14 - Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

45.

MICROSCOPE DEVICE AND DATA GENERATION METHOD

      
Application Number JP2022025272
Publication Number 2023/248459
Status In Force
Filing Date 2022-06-24
Publication Date 2023-12-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Ikeda, Satoshi
  • Fukutake, Naoki

Abstract

A microscope device (1) comprises: a first microscope unit (10) that irradiates a sample (SA) with first illumination light in a first direction to detect light emitted from the sample (SA) in response to the irradiation with the first illumination light; a second microscope unit (50) that irradiates the sample (SA) with second illumination light in a second direction orthogonal to the first direction to detect light emitted from the sample (SA) in response to the irradiation with the second illumination light; and a data processing unit that, on the basis of a detection signal of the light detected by the first microscope unit (10) and a detection signal of the light detected by the second microscope unit (50), generates a three-dimensional refractive index distribution of the sample (SA).

IPC Classes  ?

46.

SHAPING METHOD AND SHAPING DEVICE

      
Application Number JP2022025269
Publication Number 2023/248458
Status In Force
Filing Date 2022-06-24
Publication Date 2023-12-28
Owner NIKON CORPORATION (Japan)
Inventor Shibazaki Yuichi

Abstract

This shaping method for shaping a structure by forming a plurality of structural layers in a superimposed manner involves controlling the thickness distribution of a shaping material of a second structural layer formed by being superimposed on the first structural layer, by using, in combination: a first method for controlling the thickness of a shaping material in accordance with height information about a surface of a first structural layer; and a second method for controlling the thickness of the shaping material for a spatial frequency component differing from a spatial frequency component corresponding to the first method. The present invention makes it possible to improve the accuracy of the surface of the structure shaped by an additive manufacturing (AM) method.

IPC Classes  ?

47.

FLUID DEVICE PRODUCTION METHOD AND FLUID DEVICE

      
Application Number JP2023022510
Publication Number 2023/248963
Status In Force
Filing Date 2023-06-16
Publication Date 2023-12-28
Owner
  • IXFLOW, INC. (Japan)
  • NIKON CORPORATION (Japan)
Inventor
  • Ishizawa Naoya
  • Kobayashi Ryo
  • Takubo Makiko
  • Shiono Hirofumi
  • Nakaya Hideyuki

Abstract

This fluid device production method comprises: a formation step for forming a laminate which includes a first substrate formed from a resin material that has transparency with respect to laser light, an intermediate layer laminated on the first substrate and formed from a resin material that is of the same type as the first substrate and that has an absorbent property with respect to the laser light, and a second substrate laminated on the intermediate layer and formed from a resin material that is of the same type as the first substrate and that has transparency with respect to the laser light, and in which a flow path is formed in the intermediate layer or in the surface of the first or second substrate that contacts the intermediate layer; and a joining step for joining the first substrate, the intermediate layer, and the second substrate by irradiating the laminate with laser light from the first substrate side or the second substrate side, so as to weld the first substrate and the intermediate layer, and also the intermediate layer and the second substrate, in a region irradiated with the laser light.

IPC Classes  ?

  • B29C 65/16 - Laser beam
  • B01J 19/00 - Chemical, physical or physico-chemical processes in general; Their relevant apparatus
  • G01N 35/08 - Automatic analysis not limited to methods or materials provided for in any single one of groups ; Handling materials therefor using a stream of discrete samples flowing along a tube system, e.g. flow injection analysis
  • G01N 37/00 - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES - Details not covered by any other group of this subclass

48.

SYSTEMS AND METHODS FOR MASKLESS PHOTOLITHOGRAPHY

      
Application Number US2022034201
Publication Number 2023/249606
Status In Force
Filing Date 2022-06-21
Publication Date 2023-12-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Yuan, Bausan
  • Hirayanagi, Noriyuki
  • Sorensen, Conrado
  • Szoboszlay, Gabor Denes
  • Watanabe, Yoji
  • Kanaya, Yuho
  • Tseng, Huey-Hua David
  • Koo, Shiang-Lung

Abstract

The problem of stitching together multiple exposure regions in a maskless photolithography system is addressed by systems and methods that utilize high-speed data paths between critical maskless photolithography components and a master clock signal to synchronously control the operation of all major components of the maskless photolithography system.

IPC Classes  ?

49.

PROCESSING CONTROL INFORMATION GENERATION METHOD, PROCESSING METHOD, AND MODEL GENERATION METHOD

      
Application Number JP2022023913
Publication Number 2023/242983
Status In Force
Filing Date 2022-06-15
Publication Date 2023-12-21
Owner NIKON CORPORATION (Japan)
Inventor Nakagawa, Tomoya

Abstract

This processing control generation method includes: acquiring an object model indicating the three-dimensional shape of an object; deforming a reference model of the object on the basis of the object model so as to generate a deformation model indicating a target shape for the object after processing; generating a difference model indicating a difference between the deformation model and the object model; and, on the basis of the difference model, generating processing control information for performing an additive process on the object such that the three-dimensional shape of the object becomes the target shape.

IPC Classes  ?

  • B22F 10/85 - Data acquisition or data processing for controlling or regulating additive manufacturing processes
  • B29C 64/386 - Data acquisition or data processing for additive manufacturing
  • B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • B33Y 50/00 - Data acquisition or data processing for additive manufacturing
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

50.

OPTICAL DEVICE, SCANNING METHOD, AND MOLDING DEVICE AND METHOD

      
Application Number JP2022024187
Publication Number 2023/243056
Status In Force
Filing Date 2022-06-16
Publication Date 2023-12-21
Owner NIKON CORPORATION (Japan)
Inventor Shibazaki Yuichi

Abstract

This optical device is provided with a light source unit that emits a light beam, and comprises: a light collection optical system that collects the light beam emitted from the light source unit onto an object surface; at least one transmission-type deflection member that is supported to be rotatable about the optical axis of the light collection optical system between the light source unit and the object surface, and deflects the light beam; and a drive unit that changes the angle of rotation about the optical axis of the deflection member such that the position of a region to be irradiated with the light beam on the object surface changes. It becomes possible to increase the precision of an object to be molded and improve molding efficiency.

IPC Classes  ?

  • G02B 26/10 - Scanning systems
  • B23K 26/064 - Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
  • B29C 67/02 - Moulding by agglomerating

51.

DRAWING DATA GENERATION METHOD, DRAWING DATA GENERATION APPARATUS, DRAWING DATA GENERATION PROGRAM, EXPOSURE SYSTEM, AND DEVICE MANUFACTURING METHOD

      
Application Number JP2022022827
Publication Number 2023/238200
Status In Force
Filing Date 2022-06-06
Publication Date 2023-12-14
Owner NIKON CORPORATION (Japan)
Inventor Kanaya, Yuho

Abstract

Provided is a drawing data generating method, said data representing a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern atop a substrate by means of exposure light. In order to shorten the time for generating data representing a pattern to be generated by a spatial light modulator, the method is configured so that a computer executes the following: generating first drawing data representing a first drawing pattern corresponding to a first pattern, from design data representing a design pattern which corresponds to the predetermined exposure pattern and in which a second pattern including a plurality of repeatedly arranged first patterns is repeatedly arranged; generating second drawing data representing a second drawing pattern corresponding to the second pattern on the basis of the generated first drawing data and first information indicating the repeated form of the first pattern; and generating drawing data representing a drawing pattern on the basis of the generated second drawing data and second information indicating the repeated form of the second pattern.

IPC Classes  ?

52.

PROCESSING SYSTEM AND PROCESSING METHOD

      
Application Number JP2022023275
Publication Number 2023/238319
Status In Force
Filing Date 2022-06-09
Publication Date 2023-12-14
Owner NIKON CORPORATION (Japan)
Inventor
  • Funatsu, Takayuki
  • Kitsuda, Shin

Abstract

This processing system comprises: a processing device that forms a molten pool on an object through irradiation of the object with an energy beam, and feeds a building material to the molten pool to process the object; an imaging device that can generate a molten pool image by capturing an image of the molten pool; and a control device that generates molten pool image information on the basis of the molten pool image, and controls the processing device such that the size of a molten pool region is a target size on the basis of the molten pool image information. The molten pool image information is generated on the basis of a plurality of molten pool images. The control device changes an imaging condition for the imaging device to capture an image of the molten pool, on the basis of a processing condition of the object.

IPC Classes  ?

  • B23K 26/342 - Build-up welding
  • B23K 26/00 - Working by laser beam, e.g. welding, cutting or boring
  • B23K 26/34 - Laser welding for purposes other than joining

53.

LIGHT CONDENSING OPTICAL SYSTEM, Fθ OPTICAL SYSTEM, OPTICAL MACHINING DEVICE, AND OPTICAL MEASUREMENT DEVICE

      
Application Number JP2022022732
Publication Number 2023/238175
Status In Force
Filing Date 2022-06-06
Publication Date 2023-12-14
Owner NIKON CORPORATION (Japan)
Inventor Sudo, Kenta

Abstract

A light condensing optical system (CL) is used in an optical machining device comprising a galvano scanner that changes the condensing position of machining light on a workpiece, and the light condensing optical system condenses the machining light. The light condensing optical system (CL) comprises: a first optical member (e.g., a negative lens (L11)) that is disposed furthest to the galvano scanner side among a plurality of optical members constituting the light condensing optical system; and a second optical member (e.g., a negative meniscus lens (L27)) that is disposed furthest to the workpiece side among the plurality of optical members constituting the light condensing optical system (CL). A workpiece conjugate plane Im that is conjugated with the workpiece is formed between the first optical member and the second optical member.

IPC Classes  ?

  • G02B 13/00 - Optical objectives specially designed for the purposes specified below

54.

MEASUREMENT SYSTEM, PROCESSING SYSTEM, MEASUREMENT METHOD, AND PROCESSING METHOD

      
Application Number JP2022022460
Publication Number 2023/233613
Status In Force
Filing Date 2022-06-02
Publication Date 2023-12-07
Owner NIKON CORPORATION (Japan)
Inventor
  • Nakamura, Takashi
  • Miyakawa, Tomoki

Abstract

This measurement system comprises: a first measurement device that is capable of projecting measurement light onto a measuring member attached to a movable part of a processing device capable of processing a processing object, and that is capable of measuring the position of the measuring member; and a measurement control device capable of controlling the first measurement device. The measurement control device comprises: a calculation unit that, in a first state, which is a state in which a tool center point of the processing device is located at a predetermined position, calculates position conversion information on the basis of first position information indicating a position of the measuring member which is measured on the basis of the measurement light projected by the first measurement device onto the measuring member, and second position information indicating the predetermined position; and a transmission unit that transmits the calculated position conversion information to a processing control device capable of controlling movement of the moving part of the processing device. In a second state, which is a state in which the tool center point is located at a position different from the predetermined position, the transmission unit transmits, to the processing control device, third position information indicating a position of the measuring member which is measured on the basis of the measurement light projected by the first measurement device onto the measuring member.

IPC Classes  ?

55.

PROCESSING SYSTEM

      
Application Number JP2022022099
Publication Number 2023/233514
Status In Force
Filing Date 2022-05-31
Publication Date 2023-12-07
Owner NIKON CORPORATION (Japan)
Inventor Tatsuzaki, Yosuke

Abstract

This processing system comprises a processing device capable of performing removal processing for removing a portion of an object by emitting an energy beam onto the object, and a control device for controlling the processing device to remove a target processing part in the removal processing, wherein: the control device controls the processing device to execute a first operation for removing at least a portion of a first part of the target processing part by emitting an energy beam having a first fluence onto the first part, and a second operation for removing at least a portion of a second part of the target processing part by emitting an energy beam having a second fluence lower than the first fluence onto the second part; and the first part is adjacent to the second part in a first direction intersecting a direction of progress of the energy beam.

IPC Classes  ?

  • B23K 26/36 - Removing material
  • B23K 26/00 - Working by laser beam, e.g. welding, cutting or boring

56.

MEASUREMENT SYSTEM, PROCESSING SYSTEM, MEASUREMENT METHOD, AND PROCESSING METHOD

      
Application Number JP2022022463
Publication Number 2023/233615
Status In Force
Filing Date 2022-06-02
Publication Date 2023-12-07
Owner NIKON CORPORATION (Japan)
Inventor
  • Nakamura, Takashi
  • Masuda, Shotaro
  • Miyakawa, Tomoki

Abstract

Provided is a measurement system provided with: a measurement device whereby measurement light can be radiated to a first member that is attached to at least one of a processing object and a jig for retaining the processing object, and a second member that is attached to a movable portion of a processing device, the measurement device being capable of measuring the positions of each of the first member and the second member in a measurement coordinate system; and a measurement control device for controlling the measurement device. The measurement control device comprises: a computation unit that converts the position of the second member in the measurement coordinate system measured by the measurement device to a position of the second member in a processing coordinate system, on the basis of first position information that indicates the position of the first member in the measurement coordinate system measured by the measurement device and second position information that indicates the position of the first member in the processing coordinate system; and a transmission unit capable of transmitting third position information that indicates the converted position of the second member in the processing coordinate system to a processing control device for controlling a processing device.

IPC Classes  ?

57.

MACHINING SYSTEM

      
Application Number JP2022021729
Publication Number 2023/228401
Status In Force
Filing Date 2022-05-27
Publication Date 2023-11-30
Owner NIKON CORPORATION (Japan)
Inventor Matsuda, Takeshi

Abstract

This machining system comprises: an irradiation optical system capable of irradiating an object with an energy beam for machining the object; a mounting device that allows the object to be mounted on a mounting surface; a first changing device capable of changing at least one of a positional relationship and a posture relationship between the object mounted on the mounting device and the irradiation optical system; a light receiving device capable of receiving the energy beam emitted from the irradiation optical system; a second changing device capable of changing a positional relationship between the light receiving device and the irradiation optical system; and a control device. Under control of the control device, the position of the light receiving device is changed to a first position capable receiving the energy beam, from a second position different from the first position, by the second changing device.

IPC Classes  ?

  • B23K 26/00 - Working by laser beam, e.g. welding, cutting or boring
  • B23K 26/082 - Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
  • B23K 26/70 - Auxiliary operations or equipment

58.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023016565
Publication Number 2023/223799
Status In Force
Filing Date 2023-04-27
Publication Date 2023-11-23
Owner NIKON CORPORATION (Japan)
Inventor Koida, Keigo

Abstract

The optical system (OL) comprises: a front group (GA) having a positive refractive power; a stop (S); a middle group (GM) having a positive refractive power; and a rear group (GR) having a negative refractive power. When focusing, the middle group (GM) moves along the optical axis, the interval between the front group (GA) and the middle group (GM) changes, and the interval between the middle group (GM) and the rear group (GR) changes, with the following conditional expressions being satisfied. 2.60 < DSE/DM < 3.50 0.80 < fAM/f < 1.00 wherein: DSE : distance on the optical axis from the stop (S) to the lens surface closest to the image surface side, of the rear group (GR); DM : length on the optical axis of the middle group (GM) in the infinity focus state; fAM : composite focal length of the middle group (GM) and the front group (GA) in the infinity focus state; and f : focal length of the optical system (OL) in the infinity focus state

IPC Classes  ?

  • G02B 13/00 - Optical objectives specially designed for the purposes specified below
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

59.

ROBOT DEVICE AND METHOD FOR CONTROLLING SAME

      
Application Number JP2022020479
Publication Number 2023/223410
Status In Force
Filing Date 2022-05-17
Publication Date 2023-11-23
Owner NIKON CORPORATION (Japan)
Inventor Magome Nobutaka

Abstract

A robot device with a robot arm is provided, comprising: a calculation unit that finds a position of the robot arm on a first coordinate system, using detection results from a plurality of displacement sensors; a conversion unit that, when a plurality of reference marks are detected by a mark detection unit, finds a conversion relationship between the position of the robot arm on the first coordinate system and the positions of the reference marks on a second coordinate system; and a control unit that uses the conversion relationship to convert a target position specified on the second coordinate system into the position of the robot arm on the first coordinate system, and controls the position of the robot arm. Calibration of the position of the robot arm can be easily performed.

IPC Classes  ?

  • B25J 13/08 - Controls for manipulators by means of sensing devices, e.g. viewing or touching devices

60.

PROCESSING METHOD AND PROCESSING DEVICE

      
Application Number JP2022020787
Publication Number 2023/223487
Status In Force
Filing Date 2022-05-19
Publication Date 2023-11-23
Owner NIKON CORPORATION (Japan)
Inventor Sato, Shinji

Abstract

This processing method includes: forming a first boundary section, of a plurality of boundary sections, for separating a first section of an object and a second section of the object, by projecting, onto the object, a processing beam from a first direction with respect to the object; and forming a second boundary section, of the plurality of boundary sections, by projecting, onto the object, a processing beam from a second direction with respect to the object.

IPC Classes  ?

  • B23K 26/38 - Removing material by boring or cutting

61.

ROBOT DEVICE AND METHOD FOR CONTROLLING SAME

      
Application Number JP2023015738
Publication Number 2023/223763
Status In Force
Filing Date 2023-04-20
Publication Date 2023-11-23
Owner NIKON CORPORATION (Japan)
Inventor
  • Magome Nobutaka
  • Takayama Yuuya

Abstract

Provided is a robot device comprising: a robot arm which has a specific part, and moves the specific part to a plurality of positions on a first coordinate system that is three-dimensional; a measurement device that measures, on a second coordinate system that is three-dimensional, each position of the specific part at the plurality of positions; a conversion unit that obtains a conversion relationship including a non-linear component between the position of the specific part on the first coordinate system and the position of the specific part on the second coordinate system; and a control unit that converts a position designated on the second coordinate system into a position on the first coordinate system using the conversion relationship, and controls the robot arm on the basis of the resultant position. It is possible to calibrate the position of the robot arm with high accuracy and easily.

IPC Classes  ?

  • B25J 13/08 - Controls for manipulators by means of sensing devices, e.g. viewing or touching devices

62.

MACHINING OPTICAL SYSTEM, MACHINING APPARATUS, METHOD FOR FORMING INTERFERENCE PATTERN, AND MACHINING METHOD

      
Application Number JP2022019994
Publication Number 2023/218579
Status In Force
Filing Date 2022-05-11
Publication Date 2023-11-16
Owner NIKON CORPORATION (Japan)
Inventor Takemoto Takuto

Abstract

The present invention mainly makes it possible to form an interference pattern on the surface of an object without generating chromatic aberration. A machining optical system (2) comprises: a split optical system (27) which splits a machining beam (3) from a light source (7) and emits a first machining beam (21) toward a first direction (24) and a second machining beam (22) toward a second direction (26); a rotary reflection member (36) which has formed therein a first reflection surface (32) for reflecting the first machining beam (21) toward a first reflection direction (31) within a first plane (23) and a second reflection surface (34) for reflecting the second machining beam (22) toward a second reflection direction (33) within a second plane (25); and an interference pattern-forming optical system (39) which deflects the first machining beam (21) and second machining beam (22) from the rotary reflection member (36) so as to cause both beams to be projected onto the surface (4a) of an object (4) in an oblique direction. In this machining optical system (2), the orientations of the first reflection direction (31) and second reflection direction (32) are changed by the rotation of the rotary reflection member (36) so as to cause the periodic direction of an interference pattern (38) to revolve around the axis of the rotary reflection member (36).

IPC Classes  ?

  • B23K 26/067 - Dividing the beam into multiple beams, e.g. multi-focusing
  • B23K 26/082 - Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
  • B23K 26/364 - Laser etching for making a groove or trench, e.g. for scribing a break initiation groove

63.

PROCESSING OPTICAL SYSTEM, PROCESSING DEVICE, AND PROCESSING METHOD

      
Application Number JP2022019996
Publication Number 2023/218581
Status In Force
Filing Date 2022-05-11
Publication Date 2023-11-16
Owner NIKON CORPORATION (Japan)
Inventor Yanagi Tsuyoshi

Abstract

[Problem] To provide a processing optical system, a processing device, and a processing method capable of efficiently utilizing processing light from a processing light source to form interference fringes. [Solution] A processing optical system (15) comprises: a dividing optical member (17) for emitting, from mutually different emission positions, a second group G2 of a plurality of processing light beams EL2 and a third group G3 of a plurality of processing light beams EL3, generated by dividing a first group G1 of a plurality of processing light beams EL from a light source (2); and an interference fringe forming optical system (18) for forming first interference fringes IS1 by causing the second group G2 of the plurality of processing light beams LE2 from the dividing optical member (17) to interfere in a first region A1 on a top surface of an object (W), and forming second interference fringes IS2 by causing the third group G3 of the plurality of processing light beams LE3 from the dividing optical member (17) to interfere in a second region A2, different from the first region A1, on the top surface of the object (W).

IPC Classes  ?

  • B23K 26/364 - Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
  • B23K 26/352 - Working by laser beam, e.g. welding, cutting or boring for surface treatment

64.

PROCESSING OPTICAL SYSTEM, PROCESSING DEVICE, AND PROCESSING METHOD

      
Application Number JP2022019995
Publication Number 2023/218580
Status In Force
Filing Date 2022-05-11
Publication Date 2023-11-16
Owner NIKON CORPORATION (Japan)
Inventor Yanagi Tsuyoshi

Abstract

[Problem] To provide a processing optical system, a processing device, and a processing method that can form an ideally shaped riblet structure. [Solution] A processing optical system (15) comprises: a first optical system (16) that split a processing light EL0 from a light source (2) into a first processing light EL1 and a second processing light EL2; a second optical system (17) that forms a interference fringe IS on a surface of an object (W) by dividing the second processing light EL2 into a plurality of second processing lights EL2 and irradiating the divided plurality of second processing lights EL2 onto the object (W) from different incident directions; and a third optical system (18) that irradiates the first processing light EL1 from the first optical system (16) toward an interference area IA on the surface of the object (W) where an interference fringe IS has been formed.

IPC Classes  ?

  • B23K 26/359 - Working by laser beam, e.g. welding, cutting or boring for surface treatment by providing a line or line pattern, e.g. a dotted break initiation line
  • B23K 26/064 - Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
  • B23K 26/067 - Dividing the beam into multiple beams, e.g. multi-focusing
  • B23K 26/364 - Laser etching for making a groove or trench, e.g. for scribing a break initiation groove

65.

PROCESSING APPARATUS AND PROCESSING METHOD

      
Application Number JP2022019997
Publication Number 2023/218582
Status In Force
Filing Date 2022-05-11
Publication Date 2023-11-16
Owner NIKON CORPORATION (Japan)
Inventor Yanagi Tsuyoshi

Abstract

The present invention can adjust the pitch of interference fringes mainly. The present invention relates to a processing apparatus (1) that processes a surface (4a) of an object (4) by using a light beam (3) from a light source (2). The processing apparatus (1) comprises: a light splitting member (13) that splits the light beam (3) from the light source (2) into a plurality of light beams (11, 12) traveling in mutually different directions; and a first optical system (15) that forms interference fringes (14) by allowing the plurality of light beams (11, 12) split by the light splitting member (13) to pass therethrough and irradiating the surface (4a) of the object (4) with the superimposed light beams. The processing apparatus also includes a second optical system (19) that is arranged in a space (16) between the light splitting member (13) and the first optical system (15) to be movable along an optical axis (17) of the first optical system (15) and that adjusts the pitch of the interference fringes (14) by changing the intersection angle (18) of the plurality of light beams (11, 12) propagating from the first optical system (15) to the surface (4a) of the object (4).

IPC Classes  ?

  • B23K 26/06 - Shaping the laser beam, e.g. by masks or multi-focusing

66.

SYSTEMS AND METHODS FOR PROJECTING ADJUSTABLE INTERFERENCE FRINGES

      
Application Number US2023020661
Publication Number 2023/215268
Status In Force
Filing Date 2023-05-02
Publication Date 2023-11-09
Owner NIKON CORPORATION (Japan)
Inventor
  • Takemoto, Takuto
  • Smith, Daniel Gene

Abstract

Techniques are disclosed that project adjustable fringes (162, 164) in laser interferometry systems (100). The techniques utilize a light source (110) to project substantially collimated source light (112) received by a beam splitter (120) that splits the source light (112) into first and second beams (122, 124) of light. The first and second beams (122, 124) of light are received by a deflection module (130) that imparts an adjustable shear between the first and second beams (122, 124) of light. At least one focusing optical element (140) receives and directs the first and second beams (122, 124) of light to overlap on a surface (150). This results in an interference pattern between the first and second beams (122, 124) of light being formed on the surface (150). The interference pattern may be used to bum or ablate portions of the surface (150) or a plane below the surface (150) at points of high optical intensity in the interference pattern, thereby creating the desired pattern on or below the surface (150).

IPC Classes  ?

  • B23K 26/0622 - Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
  • B23K 26/06 - Shaping the laser beam, e.g. by masks or multi-focusing
  • B23K 26/067 - Dividing the beam into multiple beams, e.g. multi-focusing
  • B23K 26/362 - Laser etching

67.

SYSTEMS AND METHODS FOR MONITORING SPATIAL LIGHT MODULATOR (SLM) FLARE

      
Application Number US2023020717
Publication Number 2023/215310
Status In Force
Filing Date 2023-05-02
Publication Date 2023-11-09
Owner NIKON CORPORATION (Japan)
Inventor
  • Koo, Shiang-Lung
  • Yuan, Bausan

Abstract

The problem of the presence of excess flare in maskless photolithography systems is addressed by systems and methods that utilize an aerial imaging system to monitor flare associated with the maskless photolithography systems.

IPC Classes  ?

  • G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

68.

CONTROL DEVICE, CONTROL SYSTEM, ROBOT SYSTEM, CONTROL METHOD, AND COMPUTER PROGRAM

      
Application Number JP2022019364
Publication Number 2023/209974
Status In Force
Filing Date 2022-04-28
Publication Date 2023-11-02
Owner NIKON CORPORATION (Japan)
Inventor
  • Koyanagi, Daisuke
  • Yokota, Shoya

Abstract

This control device generates a control signal for controlling a robot arm comprising: a processing device that processes an object; a first imaging device that outputs first image data; and a second imaging device that outputs second image data. The control device: generates first information indicating a position and an attitude of the object, by using the first image data generated by the first imaging device capturing an image of the object; generates second information indicating a position and an attitude of the object, by using three-dimensional position data that is generated from the second image data generated by the second imaging device capturing an image of the object, and that indicates the respective three-dimensional positions of a plurality of points of the object, and three-dimensional model data of the object in the position and attitude determined on the basis of the first information; and generates the control signal on the basis of the second information.

IPC Classes  ?

  • B25J 13/08 - Controls for manipulators by means of sensing devices, e.g. viewing or touching devices

69.

FLEXIBLE ACCELEROMETER CONFIGURED TO DETECT THRESHOLD ACCELERATION

      
Application Number US2022026481
Publication Number 2023/211431
Status In Force
Filing Date 2022-04-27
Publication Date 2023-11-02
Owner NIKON CORPORATION (Japan)
Inventor Pang, Henry Kin Heng

Abstract

The problems of high costs and lack of flexibility in accelerometers is addressed by inexpensive flexible threshold accelerometer systems and methods for manufacturing them. The accelerometer systems are generally formed from a flexible substrate such as polyethylene terephthalate (PET). The accelerometers generally utilize a proof mass coupled to an electrical ground. The proof mass is generally separated from one or more contact points on an electrical output by some distance. When the accelerometer experiences an impulse, the proof mass moves toward a contact point in response to the impulse. If the impulse exceeds a threshold (the threshold acceleration to which the accelerometer is sensitive), the proof mass makes contact with the contact point, generating an electrical signal. The electrical signal is detected by a controller or an indicator, which registers an indication that the impulse exceeded the threshold acceleration. In this manner, harmful events can be quickly detected.

IPC Classes  ?

  • G01P 15/08 - Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces with conversion into electric or magnetic values

70.

IMAGE FORMATION LENS AND MICROSCOPE DEVICE

      
Application Number JP2023014513
Publication Number 2023/210318
Status In Force
Filing Date 2023-04-10
Publication Date 2023-11-02
Owner NIKON CORPORATION (Japan)
Inventor Takagi, Hidetsugu

Abstract

An image formation lens (1L) for a microscope has a negative lens, and a positive lens (L13) that satisfies the following conditional expressions. -0.002×(νdP-35)+0.602-θgFP < 0 and 23 < νdP < 65 where νdP is the Abbe number of the positive lens, and θgFP is the partial dispersion ratio of the positive lens, and is defined by the following expression: θgFP = (ngP-nFP)/(nFP-nCP) where ngP is the refractive index for the g line of the positive lens, nFP is the refractive index for the F line of the positive lens, and nCP is the refractive index for the C line of the positive lens.

IPC Classes  ?

  • G02B 21/02 - Objectives
  • G02B 13/00 - Optical objectives specially designed for the purposes specified below

71.

PROCESSING SYSTEM AND MEASUREMENT SYSTEM

      
Application Number JP2022017814
Publication Number 2023/199473
Status In Force
Filing Date 2022-04-14
Publication Date 2023-10-19
Owner NIKON CORPORATION (Japan)
Inventor
  • Ichinose, Go
  • Kusu, Shunta

Abstract

This processing system comprises a processing device capable of processing an object by radiating a processing beam at the object, a measurement device capable of measuring the positions of the object and the processing device, and a control device capable of controlling the processing device. The processing device comprises a first movement device capable of changing the position of a processing head for emitting the processing beam, and a second movement device on which the first movement device is placed and that is capable of moving with the first movement device. The control device controls the movement by the second movement device on the basis of the result of measurement by the measurement device and model information pertaining to the shape of the object.

IPC Classes  ?

  • B23K 26/08 - Devices involving relative movement between laser beam and workpiece

72.

COMPRESSION AND TENSION VIBRATION REDUCER ASSEMBLY

      
Application Number US2023018435
Publication Number 2023/200919
Status In Force
Filing Date 2023-04-13
Publication Date 2023-10-19
Owner NIKON CORPORATION (Japan)
Inventor
  • Jeong, Yoon, Jung
  • Bjork, Matthew, Parker-Mccormick

Abstract

A vibration reducer assembly (1006) for connecting a first object (2) to a second object (4) includes a first vibration reducer (1006A) and a second vibration reducer (1006B). The first vibration reducer (1006A) couples the first object (2) to the second object (4) and reduces a magnitude of a vibration being transferred to the second object (4). The first vibration reducer (1006A) is configured to inhibit the second object (4) from moving towards the first object (2) by providing a compression force on the second object (4). The second vibration reducer (1006B) couples the first object (2) to the second object (4) and reduces a magnitude of a vibration being transferred to the second object (4). The second vibration reducer (1006B) is configured to inhibit the second object (4) from moving away from the first object (2) by providing a tension force on the second object (4).

IPC Classes  ?

  • F16F 15/04 - Suppression of vibrations of non-rotating, e.g. reciprocating, systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating system using elastic means
  • F16F 15/073 - Suppression of vibrations of non-rotating, e.g. reciprocating, systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating system using elastic means with metal springs using only leaf springs

73.

DETECTING DEVICE, DETECTING METHOD, AND DETECTING PROGRAM

      
Application Number JP2023006594
Publication Number 2023/199617
Status In Force
Filing Date 2023-02-22
Publication Date 2023-10-19
Owner NIKON CORPORATION (Japan)
Inventor
  • Watanabe Hirotada
  • Hayashi Yuki
  • Otani Naoya

Abstract

Provided is a detecting device for performing image analysis of a microscope image of cells to detect a stained first cell and non-stained second cell included in the microscope image, the detecting device including a region discriminating unit for discriminating between a cell region and a background region in the microscope image on the basis of brightness, and a cell discriminating unit for discriminating between the first cell and the second cell in the cell region on the basis of hue, wherein a brightness threshold used to discriminate between the cell region and the background region can be adjusted by a user, and a hue threshold used to discriminate between the first cell and the second cell can be adjusted by the user.

IPC Classes  ?

  • G01N 33/48 - Biological material, e.g. blood, urine; Haemocytometers

74.

PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHODS FOR MANUFACTURING SAME

      
Application Number JP2023009242
Publication Number 2023/199668
Status In Force
Filing Date 2023-03-10
Publication Date 2023-10-19
Owner NIKON CORPORATION (Japan)
Inventor
  • Hayashi Kento
  • Miyagi Shigehiko
  • Yagami Takashi
  • Ozawa Takashi

Abstract

This phase shift mask blank has: a substrate; and a first layer that is deposited on the substrate. The first layer contains zirconium (Zr), silicon (Si), and nitrogen (N). The transmittance of the first layer at a thickness at which a 180° phase shift is imparted to light having a wavelength of 365 nm is 4-40%.

IPC Classes  ?

  • G03F 1/32 - Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
  • G03F 1/58 - Absorbers, e.g. opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
  • G03F 1/80 - Etching
  • C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material

75.

IMAGE PROCESSING METHOD, IMAGE PROCESSING DEVICE, AND PROGRAM

      
Application Number JP2023014303
Publication Number 2023/199847
Status In Force
Filing Date 2023-04-06
Publication Date 2023-10-19
Owner NIKON CORPORATION (Japan)
Inventor
  • Tanabe, Yasushi
  • Kasai, Hiroshi
  • Ji, Yuanting

Abstract

An image processing method carried out by a processor, wherein the image processing method includes a step in which an image of a choroid is acquired, a step in which enhancement processing for enhancing the contrast of the acquired image is performed, a step in which the image subjected to the enhancement processing is subjected to binarization processing, and a step in which an area corresponding to choroidal vessels in the choroid is extracted from the image subjected to the binarization processing.

IPC Classes  ?

  • A61B 3/12 - Objective types, i.e. instruments for examining the eyes independent of the patients perceptions or reactions for looking at the eye fundus, e.g. ophthalmoscopes
  • A61B 3/10 - Objective types, i.e. instruments for examining the eyes independent of the patients perceptions or reactions

76.

IMAGE PROCESSING METHOD, IMAGE PROCESSING DEVICE, AND PROGRAM

      
Application Number JP2023014304
Publication Number 2023/199848
Status In Force
Filing Date 2023-04-06
Publication Date 2023-10-19
Owner NIKON CORPORATION (Japan)
Inventor
  • Ji, Yuanting
  • Tanabe, Yasushi
  • Kasai, Hiroshi

Abstract

Provided is an image processing method that is performed by a processor, the image processing method comprising: a step for acquiring OCT volume data including a choroid; a step for generating, on the basis of the OCT volume data, a plurality of en-face images corresponding to a plurality of planes that differ in depth; a step for deriving image features for each of the plurality of en-face images; and a step for determining, as boundaries, lines between en-face images that show changes in the presence or absence of choroidal blood vessels through the image features, on the basis of each of the image features.

IPC Classes  ?

  • A61B 3/10 - Objective types, i.e. instruments for examining the eyes independent of the patients perceptions or reactions
  • A61B 3/12 - Objective types, i.e. instruments for examining the eyes independent of the patients perceptions or reactions for looking at the eye fundus, e.g. ophthalmoscopes
  • G06T 7/00 - Image analysis

77.

MACHINING METHOD, MACHINING SYSTEM, AND INFORMATION ACQUIRING METHOD

      
Application Number JP2022017163
Publication Number 2023/195095
Status In Force
Filing Date 2022-04-06
Publication Date 2023-10-12
Owner NIKON CORPORATION (Japan)
Inventor
  • Takiguchi, Norihito
  • Nakaune, Yusuke
  • Watanabe, Shun
  • Endo, Yu
  • Kimura, Yuji
  • Nakagawa, Tomoya

Abstract

This machining method is a method for machining a workpiece that is held by a holding tool, the method involving: acquiring holding tool information pertaining to the position, in a machining coordinate system, of a reference portion of the holding tool placed in a machining device; installing the holding tool in a measuring device; using the measuring device to acquire measurement information that includes information pertaining to the three-dimensional shape of the workpiece on the holding tool in the measurement coordinate system and information pertaining to the position of the reference portion in the measurement coordinate system; generating machining path information on the basis of the holding tool information and the measurement information; placing the holding tool taken out from the measuring device in the machining device; and machining the workpiece on the holding tool placed in the machining device, on the basis of the machining path information.

IPC Classes  ?

  • B23K 26/342 - Build-up welding
  • B23K 26/08 - Devices involving relative movement between laser beam and workpiece
  • B23K 26/10 - Devices involving relative movement between laser beam and workpiece using a fixed support
  • B23K 26/34 - Laser welding for purposes other than joining

78.

OPTICAL SYSTEM, OPTICAL APPARATUS, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023012224
Publication Number 2023/195372
Status In Force
Filing Date 2023-03-27
Publication Date 2023-10-12
Owner NIKON CORPORATION (Japan)
Inventor Kurashige, Takamichi

Abstract

This optical system, having a first negative lens having a negative refractive power, a second negative lens having a negative refractive power, and a rear group in the stated order from an object side, is configured so as to satisfy all of the following conditional expressions: 5.60 < TL/f < 13.00, 0.30 < f1/f2 < 2.00, 1.66 < Nave12 < 2.20, and 80.00 < 2ω, where TL is the total length of the optical system, f is the focal length of the optical system overall, f1 is the focal length of the first negative lens, f2 is the focal length of the second negative lens, Nave12 is the average of the refractive indices of the first negative lens and the second negative lens, and 2ω is the total angle of view of the optical system.

IPC Classes  ?

  • G02B 13/04 - Reversed telephoto objectives
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

79.

FLEXIBLE MICROELECTRODE ARRAYS

      
Application Number US2022023291
Publication Number 2023/195970
Status In Force
Filing Date 2022-04-04
Publication Date 2023-10-12
Owner NIKON CORPORATION (Japan)
Inventor
  • Hashemi, Fardad Ali
  • Qin, Wan

Abstract

The problems of high costs and lack of flexibility in microelectrode arrays (MEAs) is addressed by the inexpensive flexible MEA systems and methods for manufacturing them presented herein. The MEA systems described herein are generally formed from a flexible substrate such as poly dimethyl siloxane (PDMS). The flexible substrate generally comprises a series of wells and channels patterned therein. The wells and channels are filled with a conductive flexible material such as a mixture of PDMS and carbon nanotubes (CNTs) to form sets of microelectrodes, microelectrode leads, and contact pads therein. The resulting MEA systems may be substantially more flexible and less expensive than prior MEA systems. The MEA systems presented herein may be manufactured using a variety of soft lithography techniques described herein.

IPC Classes  ?

80.

SYSTEM AND APPROVING METHOD, INFORMATION ACQUISITION SYSTEM AND INFORMATION ACQUISITION METHOD, SHAPE ACQUISITION SYSTEM AND SHAPE ACQUISITION METHOD, AND MONITORING METHOD

      
Application Number JP2023013824
Publication Number 2023/195448
Status In Force
Filing Date 2023-04-03
Publication Date 2023-10-12
Owner NIKON CORPORATION (Japan)
Inventor Miyawaki Takashi

Abstract

iii) that measures inclination information about the member to be measured. The server (12) then receives sensor data from the sensor device and creates display data for displaying information about the current shape and the design shape of the member to be measured, on the basis of shape data about the member to be measured and design data about the member to be measured, the shape data being obtained from the sensor data. The server (12) then transmits the display data to the terminal device having made the inquiry, along with a display instruction command.

IPC Classes  ?

  • G01C 9/00 - Measuring inclination, e.g. by clinometers, by levels
  • G01C 9/04 - Transmission means between sensing element and final indicator for giving an enlarged reading
  • G08C 17/00 - Arrangements for transmitting signals characterised by the use of a wireless electrical link
  • G06Q 50/08 - Construction
  • G06F 30/13 - Architectural design, e.g. computer-aided architectural design [CAAD] related to design of buildings, bridges, landscapes, production plants or roads
  • E04G 21/14 - Conveying or assembling building elements
  • E04G 21/18 - Adjusting tools; Templates
  • G01B 7/28 - Measuring arrangements characterised by the use of electric or magnetic techniques for measuring contours or curvatures

81.

PROCESSING DEVICE

      
Application Number JP2022015889
Publication Number 2023/188082
Status In Force
Filing Date 2022-03-30
Publication Date 2023-10-05
Owner NIKON CORPORATION (Japan)
Inventor
  • Funatsu, Takayuki
  • Kawabe, Yoshio
  • Shinozaki, Ryo

Abstract

This processing device comprises: an irradiation optical system that is capable of irradiating an object with first processing light emitted from a first light source, and second processing light emitted from a second light source different from the first light source and having a different peak wavelength from the first processing light; and a material supply member that is capable of supplying a build material to a molten pool formed by the first and second processing light. The peak wavelength of the second processing light is shorter than the peak wavelength of the first processing light. A second region irradiated with the second processing light is broader than a first region irradiated with the first processing light.

IPC Classes  ?

  • B23K 26/046 - Automatically focusing the laser beam
  • B23K 26/064 - Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
  • B23K 26/073 - Shaping the laser spot
  • B23K 26/342 - Build-up welding

82.

REFLECTIVE BRIGHT-FIELD MICROSCOPE, OBSERVATION METHOD, AND PROGRAM

      
Application Number JP2022016018
Publication Number 2023/188117
Status In Force
Filing Date 2022-03-30
Publication Date 2023-10-05
Owner NIKON CORPORATION (Japan)
Inventor
  • Fukutake Naoki
  • Ikeda Satoshi

Abstract

A reflective bright-field microscope 100 according to the present embodiment comprises: an illumination optical system 10, which has an objective lens 31 and an aperture pattern turret 16 capable of forming a plurality of annular illumination beams 10a having mutually different annular zone radii and which illuminates a sample S with the illumination beams 10a; a detection optical system 30, which focuses first reflected light from the sample S and second reflected light from an interface around the sample S to an imaging device 35, through the objective lens 31; and a control unit 50. Using each of the plurality of annular illumination beams 10ai formed by control of the aperture pattern turret 16 by the control unit 50, the imaging device 35 detects the first reflected light and the second reflected light at each of a plurality of positions for which the relative positions of the objective lens 31 and the sample S are different.

IPC Classes  ?

  • G02B 21/12 - Condensers affording bright-field illumination
  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes

83.

OPTICAL GLASS, OPTICAL ELEMENT, INTERCHANGEABLE LENS FOR CAMERA, OBJECTIVE LENS FOR MICROSCOPE, CEMENTED LENS, OPTICAL SYSTEM, OPTICAL DEVICE, REFLECTIVE ELEMENT, AND POSITION MEASURING DEVICE

      
Application Number JP2023006625
Publication Number 2023/189051
Status In Force
Filing Date 2023-02-24
Publication Date 2023-10-05
Owner NIKON CORPORATION (Japan)
Inventor Koide Tetsuya

Abstract

223232333.

IPC Classes  ?

  • C03C 3/14 - Silica-free oxide glass compositions containing boron
  • C03C 3/12 - Silica-free oxide glass compositions
  • C03C 3/145 - Silica-free oxide glass compositions containing boron containing aluminium or beryllium
  • C03C 3/15 - Silica-free oxide glass compositions containing boron containing rare earths
  • C03C 3/155 - Silica-free oxide glass compositions containing boron containing rare earths containing zirconium, titanium, tantalum or niobium
  • G02B 1/00 - Optical elements characterised by the material of which they are made; Optical coatings for optical elements

84.

SHAPING SYSTEM, RADIATION CONDITION SETTING METHOD, INPUT SYSTEM, COMPUTER PROGRAM, AND RECORDING MEDIUM

      
Application Number JP2022015524
Publication Number 2023/188005
Status In Force
Filing Date 2022-03-29
Publication Date 2023-10-05
Owner NIKON CORPORATION (Japan)
Inventor
  • Funatsu, Takayuki
  • Murata, Hiromichi

Abstract

A shaping system according to the present invention comprises: a shaping device capable of shaping a shaped article by supplying a shaping material to a weld pool formed in an object by a first and/or second shaping beam; and a control device capable of controlling the shaping device. The control device controls the shaping device such that an input screen that can be operated by a user is displayed in order to designate a first radiation condition for the first shaping beam and a second radiation condition for the second shaping beam, and such that the first and second shaping beams are radiated onto the object by respectively using the first and second radiation conditions designated by the user by using the input screen.

IPC Classes  ?

  • B22F 12/45 - Two or more
  • B22F 12/49 - Scanners
  • B29C 64/277 - Arrangements for irradiation using multiple radiation means, e.g. micromirrors or multiple light-emitting diodes [LED]
  • B33Y 10/00 - Processes of additive manufacturing
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes

85.

ANALYSIS SYSTEM, LIGHT EXPOSURE METHOD, LIGHT EXPOSURE APPARATUS, AND DEVICE

      
Application Number JP2023009394
Publication Number 2023/189435
Status In Force
Filing Date 2023-03-10
Publication Date 2023-10-05
Owner NIKON CORPORATION (Japan)
Inventor
  • Miyazaki, Seiji
  • Higuchi, Kiyoshi
  • Sawaoka, Yosuke
  • Kimura, Michihiro

Abstract

This analysis system comprises: a first measurement unit for measuring first information items that are pattern information items of a first pattern on a first substrate; a storage unit for storing the first information items measured by the first measurement unit; a second measurement unit for measuring second information items that are pattern information items of a second pattern formed on a second substrate through light exposure; and a determination unit for selecting, on the basis of the second information items and the first information items stored in the storage unit, a third information item that is a first information item, among the first information items, satisfying a predetermined condition and for determining, on the basis of the third information item, a first light exposure condition for forming, through light exposure, a third pattern on the second pattern of the second substrate. 

IPC Classes  ?

  • G03F 9/00 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
  • G03F 7/20 - Exposure; Apparatus therefor

86.

TRANSPORT DEVICE, EXPOSURE DEVICE, TRANSPORT METHOD, EXPOSURE METHOD, AND ALIGNMENT MARK

      
Application Number JP2023011720
Publication Number 2023/190110
Status In Force
Filing Date 2023-03-24
Publication Date 2023-10-05
Owner NIKON CORPORATION (Japan)
Inventor
  • Kanamaru Yuki
  • Kuroiwa Daisuke
  • Morisaki Yoshitake
  • Ohkawa Tomoyuki
  • Hirose Masaaki
  • Ushijima Yasuyuki
  • Wakabayashi Masahiro

Abstract

Provided is a transport device (20) comprising an alignment mechanism (22) which positions each of a plurality of substrates (P) arranged on a holding unit (21) with respect to the holding unit (21), a suction mechanism (23) which causes the plurality of substrates (P) to be suctioned on the holding unit (21), and a transport mechanism (24) which transports the holding unit (21) to an exposure device.

IPC Classes  ?

  • G03F 9/00 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
  • H01L 21/68 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for positioning, orientation or alignment

87.

OPTICAL SYSTEM, OPTICAL APPARATUS, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023011961
Publication Number 2023/190222
Status In Force
Filing Date 2023-03-24
Publication Date 2023-10-05
Owner NIKON CORPORATION (Japan)
Inventor
  • Makida, Ayumu
  • Toshi, Taeko

Abstract

This optical system comprising a first lens group, an aperture diaphragm, and a rear group in the stated order from an object side, the rear group having a first doublet lens comprising a positive lens and a negative lens, is configured so as to satisfy all of the following conditions: 0.350 < Bf/y < 0.700, 1.350 < TL/y < 2.000, and 0.050 < Np1 – Nn1 < 0.400, where Bf is the back focal distance as an air conversion length, y is the maximum image height, TL is the distance from the lens surface closest to the object to the image plane, NP1 is the refractive index of the positive lens constituting the first doublet lens, and Nn1 is the refractive index of the negative lens constituting the first doublet lens.

IPC Classes  ?

  • G02B 13/00 - Optical objectives specially designed for the purposes specified below
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

88.

VARIABLE MAGNIFICATION OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING VARIABLE MAGNIFICATION OPTICAL SYSTEM

      
Application Number JP2023012935
Publication Number 2023/190739
Status In Force
Filing Date 2023-03-29
Publication Date 2023-10-05
Owner NIKON CORPORATION (Japan)
Inventor Ono, Takuro

Abstract

A variable magnification optical system comprising, in order from the object side, a first lens group, a second lens group, a third lens group, and a rear group is configured such that when magnification is changed, the distances between adjacent lens groups change, at a predetermined imaging distance, the variable magnification optical system has a plurality of focused states with different aberration amounts, the rear group has a first focusing lens group that moves during focusing, and a second focusing lens group that is disposed closer to the image side than the first focusing lens group, and moves along a trajectory different from that of the first focusing lens group during focusing, and during the transition from one focused state to another focused state at the predetermined imaging distance, the first focusing lens group and the second focusing lens group move, and satisfy the following conditional expression. -6.80 < f1/f2 < -0.05 where f1 is the focal length of the first lens group, and f2 is the focal length of the second lens group.

IPC Classes  ?

  • G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

89.

IMAGE PROCESSING METHOD AND IMAGE PROCESSING DEVICE

      
Application Number JP2022013246
Publication Number 2023/181129
Status In Force
Filing Date 2022-03-22
Publication Date 2023-09-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Tamoto, Ryo
  • Iwasa, Akio
  • Yokoyama, Kaede
  • Murakami, Masataka

Abstract

[Problem] To generate a plurality of correct answer images each for each structure from a labeled image. [Solution] Provided is an image processing method including: a labeled image acquiring step for acquiring a labeled image of a biological sample containing a plurality of labeled structures; a binarized image generating step for binarizing the labeled image to generate a binarized image; and a correct answer image acquiring step for inputting an unknown labeled image into a learned model that has been caused to learn using the labeled images and the binarized images corresponding to the labeled images, thereby acquiring, as a correct answer image, a binarized image in which the structure in the unknown labeled image appears plausibly.

IPC Classes  ?

90.

CORRECTION APPARATUS, EXPOSURE APPARATUS, COATER/DEVELOPER APPARATUS, EXPOSURE SYSTEM, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

      
Application Number JP2022014471
Publication Number 2023/181367
Status In Force
Filing Date 2022-03-25
Publication Date 2023-09-28
Owner NIKON CORPORATION (Japan)
Inventor Ichinose Go

Abstract

This correction apparatus comprises: a placement apparatus on which a wafer is placed; a heating unit that heats the wafer placed on the placement apparatus; a force providing unit that provides a force to the wafer placed on the placement apparatus; a first transfer apparatus that transfers the wafer that has been removed from the placement apparatus; and a control unit that controls the heating unit and the force providing unit. The control unit applies a force to the wafer by means of the force providing unit, while heating the wafer by means of the heating unit, to thereby subject the wafer to shape correction. The first transfer apparatus transfers the wafer that has been subjected to shape correction.

IPC Classes  ?

  • H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping

91.

FLEXIBLE SKIN SENSORS FOR SKIN HYDRATION MEASUREMENTS

      
Application Number US2023015984
Publication Number 2023/183440
Status In Force
Filing Date 2023-03-22
Publication Date 2023-09-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Kito, Yoshiaki
  • Hashemi, Fardad Ali

Abstract

The problem of inconvenient, inaccurate measurement of hydration of the stratum corneum (SC) skin layer is addressed by systems and methods that employ two-dimensional, tightly-spaced arrays of surface electrodes fabricated on a flexible substrate. The systems and methods generally utilize a plurality of cathodes and a plurality of anodes arranged in first and second arrays, respectively, on a flexible substrate. The plurality of cathodes and the plurality of anodes are arranged to form a plurality of anode-cathode pairs. The cathodes and the anodes are electrically coupled to a plurality of cathode electrical leads and a plurality of anode electrical leads, respectively. A controller is electrically coupled to the plurality of cathode electrical leads and the plurality of anode electrical leads and configured to measure a plurality of impedances or conductances between the plurality of cathode-anode pairs.

IPC Classes  ?

  • A61B 5/00 - Measuring for diagnostic purposes ; Identification of persons
  • A61B 5/0537 - Measuring body composition by impedance, e.g. tissue hydration or fat content

92.

LIGHT EMITTING DEVICE AND OPTICAL WIRELESS COMMUNICATION SYSTEM

      
Application Number JP2022014533
Publication Number 2023/181375
Status In Force
Filing Date 2022-03-25
Publication Date 2023-09-28
Owner NIKON CORPORATION (Japan)
Inventor Shibazaki Yuichi

Abstract

This light emitting device emits an emission beam from a light generation device onto an object. The light emitting device includes: an image forming optical system; an optical member that emits, toward an image plane of the image forming optical system, light which enters through the image forming optical system, and that emits the emission beam from the light generation device which enters through a conjugate plane conjugate with the image plane, toward the image forming optical system; an imaging device that captures at least a portion of an image of an object formed on the image plane by the image forming optical system; a position changing device that changes the position on the conjugate plane of the emission beam from the light generation device to change an emission position of the emission beam emitted from the image forming optical system; and a control device that controls the position changing device on the basis of imaging results of the imaging device. The control device controls the position changing device on the basis of the imaging results of the imaging device to emit the emission beam emitted from the image forming optical system onto at least a portion of the object.

IPC Classes  ?

  • H04B 10/11 - Arrangements specific to free-space transmission, i.e. transmission through air or vacuum

93.

VARIABLE MAGNIFICATION OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING VARIABLE MAGNIFICATION OPTICAL SYSTEM

      
Application Number JP2023008475
Publication Number 2023/181903
Status In Force
Filing Date 2023-03-07
Publication Date 2023-09-28
Owner NIKON CORPORATION (Japan)
Inventor
  • Sashima Tomoyuki
  • Saito Yuma

Abstract

Provided is a small-size and lightweight variable magnification optical system suitable for moving image photography and capable of obtaining excellent optical performance, an optical device, and a method for manufacturing the variable magnification optical system. A variable magnification optical system ZL for use in an optical device such as a camera 1 includes, in order from the object side: a first lens group G1 having negative refractive power; a second lens group G2 having positive refractive power; a third lens group G3; and a fourth lens group G4 having positive refractive power. During zooming, the distance between adjacent lens groups changes, the first lens group G1 is fixed with respect to the image plane, and the fourth lens group G4 moves along the optical axis. During focusing, at least the second lens group G2 moves along the optical axis and satisfies a condition represented by a predetermined conditional expression.

IPC Classes  ?

  • G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

94.

IMAGE PROCESSING METHOD, IMAGE PROCESSING DEVICE, OPHTHALMOLOGICAL DEVICE, AND PROGRAM

      
Application Number JP2023009452
Publication Number 2023/182011
Status In Force
Filing Date 2023-03-10
Publication Date 2023-09-28
Owner
  • NIKON CORPORATION (Japan)
  • UNIVERSITY OF TSUKUBA (Japan)
Inventor
  • Fukutake, Naoki
  • Yasuno, Yoshiaki
  • Makita, Shuichi

Abstract

This image processing device emits light from a light source onto an examined eye through an optical system of a first numerical aperture, and acquires information indicating interference light obtained by detecting interference light between signal light, in which light returning from the examined eye owing to the light emitted thereon is transmitted through an optical system of a second numerical aperture, and reference light, which is a division of light from the light source (S200). A first process (S202) is performed for projecting information indicating the interference light to a four-dimensional frequency aperture that is on a four-dimensional space of the light source frequency and the frequency of light from the examined eye owing to the signal light, and is formed by the optical system of the first numerical aperture and the optical system of the second numerical aperture. A second process (S204) is performed for projecting the projected information to a three-dimensional space.

IPC Classes  ?

  • A61B 3/10 - Objective types, i.e. instruments for examining the eyes independent of the patients perceptions or reactions
  • G01N 21/17 - Systems in which incident light is modified in accordance with the properties of the material investigated

95.

SYSTEMS AND METHODS FOR MEASURING LAYER TOPOGRAPHY IN THREE-DIMENSIONAL PRINTING PROCESSES

      
Application Number US2023016139
Publication Number 2023/183524
Status In Force
Filing Date 2023-03-23
Publication Date 2023-09-28
Owner NIKON CORPORATION (Japan)
Inventor Goldstein, Goldie Lynne

Abstract

The problem of non-ideal layer geometry in 3D printing processes is addressed by systems and methods that employ laser triangulation measurements in the vicinity of the melt pool. The systems and methods generally direct one or more lasers at one or more locations along or perpendicular to a direction of travel of a 3D printing energy source. The one or more lasers are reflected from the one or more locations and received by an optical detector, which generates one or more signals in response to receiving the one or more reflected lasers. The signals are received by a controller, which determines one or more heights of the surfaces at the one or more locations based on the one or more signals. The lasers are scanned across a layer of a 3D printed part to obtain the height of the surface across the layer.

IPC Classes  ?

  • B22F 10/37 - Process control of powder bed aspects, e.g. density
  • B22F 12/45 - Two or more
  • B22F 12/90 - Means for process control, e.g. cameras or sensors
  • B29C 64/277 - Arrangements for irradiation using multiple radiation means, e.g. micromirrors or multiple light-emitting diodes [LED]
  • B33Y 30/00 - ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING - Details thereof or accessories therefor
  • B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
  • G01B 9/00 - Measuring instruments characterised by the use of optical techniques
  • G01B 11/30 - Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces

96.

OPTICAL SYSTEM, OPTICAL APPARATUS, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023008050
Publication Number 2023/176512
Status In Force
Filing Date 2023-03-03
Publication Date 2023-09-21
Owner NIKON CORPORATION (Japan)
Inventor
  • Sashima, Tomoyuki
  • Machida, Kosuke

Abstract

An optical system (OL) comprises a front group (GA), an intermediate group (GM), and a rear group (GR). The intermediate group (GM) comprises a first focusing lens group (GF1) and a second focusing lens group (GF2). During focusing, the first focusing lens group (GF1) and the second focusing lens group (GF2) move along the optical axis on different trajectories from each other. The front group (GA) and the rear group (GR) are fixed in relation to an image plane (I). The rear group (GR) has a negative lens disposed closest to the image plane. The following conditional formula is satisfied. Conditional formula: 0.01

IPC Classes  ?

  • G02B 13/00 - Optical objectives specially designed for the purposes specified below
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

97.

OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM

      
Application Number JP2023008051
Publication Number 2023/176513
Status In Force
Filing Date 2023-03-03
Publication Date 2023-09-21
Owner NIKON CORPORATION (Japan)
Inventor Machida, Kosuke

Abstract

This optical system (OL) comprises: an object-side lens group (GA) having positive refractive power; at least one focusing lens group (GF1, GF2) having positive refractive power; and a rear lens group (GR). During focusing, the at least one focusing lens group moves along an optical axis, the object-side lens group (GA) and the rear lens group (GR) are fixed with respect to an image surface (I). The optical system further comprises an aperture stop (S) disposed closer to the image surface side than the object-side lens group (GA), and satisfies the conditional expressions below. 1.00 < Da/f < 2.00 1.70 < (-fa)/f < 4.00 (where f is the focal distance of the optical system (OL) in an infinity focusing state, Da is the distance on the optical axis from the aperture stop (S) to the image surface (I) in the infinity focusing state, and fa is the focal distance of a first lens (La) disposed closest to the object side of the object-side lens group (GA).)

IPC Classes  ?

  • G02B 13/02 - Telephoto objectives, i.e. systems of the type + – in which the distance from the front vertex to the image plane is less than the equivalent focal length
  • G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

98.

MEASUREMENT DEVICE, ROBOT SYSTEM, MANAGEMENT METHOD, TARGET MEMBER, AND MEASUREMENT METHOD

      
Application Number JP2022010673
Publication Number 2023/170877
Status In Force
Filing Date 2022-03-10
Publication Date 2023-09-14
Owner NIKON CORPORATION (Japan)
Inventor Miyakawa Tomoki

Abstract

A measurement device according to the present invention is a measurement device that measures a position of a movable robot, and a position in a rotational direction. The measurement device includes a radiating unit that is capable of radiating measurement light to each of at least three reflecting elements attached to a robot, a photoreceptor that is capable of receiving reflected light reflected by each of the three reflecting elements, and a position acquiring unit that acquires, on the basis of a result of light received by the photoreceptor, positional information relating to a first axis of the robot, positional information relating to a second axis that intersects the first axis, positional information relating to a third axis that intersects the first axis and the second axis, information relating to a position in a rotational direction about the first axis, information relating to a position in a rotational direction about the second axis, and information relating to a position in a rotational direction about the third axis.

IPC Classes  ?

  • B25J 9/10 - Programme-controlled manipulators characterised by positioning means for manipulator elements
  • B25J 19/02 - Sensing devices
  • G01B 11/00 - Measuring arrangements characterised by the use of optical techniques
  • G01B 11/26 - Measuring arrangements characterised by the use of optical techniques for testing the alignment of axes

99.

IMAGING DEVICE AND IMAGING METHOD

      
Application Number JP2022010954
Publication Number 2023/170942
Status In Force
Filing Date 2022-03-11
Publication Date 2023-09-14
Owner NIKON CORPORATION (Japan)
Inventor
  • Moriyama Masaki
  • Ishizawa Naoya
  • Kobayashi Ryo
  • Takubo Makiko
  • Hayashi Seri
  • Tanaka Shuhei
  • Murakami Masataka
  • Hoshino Tetsuro
  • Iwasa Akio
  • Mimura Masafumi
  • Fukutake Naoki
  • Nozaki Kiyoshi

Abstract

This imaging device (10) comprises a substrate (1), a first optical system (2), and an imaging unit (3). A subject (110) is placed on the substrate (1). The first optical system (2) irradiates the subject (110) using a first emitted light (L1). The imaging unit (3) images an interferogram of a first reflected light (L2) and a second reflected light (L3). The first reflected light (L2) is obtained by the first emission light (L1) being reflected by a first interface (F1) conforming to the outer surface of the subject (110). The second reflected light (L3) is obtained by the first emission light being reflected by a second interface (F2) between the subject (110) and the substrate (1).

IPC Classes  ?

  • G02B 21/36 - Microscopes arranged for photographic purposes or projection purposes
  • C12M 1/00 - Apparatus for enzymology or microbiology
  • G01B 9/02 - Interferometers
  • G01N 15/00 - Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
  • G01N 21/17 - Systems in which incident light is modified in accordance with the properties of the material investigated

100.

PROCESSING APPARATUS

      
Application Number JP2022010658
Publication Number 2023/170876
Status In Force
Filing Date 2022-03-10
Publication Date 2023-09-14
Owner NIKON CORPORATION (Japan)
Inventor
  • Kawabe, Yoshio
  • Ozawa, Toshihiko
  • Nomura, Tatsushi

Abstract

Provided is a processing apparatus that performs riblet processing on the surface of an object using light from a light source, the processing apparatus comprising: an interference optical system that forms interference fringes on the surface of the object by irradiating the object with a plurality of beams of processing light from different incident directions, the plurality of beams of processing light being generated by splitting the light from the light source; a movement apparatus that causes the plurality of beams of processing light traveling from a final optical element of the interference optical system toward the object to move with respect to the final optical element in a direction crossing the optical axis of the interference optical system; and an optical property changing apparatus that changes the property of at least one of the plurality of beams of processing light according to the movement of the plurality of beams of processing light.

IPC Classes  ?

  • B23K 26/364 - Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
  • B23K 26/064 - Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
  • B23K 26/067 - Dividing the beam into multiple beams, e.g. multi-focusing
  • B23K 26/082 - Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
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